14CrMOV6-3 steel-Sample preparation
a-Ge as thin film material deposited on NaCl (100) substrates-Float-off
a-Ge thin film grown on NaCl-Acid, float-off
a-Ge thin films deposited on NaCl-Acid, float-off
Al alloys as sheet, plate and rod-Electrolytic etching
Al evaporated on KCl-Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al-Cu-Mg-Ag alloys-Foil preparation for TEM
Alloy Al69Nb20Ni11-Twin jet polishing mehod
Alloy Co67Ta33-Twin jet micro mehod
Alloy Fe47Ni44Al9-Twin jet polishing mehod
Alloy Fe67Al24C6-Twin jet polishing mehod
Alloy MA 6000-Twin jet polishing mehod
Alloy Ni33Al33Cr34-Twin jet polishing mehod
Alloy Ni50Al50-Twin jet polishing mehod
Alloy Ni50Co18Al32-Twin jet polishing mehod
Alloy Ni74Al25C1-Twin jet polishing mehod
Alloy Ni76Al17Ti6-Twin jet polishing mehod
Alloy Ni89Al11-Twin jet polishing mehod
Alloy SRR99-Twin jet polishing mehod
Alloy Ti42Si38-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48V1-Twin jet polishing mehod
Alloy Ti83Co12Al5-Twin jet polishing mehod
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
AlN thin films (100) and (111)-Acid, float-off
Alumina-silicon-phosphorous trioxide-Yttria glass-49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium-Electropolishing
Au as hard gold coatings on copper substrates-Metal plating
Au thin film deposited by CVD-Metal diffusion
Au thin films deposited on (0001) muscovite mica substrates-Acid, float-off
Au thin films deposited on (100) NaCl substrates-Acid, float-off
Au thin films-Electrolytic polishing
Au2Ga thin films-Ionized gas thinning
Austenitic steels, CrNi steels , N-alloyed-Electropolishing
Austenitic steels, CrNi steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
BP (100) and (111) single crystals-Molten flux
Cast irons-Electropolishing-For TEM sample preparation
Cd-Mg alloy-Mg3Cd. Thinning for TEM
CdTe thin film-Chemical float-off
CMSX-6 alloy-Electro polishing
Cobalt alloys-Electrolyticpolishing
Copper alloys-Electropolishing
Copper specimens-Electropolishing
Corning glass #7059-Acid, float-off
Cu thin films evaporated on NaCl-Acid, float-off
CuInTe2 thin films-Acid, float-off
Electrolytes for TEM preparation od intermetallics
ErH2 and ErH3-Acid, float-off
Fe, low-carbon steels, low-alloy steels
Fe-B-Si alloy-Electro thinning for TEM
Fe-Co alloys-Electropolishing
Fe-Co-Si alloys-Electropolishing
Fe-Mo-Al alloys-Electropolishing
Fe-Ni alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
GaAs (100) n-type, 0.001-0.04 Ohm cm resistivity wafers-Chemical thinning
GaAs (100) Te-doped wafer-Chemical cleaning
GaAs (100) wafer substrates-Chemical thinning
GaAs (100) wafers as substrates-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Physical thinning
GaAs (100), and InP, (100) wafers-Chemical thinning
Ge and InP (100) and (111) wafers-Chemical thinning
GX6CrNi13-4 steel-Sample preparation
Hafnium-Thinning for transmission electron microscopy (TEM)
Hardmetals-Electrolytic polishing
High speed steels-Electropolishing
High temperature CrMoN steels-Electropolishing
High temperature CrMoN steels-Electropolishing
IN 738 alloy-Sample preparation
InGaSb deposited as a thin film on BaF2 substrate (111)-Chemical thinning
InP (100) n-type wafers-Chemical etching
InP (100) wafers used for zinc deposition and anneal-Chemical thinning
InP (100) wafers-Chemical etching
KCl (111) and (100) cleaved wafers-Chemical cleaning
KI (100) wafers-Chemical etching
Mar M 247-Electro polishing
MgO (100) substrates-Acid, float-off
MgO (100) wafers-Chemical thinning
MgO prepration
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Molybdenum-Electropolishing
Muscovite mica (0H)2KAl2(AlSi3O10)-Acid, float-off
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) wafers-Acid, float-off
NaCl (100) wafers-Chemical polishing
Ni50Al46Nb4 or Ni40Al39Nb21 alloys-Twin jet polishing mehod
Nickel alloys-Electropolishing
Nickel specimens-Electropolishing
Nicrofer alloy-Electro polishing
PbSe (100) wafers-Eelectrolytic polishing/thinning
PbTe thin film-Acid float-off
Pt thin film-Acid, float-off
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron, nitrided with less than 0.015% C-Electropolishing
Pure iron-Electropolishing
Pure Molybdenum-Mo
Pyrex blanks-Acid float-off
Rubber-reinforced plastics
Se thin films-Acid, float-off
Si (100) and (111) wafers both n- and p-type-Chemical thinning
Si (100) and (111) wafers-Acid, float-off
Si (100) wafers, p-type, 2 Ohm cm resistivity-Chemical thinning
Si (100) wafers-Chemical cleaning
Si (100) wafers-Chemical jet thinning
Si (100) wafers-Chemical thinning
Si (111) wafers, n- and p-type-Chemical thinning
Si (111) wafers, p-type, 7-21 Ohm cm resistivity-Chemical jet thinning
Si (111), (100) and (110) wafers, n-type 0.1-0.7 Ohm cm and p-type 0.4-3 Ohm cm resistivity-Ionized gas thinning
Si wafers of various orientations-Ionized gas etching
Silicon carbide (SiC)-Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon single crystals-Etching of the p-n transition
Silicon single crystals-For revealing dislocations
Silicon single crystals-For TEM sample preparation
Silicon single crystals-For TEM sample preparation
SiO2 thin film deposits on silicon wafer-Chemical etching
SiV2 thin films-Chemical etching/polishing
Sn (001) and (111)-tetragonal alpha-tin single crystals-Electrolytic polishing
SnTe thin films grown on muscovite mica (0001) substrates-Acid, float-off
Steel specimens-TEM sample preparation
Titanium alloys-Electropolishing
Titanium alloys-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Titanium specimens-Electropolishing
Tungsten alloys-Electropolishing
Tungsten alloys-Electropolishing
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Unalloyed steels-Electropolishing
Waspaloy-Twin jet polishing mehod
Zinc specimens-Electropolishing
ZnTe thin films-Acid, float-off
Zr poly sheet-Chemical thinning
Zr poly sheet-Chemical thinning