'A' etchant
'B' etchant
'E' reagent
'G' etchant
'G' etchant
'H' etchant
'R' etchant
(Al, Ti)C carbide-Chemical etching
(Al, Ti)N specimens
(Al,Ti)C, VC-Chemical etching
(Al,Ti)N, AlN-Y2O3, TiN-Chemical etching
(Fe, Al)S samples-Chemical etching
(Fe, Si)C carbide-Chemical etching
(Ga,Al)As-Be p-type thin films-Chemical etching
(RE)N12 specimens-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th, U)C2 carbide-Chemical etching
(Th,U)C with a U/Th ratio of less than 3ThC2-Chemical etching
(U,Pu)C-Chemical etching
(Y2O3)m(ZrO2)(1-m) (100) wafers-Chemical polishing
0.3P bearing stainless steel-Fe-18Cr-10Ni-0.3P
0.52C-15Cr steel-Chemical etching
100Cr6 steel-Carbide contrasting
14CrMOV6-3 steel-Sample preparation
14MoV6-3 steel-Electrolytic potentiostatic isolation of residues
15% Shibuichi-Sterling silver BiMetalb (Au-Ag)-One layer Shibuichi, one layer Sterling silver
17-4-PM stainless steel-0.04C-16.5Cr-3.6Cu-4.25Ni-0.25Mn
18-8 type 304 stainless steel-Chemical etching
18/8 Stainless steel specimens-Etching to reveal ingot structure
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 Stainless steels-Etching for delta ferrite
18/8 and 13-30% Cr steels-Revelas the grain boundaries of the matrix
18/8 stainless steel-To distinguish between austenite and ferrite
20-20 and 25-20 Cr-Ni steels-For distinguishing carbides and sigma phase
22K/Sterling silver BiMetal (Au-Ag)
3% Si-Fe specimen-Electrolytic polishing
3% Silicon iron-Electropolishing
310 stainless steel-Fe-25Cr-21Ni-1.3Mn-0.7Si-0.3Mo-0.25Cu-0.04C
316 stainless steel-Fe-16/18Cr-10/14Ni-2/3Mo-max.2Mn-max.1Si (+ < 0.08 C)
4 InO3:1 SnO2 specimens-Chemical etching
4340 annealed steel-Chemical etching
4FeO.2Fe2O3.2Si02.4H2O, (001) cleaved wafers-Dislocation etching
4In2O3-1SnO2 as thin film surface coatings-Chemical etching
5052 Al alloy-Chemical etching
6.6.1 etchant
6005, 6063 and 6061 Al-Mg-Si alloys-Chemical and electrolytic etching
60Pb-40Sn #62 solder-Chemical cleaning
68Ni-31.9Fe-0.1Mg and 63Ni-35Fe-2Mo single crystals-Chemical etching
718 alloy-Ni-0.03C-19Cr-3Mo-18Fe-0.6Al-1Ti-5Nb+Ta
72Fe-5.5Al-22Cr-0.5Co Kanthal-Chemical etching
73 J (Co-20Cr-6Mo) alloy-Chemical etching
79Ni-17Fe-44Mo (111) oriented Permalloy wafers-Electrolytic polishing
79Ni-17Fe-4Mo Permalloy single crystal specimens-Chemical polishing
92.5.3 etchant
99.999% pure iron-For etching of all grain boundaries
A non electrolytic etchant for Kovar-Chemical etching
A286 stainless steel - Standard and modified
AHA etchant
AISI 316 stainless steel-Fe-0.06C-<2Mn-<1Si-10/14Ni-16/18Cr
AISI 316 stainless steel-Fe-17.5Cr-10Ni-2.5Mo-2Mn-0.5Si-0.1C
AISI 321 stainless steel-Fe-18Cr-8Ni-0.4Ti
AISI 347 stainless steel-Fe-18Cr-8Ni-0.4Nb
ASTM etch 31-Amonium persulphate
ASTM etchant #100-Ferric chloride
ASTM etchant #101-Chrome regia
ASTM etchant #102
ASTM etchant #103
ASTM etchant #104-Frank's reagent
ASTM etchant #105-92-5-3 reagent
ASTM etchant #106
ASTM etchant #107-E-etchant (EI-IR reagent)
ASTM etchant #108
ASTM etchant #109-HCl-HNO3-CuCl2 x H2O
ASTM etchant #110
ASTM etchant #111
ASTM etchant #112
ASTM etchant #113-Acetic/nitric
ASTM etchant #114-Acetic/nitric
ASTM etchant #115
ASTM etchant #116
ASTM etchant #117
ASTM etchant #118-Glycol
ASTM etchant #119-Acetic glycol
ASTM etchant #120
ASTM etchant #121-Phospho picral
ASTM etchant #122
ASTM etchant #123
ASTM etchant #124-Acetic-picral
ASTM etchant #125
ASTM etchant #126
ASTM etchant #127-Acetic-picral
ASTM etchant #128
ASTM etchant #129
ASTM etchant #130
ASTM etchant #131
ASTM etchant #132
ASTM etchant #133
ASTM etchant #134
ASTM etchant #135
ASTM etchant #136
ASTM etchant #137
ASTM etchant #138-Carapella's reagent
ASTM etchant #139
ASTM etchant #140
ASTM etchant #141-Contrast etchant
ASTM etchant #142
ASTM etchant #143
ASTM etchant #144
ASTM etchant #145
ASTM etchant #146
ASTM etchant #147
ASTM etchant #148
ASTM etchant #149
ASTM etchant #150
ASTM etchant #151
ASTM etchant #152
ASTM etchant #153
ASTM etchant #154
ASTM etchant #155-Beraha's E reagent
ASTM etchant #156
ASTM etchant #157
ASTM etchant #158
ASTM etchant #159
ASTM etchant #160
ASTM etchant #161
ASTM etchant #162
ASTM etchant #163
ASTM etchant #164
ASTM etchant #165
ASTM etchant #166
ASTM etchant #167
ASTM etchant #168
ASTM etchant #169
ASTM etchant #170
ASTM etchant #171-Hydrochloric acid
ASTM etchant #172
ASTM etchant #173
ASTM etchant #174
ASTM etchant #175-Chromic/sulphuric
ASTM etchant #176
ASTM etchant #177
ASTM etchant #178
ASTM etchant #179
ASTM etchant #180
ASTM etchant #181
ASTM etchant #182
ASTM etchant #183
ASTM etchant #184
ASTM etchant #185
ASTM etchant #186
ASTM etchant #187-Kroll's reagent
ASTM etchant #188
ASTM etchant #189
ASTM etchant #190
ASTM etchant #191
ASTM etchant #192 - Kroll's reagent
ASTM etchant #193
ASTM etchant #194
ASTM etchant #195
ASTM etchant #196
ASTM etchant #197
ASTM etchant #198
ASTM etchant #199
ASTM etchant #20
ASTM etchant #200 - Potassium reagent
ASTM etchant #201
ASTM etchant #202
ASTM etchant #203
ASTM etchant #204
ASTM etchant #205
ASTM etchant #206
ASTM etchant #207
ASTM etchant #208
ASTM etchant #209
ASTM etchant #21
ASTM etchant #22-HCl+H2O2
ASTM etchant #23-HCl-methanol
ASTM etchant #24-HCl-HNO3-FeCl3
ASTM etchant #25-Marble's reagent
ASTM etchant #26
ASTM etchant #27
ASTM etchant #28-Ferric nitrate
ASTM etchant #29-Potassium dichromate
ASTM etchant #30-NH4OH+H2O
ASTM etchant #32-Chromic acid
ASTM etchant #33-Chromic/hydrochloric
ASTM etchant #34
ASTM etchant #35-Grard's No.1 etch
ASTM etchant #36
ASTM etchant #37
ASTM etchant #38
ASTM etchant #39
ASTM etchant #40
ASTM etchant #41
ASTM etchant #42
ASTM etchant #43
ASTM etchant #44-Ammonium/peroxide
ASTM etchant #45
ASTM etchant #46
ASTM etchant #47 - Cyanide/persulphate
ASTM etchant #48
ASTM etchant #49
ASTM etchant #50-Nitric/acetic
ASTM etchant #51
ASTM etchant #52
ASTM etchant #53
ASTM etchant #54
ASTM etchant #55
ASTM etchant #56
ASTM etchant #57-Acetic acid/peroxide
ASTM etchant #58
ASTM etchant #59
ASTM etchant #60-CP4 etchant
ASTM etchant #61
ASTM etchant #62
ASTM etchant #63
ASTM etchant #64
ASTM etchant #65
ASTM etchant #66
ASTM etchant #67
ASTM etchant #68
ASTM etchant #69
ASTM etchant #69
ASTM etchant #70
ASTM etchant #71
ASTM etchant #72
ASTM etchant #73
ASTM etchant #74-Nital
ASTM etchant #75-Gorsuch's etchant
ASTM etchant #76-Picral
ASTM etchant #77-Super picral
ASTM etchant #78
ASTM etchant #79-Fry's reagent
ASTM etchant #80-Vilella
ASTM etchant #81
ASTM etchant #82-Acid ferric chloride
ASTM etchant #83
ASTM etchant #84-Howarth's reagent
ASTM etchant #85-Alkaline sodium picrate
ASTM etchant #86
ASTM etchant #87-Glyceregia
ASTM etchant #88
ASTM etchant #89
ASTM etchant #90-HNO3-HF in glycerol
ASTM etchant #91
ASTM etchant #92
ASTM etchant #93
ASTM etchant #95-Kalling's reagent No.1
ASTM etchant #94-Kalling's reagent No.2
ASTM etchant #96
ASTM etchant #97-Potassium hydroxide
ASTM etchant #98-Murakami's reagent
ASTM etchant #99-Beraha's reagent
ASTM etchant #1
ASTM etchant #10
ASTM etchant #11
ASTM etchant #12-Aqua regia
ASTM etchant #13-Oxalic acid
ASTM etchant #14
ASTM etchant #15
ASTM etchant #17
ASTM etchant #18-Chromic acid
ASTM etchant #19-Groesbeck's reagent
ASTM etchant #2-NaOH (Hatch's reagent)
ASTM etchant #3-Keller's reagent
ASTM etchant #4
ASTM etchant #5-Barker's reagent
ASTM etchant #6
ASTM etchant #7
ASTM etchant #8
ASTM etchant #9
ASTM etchant #16-Hydrochloric acid
Abraham's 'AB' etchant
Acrylonitrile-butadiene-styrene-Chemical etching
Adler's reagent
Adler's reagent
Adler's reagent
Adler's reagent
Ag (001) wafers-Chemical polishing
Ag (001) wafers-Dislocation etching
Ag (001) wafers-Electrolytic sawing
Ag (111) and (100) wafers-Chemical polishing
Ag (111) wafers, Ag natural crystals, Ag native single crystals
Ag 100 a thick thin film-Chemical etching
Ag as high purity pre-forms and silver alloy pre-forms-Chemical cleaning
Ag high purity pre-forms and plated parts
Ag pellets in an expoxy matrix-Chemical etching
Ag pellets in an expoxy matrix-Chemical etching
Ag single crystal specimens-Electrolytic polishing
Ag single crystal sphere-Gas etching
Ag single crystal sphere-Thermal forming
Ag single crystals-Chemical etching
Ag specimen blanks-Chemical etching
Ag specimen blanks-Chemical etching
Ag specimens used in a thermal etching study-Electrolytic polishing
Ag specimens used in a thermal etching study-Gas etching
Ag specimens-Chemical polishing
Ag specimens-Electrolytic polishing
Ag specimens-Gas corrosion
Ag specimens-Gas oxidation
Ag thin film coatings on Si, Al2O3 and ZrO2 substrates-Chemical etching
Ag thin film deposits-Chemical cleaning/etching
Ag thin films electroplated on brass-Chemical etching
Ag thin films-Chemical etching
Ag thin films-Chemical etching
Ag thin films-Chemical etching
Ag-Al alloy-Alloy with 15% Ag
Ag-Al alloy-Alloy with 5% Ag-Electro thinning for electron microscopy
Ag-Al alloy-Chemical etching
Ag-Al alloys-Alloy with < 20 wt.% Ag
Ag-Al alloys-Alloy with 20 wt.% Ag
Ag-Al alloys-Alloys with < 27 at.% Al
Ag-Al alloys-Electro polishing
Ag-Al alloys-Electro thinning
Ag-Al alloys-Electro thinning
Ag-Al alloys-Electro thinning
Ag-Al-Cd alloy-4.8 at.% Ag, 0.15 at.% Cd
Ag-Al-Cu alloy-4.8 at.% Ag, 0.2 at.% Cu
Ag-Au evaporated thin films-Chemical etching
Ag-Au single crystal alloy ingots-Chemical etching
Ag-B system
Ag-Cd alloy-Alloy with 44% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 45 at.% Cd
Ag-Cd alloy-Alloy with 70% Ag and 30% Cd
Ag-Cd alloy-Beta Ag Cd-50 at.% Cd
Ag-Cd alloys-Alloys with 1-7% Cd
Ag-Cd alloys-Electro thinning
Ag-Cd single crystal-0.8 at.% Cd
Ag-Cd-Zn alloys-Electro polishing
Ag-Cu alloys-In heterogeneius alloys attacks Cu rich areas faster then Ag rich
Ag-Cu-Ge system-Chemical ecthing
Ag-Cu-Ge-Sb system-Chemical etching
Ag-Cu-Sb system-Chemical etching
Ag-Epoxy-Chemical etching
Ag-Epoxy-Gas cleaning
Ag-Ga-S allloy-Chemical etching
Ag-Ge alloy-Alloy with 21 at.% Ge
Ag-Ge eutectic-Chemical polishing
Ag-I alloys-Chemical etching
Ag-I alloys-Electro thinning
Ag-I system-Beta-AgI single crystal
Ag-In selenide-Chemical ecthing
Ag-In telluride-Chemical etching
Ag-Mg alloys-Ag-0.1% MgO
Ag-Mg alloys-Electro machinning
Ag-Mg single crystal-0.8 at.% Mg
Ag-Mo and Ag-W alloys, Ag-WC-Chemical etching
Ag-Nd system-Chemical etching
Ag-Ni, Ag-Mg-Ni, Ag-Sn alloys-Chemical etching
Ag-Pb-Te system-No etching required
Ag-Pr system-Chemical etching
Ag-Sb alloys-Electro polishing
Ag-Sn (1%) single crystal alloys-Electrolytic polishing
Ag-Sn alloys
Ag-Sn alloys-Ag3Sn-Sn section
Ag-Sn alloys-Alloys with 1-8 at.% Sn
Ag-Sn alloys-Electro polishing
Ag-Sn-Hg alloys (hardened)-Chemical etching
Ag-Sn-Zn-Cu alloys-Chemical etching
Ag-Th alloys-Chemical etching
Ag-Zn alloy specimens-Chemical etching
Ag-Zn alloy-Alloy with 38 at.% Zn
Ag-Zn alloy-Alloy with 38% Zn
Ag-Zn alloy-Alloy with 50 wt.% Ag and 50 wt.% Zn
Ag-Zn alloys-Chemical polishing
Ag-Zn alloys-Electro thinning
Ag-Zn alloys-Electro thinning
Ag2Al (0001) wafers-Dislocation etching
Ag2Al (0001) wafers-Dislocation etching
Ag2Al single crystal specimens-Electrolytic polishing
Ag2Al single crystal sphere-Chemical polishing
Ag2Hg (110) single crystal-Chemical polishing/etching
Ag2Se (100) wafers and other orientations-Chemical polishing
Ag2Se (100) wafers and other orientations-Chemical polishing
Ag2Se (100) wafers-Chemical polishing
Ag2Te (100) wafers-Chemical polishing
Ag3Ni specimens-Electrolytic polishing
Ag6Ge10P12 single crystal ingots-Chemical etching
AgB alloys-Chemical cleaning
AgBr (100) and (111) wafers-Dislocation etching
AgBr (110) wafers-Abrasive polishing
AgCd single crystal specimens-Chemical etching
AgCl (100) bars, AgCl single crystal specimens-Chemical etching
AgCl (100) oriented material-Chemical etching-Hypo etchant
AgCl (100) wafers-Chemical cleaning
AgCl (100) wafers-Chemical cleaning
AgCl (100) wafers-Chemical polishing
AgCl single crystal oriented bars-Chemical cleaning
AgCl specimens-Pressure, thinning
AgFeTe2 single crystal specimens-Chemical polishing
AgGaS2 thin films
AgGaSe3 single crystals-Chemical etching
AgGaTe2 single crystals-Chemical etching
AgI powder
AgI single crystals-Chemical cleaning
AgInSe2 single crystals-Chemical etching
AgInTe2 single crystals-Chemical etching
AgMg single crystal specimens-Chemical cleaning
AgS single crystal whiskers-Chemical etching
AgS single crystal whiskers-Electrolytic polishing
AgSbTe2 single crystal specimens-Chemical etching
AgSbTe2 single crystal specimens-Chemical polishing
AgSbTe2 single crystal specimens-Dislocation etching
AgTiSe single crystal material-Chemical polishing
AgZn specimens-Chemical cleaning
Al (001) wafers-Al (001) wafers and other orientations
Al (001) wafers-Al, (001) wafers used in a study of lithium precipitation along dislocations
Al (001) wafers-Dislocation etching
Al (100) specimen-Al (100) and other orientations used in a study of thermal etching
Al (100) specimens-Electrolytic polishing
Al (100) wafer-Al, (100) wafer surfaces preferentially etched in this solution
Al (100) wafers used in an oxidation study-Electrolytic polishing
Al (100) wafers-Thermal etching
Al 5083 alloy-Al-4Mg-0.3Fe-0.75Mn-0.2Si
Al 5454 alloy-Al-2.6Mg-0.3Fe-0.8Mn-0.1Si
Al foil with an Al2O3 thin film
Al alloy #6061-Tg sheet-Proton damage
Al alloy 1100-Al-0.5Fe-0.1Si
Al alloy 3003-Al-1Mn-0.6Fe-0.2Si
Al alloy 7004-Al-1.6Mg-4.5Zn-0.5Mn-0.2Fe-0.2Si
Al alloys as sheet, plate and rod-Electrolytic etching
Al and Al alloys with less than 2% Si-Electrolytic polishing
Al and Al alloys-Electrolytic polishing
Al and Al alloys-Electrolytic polishing
Al and alloys-Al, specimens and alloys with low aluminum content
Al and alloys-Chemical polishing
Al and alloys-Polishing
Al and aluminum alloys-Used as a general cleaning and polishing etch
Al bronzes, Cu-Be alloys-Electrolytic etching
Al bronzes-Chemical etching
Al cold-rolled specimens-Electrolytic polishing
Al evaporated on KCl-Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al foil-Al, foil used in a study of change with AC etching
Al high purity slugs-Chemical cleaning
Al material in growing AlGaAsP single crystals-Chemical cleaning
Al polycrystalline sheet-Chemical cleaning
Al single crystal specimens-Electrolytic polihsing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Electrolytic polishing
Al single crystal specimens-Physical etching
Al single crystal sphere-Gas oxidation
Al single crystal wafers-Electrolytic thinning
Al specimens and alloys-Abrasive polishing
Al specimens as Al-Si (20%)-Electrolytic etching
Al specimens cutting-Acid, cutting
Al specimens-Chem/mech machinning
Al specimens-Chemical etching
Al specimens-Chemical etching
Al specimens-Mechanical, deformation
Al specimens-Oxidation
Al specimens-Solution used as a preferential etch on aluminum
Al specimens-Solution will develop etch figures
Al thin film on (100) silicon wafers-Chemical etching
Al thin film on quartz substrate-Gas, removal
Al thin film-Ketone, lift-off
Al thin films and crystalline aluminum sheet-Solution shown was used to etch channels in the aluminum
Al thin films deposited on GaAs-Physical etching
Al thin films deposited on silicon substrates-Physical etching
Al thin films evaporated on SiO2, Al2O3, and ZrO2 substrates-Alkali, removal
Al, Al-Si alloys-Electrolytic polishing
Al, and A12O3/A1N thin films-Gas etching
Al-Ag alloys-Chemical polishing
Al-Ag alloys-Electro thining
Al-Ag alloys-Electropolishing
Al-Ag polycrystalline and single crystal ingots-Chemical etching
Al-Ag polycrystalline and single crystal ingots-Chemical etching
Al-Au (2%) specimens-Electrolytic etching
Al-Au alloy-Chemical etching
Al-Au alloys-Al-Al2Au eutectic
Al-Au alloys-Electro polishing
Al-Be (38%) alloy-Chemical cleaning
Al-Be (38%) polycrystaline wire-Chemical cleaning
Al-Be alloys-Alloys with < 0.1% Be
Al-Be alloys-Electro thinning by Mirand-Saulnier technique
Al-Ca alloy-Al-7.6Ca eutectic alloy
Al-Ca alloy-Al4Ca
Al-Cd alloys-Alloys with 0.5-1.0% Al
Al-Co alloys-Electrolytic polishing and etching
Al-Cr alloys-Electro thinning by Mirand-Saulnier technique
Al-Cr-Mo-Ni-Ti alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<6Mo (in at.%)
Al-Cr-Nb-Ni alloy-Ni-20Nb-6Cr-2.5Al
Al-Cu alloy (2% Cu)-Chemical etching
Al-Cu alloy (4% Cu)-Electro polishing and thinning
Al-Cu alloy-Al-Al2Cu eutectic
Al-Cu alloy-Al-Cu alloy specimens. Used as a polish etch on Al-Cu, Al-Si, and Al
Al-Cu alloy-Al-Cu eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Al-CuAl2 eutectic
Al-Cu alloy-Alloy with 0.34 wt.% Cu
Al-Cu alloy-Alloy with 11.8 wt.% Al
Al-Cu alloy-Alloy with 12% Al
Al-Cu alloy-Alloy with 2-5% Cu
Al-Cu alloy-Alloy with 3-5% Cu
Al-Cu alloy-Alloy with 36 wt.% Cu
Al-Cu alloy-Alloy with 4 wt.% Cu
Al-Cu alloy-Alloy with 4.5 wt.% Cu
Al-Cu alloy-Alloy with 7.5 at.% Al
Al-Cu alloy-Alloy with 9.5% Al
Al-Cu alloy-Electro thinning
Al-Cu alloys-Alloys with 1-5% Cu
Al-Cu alloys-Alloys with 10-45% Cu
Al-Cu alloys-Chemical etching
Al-Cu alloys-Chemical polishing
Al-Cu alloys-Chemical polishing
Al-Cu alloys-Electro polishing
Al-Cu alloys-Electro polishing and chemical etching
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning
Al-Cu alloys-Electro thinning by PFTE holder technique
Al-Cu alloys-Eletro thinning
Al-Cu single crystal-Chemical etching
Al-Cu single crystal-Chemical etching
Al-Cu single crystal-Chemical etching
Al-Cu-Ag-Mg-Ti alloy-4.7% Cu, 0.6% Ag, 0.3% Mg, 0.3% Al, 0.2% Ti
Al-Cu-Mg alloys-Alloys with 1-5% Cu, 0.5-1.5% Mg
Al-Cu-Mg alloys-Electro polishing
Al-Cu-Mg alloys-Electro thinning
Al-Cu-Mg eutectic alloy-Electro thinning and chemical etching
Al-Cu-Mg-Ag alloys-Foil preparation for TEM
Al-Cu-Mg-Mn alloys-3-4% Cu, 0.5-1% Mg, 0.5% Mn
Al-Cu-Mg-Mn-Fe-Si alloy-2124 T4, Al-3.8Cr-1.3Mg-0.5Mn-0.1Fe-0.05Si
Al-Cu-Mn alloys-Cu(2+x) Mn(1-x) Al, x=0.6-0.8
Al-Cu-Mn alloys-Cu2MnAl
Al-Cu-Mn system-Approx. Cu2MnAl
Al-Cu-Mn-Zn-Fe-Mg-Si alloy-2024-T4: Al-4.5Cu-1.4Mg-0.6Mn-0.3Fe-0.2Zn-0.15Si
Al-Cu-Ti alloy-Alloy with 4% Cu, and 0.1% Ti
Al-Dy alloys-Al rich alloys
Al-Fe alloys
Al-Fe alloys-Alloys with 65-90% Fe
Al-Fe-Cr alloys-Al-7Fe-0.5/1.5 Cr
Al-Fe-Cr-Ti-V-Zr alloy-Al-7Fe-1Cr-0.2Ti-0.2V-0.2Zr
Al-Fe-Ni system-Alloys with 32-53% Al, 8-14% Ni, 19-60% Fe
Al-Ge alloy-Alloy with 50 wt.% Ge
Al-Ge alloys-Chemical polishing
Al-Ge alloys-Eutectic composition
Al-Hf alloy-Alloy with 1.8 wt.% Hf
Al-Ho alloys-Anodising
Al-Ho alloys-For Al rich alloys
Al-In alloys-Chemical polishing
Al-In alloys-Selective etch for SEM
Al-Li alloy (0.4% Li)-Chemical etching
Al-Li alloy-Chemical polishing
Al-Li-Cu-Zr alloy-Al-3Li-2Cu-0.2Zr
Al-Li-Cu-Zr-Cd alloy-Al-3Li-2Cu-0.2Zr-0.2Cd
Al-Mg alloy-Alloy with 1-8 at.% Mg
Al-Mg alloy-Alloy with 7% Mg
Al-Mg alloy-Alloy with 86% Mg
Al-Mg alloy-Chemical polishing
Al-Mg alloys-Al-5/10Mg
Al-Mg alloys-Al-8Mg
Al-Mg alloys-Alloys with 1-4.5% Mg
Al-Mg alloys-Electro thinning
Al-Mg alloys-Electro thinning
Al-Mg alloys-Electro thinning by Mirand-Saulnier technique
Al-Mg alloys-Electrolytic polishing
Al-Mg-Mo-O system-Chemical etching
Al-Mg-Si alloy-Al-1-2% Mg2Si
Al-Mg-Si alloy-Alloy 6063: Al-0.7Mg-0.4Si
Al-Mg-Si alloys-Electro thinning
Al-Mg-Zn alloy-Al-2.6Mg-6.3Zn
Al-Mg-Zn alloys-Electro thinning by PTFE holder technique
Al-Mn alloy-Al-1 wt.% Mn
Al-Mn alloy-Al45Mn55
Al-Mn alloy-Alloy with 1-4% Mn
Al-Mn alloys-Electro thinning by Mirand-Saulnier technique
Al-Mn-C alloy-Al43 x Mn55 x C2
Al-Mo-O system-Al2O3-< 5% Mo
Al-Ni alloy thin film-Chemical etching
Al-Ni alloy thin films-Flux etching and cleaning
Al-Ni alloy-Al-Al3Ni eutectic
Al-Ni alloy-Ni3Al
Al-Ni system-Al-Al3Ni eutectic
Al-Ni system-Beta 2 alloys: 45-55% Ni
Al-Ni, alloy thin film coatings-Etching
Al-Pt alloy-Al-Al2Pt5 eutectic
Al-Pt alloys-Grain size can be determined by polarised light
Al-Sb alloys-Al-AlSb eutectic
Al-Sb alloys-Chemical etching
Al-Si (12%) alloy-Chemical etching
Al-Si (5%) foil-Chemical cleaning
Al-Si alloy-Chemical etching
Al-Si alloy-Chemical etching
Al-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Al-Si alloys-Electrolytic polishing
Al-Si alloys-For Al-Si alloys with Si bellow of 34 weight %
Al-Si alloys-Particullary good for Al-Si alloys
Al-Si and Al-Cu alloys, segregations, grain boundaries-Chemical etching
Al-Si specimens-Chemical polishing and etching
Al-Si-Cu foundary alloys, colour etchants-Chemical etching
Al-Si-Ni eutectic-Al-11Si-4.9Ni
Al-Sm alloys-Al rich alloys
Al-Ti alloy specimen-Al-Al3Ti section
Al-Ti-N system-(Al, Ti)N
Al-Ti-Zr-Sn-Mo alloy-Ti-6Al-2Sn-4Zr-2Mo
Al-Ti-Zr-Sn-Mo alloy-Ti-6Al-2Sn-4Zr-2Mo
Al-Tm alloys-Electro polishing
Al-Tm alloys-Etchant for alloy with 0-40% Tm
Al-U alloys-Chemical etching
Al-U alloys-Electro thinning
Al-Zn (10%) alloy sheet-Electrolytic polishing
Al-Zn alloy-Alloy with 22% Al
Al-Zn alloy-Electro polishing
Al-Zn alloy-Electro polishing
Al-Zn alloy-Electro thinning
Al-Zn alloy-For alloy with 38 at.% Zn
Al-Zn alloy-For alloys with 20% Al
Al-Zn alloy-For alloys with 21.5% Zn
Al-Zn alloy-For alloys with 25 at.% Zn
Al-Zn alloy-For alloys with 29 at.% Zn
Al-Zn alloys-Alloys with more then 8% Zn
Al-Zn alloys-Chemical etching
Al-Zn alloys-Electro thinning
Al-Zn alloys-Electro thinning
Al-Zn alloys-For alloys with < 20% Zn
Al-Zn alloys-For alloys with 6.5 at.% Zn
Al-Zn, Cu alloy specimens-Physical etching
Al-Zn-Mg alloy-7039 alloy: 4% Zn, 2.8-3% Mg
Al-Zn-Mg alloy-Al, 53% Zn, 1.7% Mg (+0.04% Ti)
Al-Zn-Mg alloy-Alloy with 5.3% Zn, 2.5% Mg
Al-Zn-Mg alloy-Alloy with 6% Zn and 2% Mg
Al-Zn-Mg alloy-Alloy with 6.86 wt.% Zn, 2.5 wt.% Mg
Al-Zn-Mg alloy-Alloy with 6.86% Zn, 2.30% Mg
Al-Zn-Mg alloy-Chemical etching
Al-Zn-Mg alloys-Alloys with 4-6% Zn, 1-4% Mg
Al-Zn-Mg alloys-Electro thinning
Al-Zn-Mg-Cu alloy-7075 alloy
Al-Zn-Mg-Cu alloy-7075 alloy: 5.5-5.8% Zn, 2.1-2.6% Mg, 1.6-1.7% Cu
Al-Zn-Mg-Cu alloy-Al-5.5Zn-2.5Mg-1.5Cu
Al-Zn-Mg-Cu alloy-Al-5/7Zn-2/3Mg-1/3Cu
Al-Zn-Mg-Cu alloys (+Cr, Ti)-Chemical etching
Al-Zn-Mg-Cu alloys-7075 alloy: 5-3% Zn, 2-7% Mg, 1.6 Cu + Fe, S, Cr, Ti, Mn
Al-Zn-Mn alloy-Alloy with 5% Zn, 2% Mg
Al-Zr alloy-For alloy with 0.8% Zr
Al-killed drawing steel-Fe-0.07C-0.3Mn-0.03/0.05Al
Al/Ni specimen surface coatings-Electrolytic removal
Al203 as (0001) or (01T2) sapphire blanks-Thermal cleaning
Al2NiO4 specimens-Chemical etching
Al2O3 (0001) wafers-Chemical cleaning
Al2O3 (0001) wafers-Chemical etching
Al2O3 (0001) wafers-Metal etching
Al2O3 (0O01) natural corundum-Etching
Al2O3 and Al2PxOy thin films-Solvent, cleaning
Al2O3 anodized coating-Chemical cleaning
Al2O3 as fused sapphire parts in amorphous form-Chemical cleaning
Al2O3 as natural corundum-Molten flux removal
Al2O3 as natural single crystals-Chemical cleaning
Al2O3 as natural single crystals-Cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Chemical cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Chemical cleaning
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Solvent degreasing
Al2O3 clear fused sapphire blanks and (0001) single crystal oriented blanks-Surface treatment
Al2O3 pressed powder substrates-Chemical etching
Al2O3 pressed powder-Chemical cleaning
Al2O3 pressed powder-Gas cleaning
Al2O3 single crystal sapphire-Dislocation etching
Al2O3 single crystal spheres-Thin film coating
Al2O3 single crystal-Vacuum, cleaning
Al2O3 specimens-Chemical cleaning
Al2O3 substrate blanks-Cleaning
Al2O3 substrate blanks-Gas cleaning
Al2O3 substrate-Cleaning
Al2O3 thin film deposition on InGaAsP/InP-Oxide, passivation
Al2O3 thin film-Chemical etching
Al2O3 thin film-Electrolytic etching
Al2O3 thin films DC reactively sputtered on (111) silicon wafers-Chemical etching
Al2O3, CeO2 and Cr2O3-Physical etching
Al2O3, native oxide films on Al:Au alloys-Chemical etching (cleaning)
Al2O3, thin film deposited on silicon-Photochemical, forming
Al2O3-Chemical etching
Al2O3-Chemical etching
Al2O3-Zr (1%) doped single crystal-Physical etching
Al2SiO5 specimens-Chemical etching
Al2TiO5, grain boundary etchant-Chemical etching
AlAs (110) wafers-Gas, oxidation
AlAs thin films-Chemical polishing
AlFe alloy-Thermal etching
AlGaAs (100) wafer-Chemical cleaning
AlN on Si and GaAs substrates-Chemical etching
AlN specimens-Chemical etching
AlN thin film on (100) gallium arsenide-Chemical etching
AlN thin film on (111) silicon wafer-Chemical etching
AlN thin films (100) and (111)-Acid, float-off
AlN thin films deposited on GaAs-Zn doped-Chemical etching
AlN thin films-Thermal etching
AlN-Al2O3-Chemical etching
AlN-La2O3-Chemical ecthing
AlNi2 single crystal-Chemical etching
AlP single crystal wafer-Chemical polishing
AlPO4 single crystal-Chemical etching
AlSb (111) wafers-Chemical etching
AlSb ingot material preparation-Chemical cleaning
AlSb wafers-Chemical etching
AlSb wafers-Chemical etching
AlSb wafers-Chemical polishing
AlSb wafers-Chemical polishing
AlSb wafers-Chemical polishing
AlSb/GaSb wafers-Chemical etching
AlSi (5%) spheres-Gas, cleaning
AlSi thin film layers-Physical etching
AlSi-671, S-816 alloys-Chemical etching
AlSi0671, S-816 alloys-Chemical etching
AlSiCuSn cast alloys-Color etchant
All Mg alloys in the as cast or heat treated condition, grain-boundary etchant-Chemical etching
All Zn alloys, for pressure die-casting, Zn coatings-Chemical etching
All unalloyed amd low alloy steels, microalloy steels, manganese steels, welds-Chemical etching
Alloy 800-0.04/0.05C-0.2/0.5Si-0.5/0.6Mn-33/34.5Ni-21.5/22.5Cr-0.2/0.55Ti-0.1/0.2Al-0/0.1Cu
Alloy Al69Nb20Ni11-Twin jet polishing mehod
Alloy Co67Ta33-Twin jet micro mehod
Alloy Fe47Ni44Al9-Twin jet polishing mehod
Alloy Fe67Al24C6-Twin jet polishing mehod
Alloy K42B-Chemical etching
Alloy MA 6000-Twin jet polishing mehod
Alloy Ni33Al33Cr34-Twin jet polishing mehod
Alloy Ni50Al50-Twin jet polishing mehod
Alloy Ni50Co18Al32-Twin jet polishing mehod
Alloy Ni74Al25C1-Twin jet polishing mehod
Alloy Ni76Al17Ti6-Twin jet polishing mehod
Alloy Ni89Al11-Twin jet polishing mehod
Alloy NiAl-Electropolishing
Alloy No. 152-Chemical etching
Alloy No. 25-Chemical etching
Alloy Ravloy
Alloy Ravloy
Alloy Ravloy
Alloy Ravloy
Alloy Ravocast
Alloy SRR99-Twin jet polishing mehod
Alloy Ti42Si38-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48-Twin jet polishing mehod
Alloy Ti52Al48V1-Twin jet polishing mehod
Alloy Ti83Co12Al5-Twin jet polishing mehod
Alloy and high speed steels-Universal electrolyte
Alloy steel specimens-Color etching. Colors pearlite and hardened structures of unlloyed steel specimens
Alloy steels with Ni, Co-Chemical etching
Alloy steels with Ni, Co-Chemical etching
Alloy steels-Color etching. Colors ferrite grains. Reveals banded structures.
Alloy steels-Color etching. Colors the martensite in Fe-C alloys
Alloy steels-Color etching. For Mn, Mn-C, Mn-Cr steels
Alloy steels-Color etching. For carbon, alloy and Fe-Mn (5-18% Mn) steels
Alloy steels-Color etching. For carbon, alloy and manganese steels.
Alloy steels-Color etching. For carbon, alloy and tool steels
Alloy steels-Colour etchant
Alloy steels-Electrolytic polishing
Alloy steels-Electrolytic polishing
Alloy steels-Electrolytic polishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloyed ferrite steels-Electropolishing
Alloy steels-Revealing prior austenite grain in alloy steels
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloyed steels with up to 9% Ni-Electropolishing
Alloys with < 40 at.% Ni
Alloys with low Sn content. High Cu containing alloys-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical etching
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Chemical polishing
Alminium gallium arsenide (Al(x) Ga(1-x) As)-Dislocation etching
Alnico V, iron alloy-Chemical etching
Alpha sulphur-Chemical etching
Alpha Ti-Chemical etching
Alpha brass (Cu-Zn) single crystal-Chemical etching, electro polishing, electro etching
Alpha brass (Cu-Zn)-Electro etching
Alpha brass (Cu-Zn)-Electro polishing
Alpha brass (Cu-Zn)-Physical etching
Alpha brass (Cu-Zn)-Physical etching
Alpha or alpha plus beta brass-Electrolytic polishing
Alpha or beta brass-Electropolishing
Alpha phase in Pb-Bi and Pb-Sb alloys-Chemical etching
Alpha-Al2O3 (0001) wafers-Chemical etching
Alpha-Al2O3 powder material-Molten, flux, removal
Alpha-HgI2 single crystal specimens-Chemical polishing
Alpha-HgI2 single crystal specimens-Chemical polishing
Alpha-SiC (0001) wafers-Dislocation etching
Alpha-SiC (0001) wafers-Gas polishing
Alpha-U specimens-Electrolytic cleaning
Alpha-U specimens-Electrolytic polishing
Alpha-brass [(Cu-Zn) with 29.38% Cu)]-Chemical cleaning
Alpha-brass single crystals-Cutting
Alum, KAl(SO4)2 x 12H2O (111) wafers-Chemical etching
Alum, KAl(SO4)2 x 12H2O single crystals-Dislocation etching
Alumel alloy-95Ni-1.6Al-1.5Si-1.3Mn-0.3Co
Alumina (Al2O3) single crystal-Chemical etching
Alumina (Al2O3) single crystal-Chemical etching
Alumina (Al2O3)-Aluminia with additives
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical etching
Alumina (Al2O3)-Chemical thinning
Alumina (Al2O3)-Dislocation etch pits
Alumina (Al2O3)-Irregular grain boundary attack
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching
Alumina (Al2O3)-Physical etching and chemical etching
Alumina (Al2O3)-Pure aluminia
Alumina (Al2O3)-titania (TiO) system-89% Al2O3, 11% TiO
Alumina (Beta-Al2O3)-Chemical etching
Alumina (Beta-Al2O3)-Physical etching
Alumina Al2O3-Etching
Alumina dispersed Nichrome-Ni-20% Cr-0.6/1.5% Al2O3
Alumina-rich spinel single crystal (MgAl2O4)-Chemical etching
Alumina-silica system-60% Al2O3, 40% SiO2
Alumina-silica-lime-nitride glasses-20.2-25.3% Si, 8.3-14.3% Al, 3.4-4.3% Cu, 43.5-60.6% O, 2.2-16.8% N
Alumina-silicon-phosphorous trioxide-yttria glass-49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminia-lanthanum oxide dispersed Nichrome-Ni-20Cr-0.04Al2O3-0.04La2O3
Aluminium 5052 alloy-Al-2.3Mg-0.2Fe-0.2Cr-0.1Si
Aluminium 7075 alloy-Al-5.5Zn-2.5Mg-1.5Cu-0.3Cr
Aluminium 7075, 7475 alloys-Al - 5.1/5.7 Zn - 2.1/2.3 Mg - 1.5 Cu - 0.2 Cr
Aluminium silicate (Al2SiO5)-Physical etching
Aluminium alloy 6061-Al-1Mg-0.6Si-03Cu-03.Fe
Aluminium alloy and cast aluminum-Solution used as a general micro-etch in the study of surface structure
Aluminium alloys
Aluminium alloys-1xxx series alloys
Aluminium alloys-1xxx series alloys, all wrought alloys and casting alloys
Aluminium alloys-1xxx, 3xxx, 5xxx, 6xxx series alloys, most casting alloys
Aluminium alloys-2xxx series alloys, Al-Cu or Al-Zn casting alloys
Aluminium alloys-2xxx, 3xxx series; Al-Cu and Al-Mn casting alloys
Aluminium alloys-2xxx, 7xxx series; Al-Cu or Al-Zn alloys, hot worked and heat treated alloys
Aluminium alloys-3xxx, 5xxx series; Al-Mg casting alloys
Aluminium alloys-7xxx series alloys, Al-Zn casting alloys
Aluminium alloys-Al alloys as sheet material and as an evaporated thin film on other materials
Aluminium alloys-Al-Cu-Mg-Zn Alloys, 7xxx series and casting alloys
Aluminium alloys-Al-Si alloys
Aluminium alloys-Alloy 6061, 6xxx series alloys, hot worked and heat treated alloys
Aluminium alloys-Alloy 7075, recrystallized
Aluminium alloys-Alloys 2017, 2024 and artificially aged tempers
Aluminium alloys-Brazing sheet. Examination for cladding thickness
Aluminium alloys-Colours etching
Aluminium alloys-Commercial-purity alloys: 1xxx series, Al-Mn alloys, Al-Si alloys, Al-Mg-Si alloys
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-Electropolishing
Aluminium alloys-For examination of grain size and shape, cold working incomplete recrystallization
Aluminium alloys-Grain boundary eutectic formations
Aluminium alloys-High purity Al, commercial purity Al, Al-Mn alloys, Al-Si alloys, Al-Mg alloys, Al-Mg-Si alloys
Aluminium alloys-High purity aluminium
Aluminium alloys-Hot worked and heat treated alloys
Aluminium alloys-One of the best electrolyte for universal use
Aluminium and aluminium alloys-Al alloys of all types. Forgings and castings
Aluminium and aluminium alloys-Al alloys. Forgings and castings
Aluminium and aluminium alloys-Al-Cu-Mg alloys. Al Alloys of all types
Aluminium and aluminium alloys-General macro and for revealing shrinkage, cracks, oxides
Aluminium and aluminium alloys-Grain size determination and determination orientation
Aluminium and aluminium alloys-Macro of pure aluminium
Aluminium and aluminium alloys-Pure aluminium and Al alloys. To reveal grain structure and slip lines
Aluminium and aluminium alloys-To reveal grain structure and flow lines in forgings
Aluminium and aluminium alloys-To reveal grain structure. For Al-Si Alloys, castings
Aluminium and alloys-Chemical etching
Aluminium and alloys-Chemical polishing
Aluminium and alloys-Cleaning etch
Aluminium and alloys-Electro polishing
Aluminium and alloys-Electro polishing
Aluminium and alloys-Electro thinning
Aluminium and alloys-Electro thinning
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and aluminium alloys-Electropolishing
Aluminium and its alloys-For 2xxx Al alloys, high Cu aloys
Aluminium and its alloys-For 3xxx, 4xxx, 5xxx, 6xxx Al alloys and high Si castings
Aluminium and its alloys-For Al alloys except high Si castings
Aluminium and its alloys-For high purity Al, 1xxx, 3xxx, 4xxx, 5xxx, 6 xxx Al alloys
Aluminium and its alloys-Good general purpose etchant
Aluminium bronze-Chemical etching
Aluminium-magnesium oxide (Al2O3+MgO)-Chemical etching
Aluminium-magnesium oxide (Al2O3+MgO)-Chemical etching
Aluminium nitride (AlN)-AlN with Al2O3
Aluminium nitride (AlN)-AlN with La2O3
Aluminium nitride (AlN)-AlN with Y2O3
Aluminium nitride (AlN)-Aluminium nitride (AlN)
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride (AlN)-Chemical etching
Aluminium nitride AlN-Etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Chemical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium oxide (Al2O3)-Physical etching
Aluminium polycrystalline sheet-Chemical cleaning
Aluminium single crystal
Aluminium single crystal specimens-Chemical polishing
Aluminium single crystal specimens-Chemical polishing
Aluminium single crystal-Electrolytic polishing
Aluminium single crystal-Electrolytic polishing
Aluminium specimens and alloys-Brite dip etchant
Aluminium specimens-Al alloys containing Cu, Mn, Si and Ti. Al cast alloys with high Si content
Aluminium specimens-Al base matrials in general
Aluminium specimens-Chemical cleaning
Aluminium specimens-Chemical etching
Aluminium specimens-Chemical etching
Aluminium specimens-Electrolytic polishing
Aluminium specimens-Electrolytic polishing
Aluminium specimens-High purity Al, Mn-Al, Si-Al, Mg-Al and Mg-Si-Al alloys
Aluminium specimens-Pure Al, Cu-Al alloys
Aluminium specimens-Surface imperfections of pure Al
Aluminium thin film-Chemical etching
Aluminium thin film-Cleaning etch
Aluminium thin film-Cleaning etch
Aluminium thin film-Cleaning etch
Aluminium thin film-Reactive ion etching
Aluminium thin films deposited on GaAs and Si (100) wafers-Cleaning etch
Aluminium thin films evaporated on GaAs-Al thin films evaporated on GaAs, (100) substrates used in fabricating GaAs FETs
Aluminium thin films evaporated on silicon and Gallium arsenide-Chemical etching
Aluminium thin films on semiconductor wafers-Cleaning etch
Aluminium thin films-Chemical cleaning
Aluminium, low alloy content specimens-Chemical etching
Aluminium-A general electropolish for aluminum
Aluminium-Alumina (Al2O3) alloys-Chemical etching
Aluminium-Alumina (Al2O3) alloys-Low oxide alloys. Jet electro polishing
Aluminium-Alumina (Al2O3) alloys-Electro thinning
Aluminium-Alumina (Al2O3) alloys-Electro thinning
Aluminium-Anodising
Aluminium-Cathodic etching
Aluminium-Chemical etching
Aluminium-Chemical etching
Aluminium-Chemical etching, electrolytic polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing
Aluminium-Chemical polishing-Only suitable for very thin specimen
Aluminium-Differentiantion of intermediate phases in Al with high contents of Cu, Mn, Mg, Fe, Be, Ti, Fe3Al
Aluminium-Distinct grain boundaries in corrosion sensitive alloys
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro polishing
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electro thinning
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing
Aluminium-Electrolytic polishing, chemical polishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Electropolishing
Aluminium-Especially for Cu-Al alloys (also useful in macroetching)
Aluminium-Etching for dislocations
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits
Aluminium-Etching for etch pits on glide dislocation
Aluminium-Etching for grain size
Aluminium-Etching for grain size
Aluminium-For most of AL and Al alloys, especially those containing Cu
Aluminium-For most types of Al and Al alloys
Aluminium-For most types of Al and Al alloys
Aluminium-Grain boundaries, slip lines in high purity Al
Aluminium-Ion etching
Aluminium-Physical etching
Aluminium-Precipitates of beta Al8Mg5 or Mg2
Aluminium-Precipitates, grain boundaries, Al-Si and Al-Cu alloys
Aluminium-Pure Al, Al-Cu, Al-Mn, Al-Mg, Al-Mg-Si alloys
Aluminium-Pure Al, Al-Mg and Al-Mg-Si alloys. Etch figures
Aluminium-Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg, Al-Mn-Mg alloys
Aluminium-Pure Al, Allloys of Cy-Al, Mg-Si-Al, Mg-Al, and Zn-Al
Aluminium-Universal electrolyte
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum alloys-Color etching
Aluminum antimonide (AlSb)-Chemical polishing
Aluminum antimonide (AlSb)-Chemical polishing
Aluminum bronze-Electrolytic etching
Aluminum weldments-For macroetching
Am2O3-Chemical etching
AmO(2-x), AmO(2-x) with Am2O3-Chemical etching
Antimony selenide-Arsenic selenide system
Antimony specimens-Crystal arrangement. Casting imperfection in Sb and Bi
Antimony specimens-Electro mechanical polishing
Antimony specimens-Electrolytic polishing
Antimony specimens-Electrolytic polishing
Antimony specimens-Etch pits etching
Antimony specimens-Etch pits etching
Antimony specimens-For pure and technically pure types of Sb. Low alloy Sb
Antimony specimens-Grain contrast etch
Antimony specimens-Sb and Sb alloys
Antimony specimens-Sb and Sb alloys. Pb-Sb, Bi-Sn and Bi-Cd alloys
Antimony specimens-Sb, Bi and their alloys
Antimony specimens-Sb-Pb alloys
Antimony specimens-Sb-Pb, Bi-Sn alloys
Antimony specimens-Technically pure Sb. Crystal arrangement. Sb-Bi alloys
Aqua regia
Aqua regia
Arsenic single crystal-Polishing and etching
As (0001) cleaved specimens-Chemical polishing
As (0001) wafers-Solution used as a general removal etch
As (111) specimens-Chemical polishing
As (111) specimens-Dislocation etching
As (111) specimens-Dislocation etching-Bromine etchant
As-Cd-Ge-Se system-For CdSe-Ge1.5-As0.5-Se3 section
As-Pb-Ge-Se system-PbSe-Ge1.5As0.5Se3 section
As-Sb system (single crystal)-Etching for pit etch
Astraloy-Ni-16/18Co-15/16Cr-4.5/5.5Mo-3.85/4.15Al-3.35/3.65Ti-0.03/0.09C (+B)
Au (100) single crystal thin films-Specimen preparation
Au (111) and (100) single crystal blanks-Chemical etching
Au (111) wafers and other orientations-Chemical etching
Au and Au alloys-Electrolytic etching
Au as hard gold coatings on copper substrates-Metal plating
Au as single crystal blanks-Abrasive polishing
Au diffused into silicon wafers-Chemical etching
Au diffused into silicon-Chemical etching
Au foil-Eletrolytic polishing
Au polycrystalline specimens-Acid, float-off
Au single crystal spheres-Thermal forming
Au slugs or wire-Chemical cleaning
Au specimens and thin films-Chemical etching
Au specimens and thin films-Chemical etching-Tri-iodide etchant
Au specimens-Chemical etching
Au specimens-Electrolytic polishing
Au specimens-Electrolytic polishing
Au specimens-Oxide removal
Au spherulitic particles-Chemical etching
Au thin film deposited by CVD-Metal diffusion
Au thin film deposited on glass-Chemical etching
Au thin film deposits as a multilayer Au/Ni/Au/TiW/Si(100) substrate-Chemical etching
Au thin film deposits on silicon wafers-Chemical etching
Au thin films and specimens-Chemical etching
Au thin films and specimens-Chemical etching
Au thin films deposited on (0001) muscovite mica substrates-Acid, float-off
Au thin films deposited on (100) NaCl substrates-Acid, float-off
Au thin films deposited on glass-Chemical etching
Au thin films deposited on soda-lime glass-Thermal, structure
Au thin films evaporated on alumina substrates-Gas, drying
Au thin films pulse plated on alumina blanks-Gold plating
Au thin films-Chemical ecthing
Au thin films-Electrolytic polishing
Au thin films-Gas, diffusion
Au thin films-Thermal etching
Au-20Sn & Sn-36Pb-2Ag alloys-Chemical etching
Au-Ag-Cu alloys-Chemical etching
Au-Ag-Cu alloys-Chemical etching
Au-Al alloys-Chemical etching
Au-B alloys-Chemical etching
Au-Cd alloy specimens-Chemical polishing
Au-Cd alloy-Electro polishing
Au-Cd alloys-Also etches dislocation, grain boundaries
Au-Cd alloys-Chemical etching
Au-Co alloys-Electro thinning
Au-Co alloys-For alloys with bellow 22 at.% Co
Au-Cr alloys-Cast alloys with < 41.5 at % Cr and > 95 at.% Cr
Au-Cr alloys-Electro thinning
Au-Cr alloys-Jet electro polishing
Au-Cr thin films-Chemical etching
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Cu3Au
Au-Cu alloy-Electro polishing
Au-Cu alloy-Electro polishing and etching
Au-Cu alloy-For alloys with 25 at.% Au
Au-Cu alloys-For cast alloys
Au-Cu-Ag Alloys-For Au-Cu-Ag alloys
Au-Cu-Ag alloy-Au-36 at.% Cu-11 at.% Ag
Au-Cu-Co alloys-Chemical etching
Au-Fe alloys-For cast alloys with bellow 24 at.% Fe
Au-Ga alloys-For cast alloys with less then 12.7 at.% Ga
Au-Ga system-Chemical etching
Au-Ga thin films EB evaporated on NaCl (100) substrates-Gas, aging defects
Au-Ge alloys-For cast alloys with < 2.5 at.% Ge
Au-In alloy specimens-Chemical polishing
Au-In-Pb system-Alloys with 40-95 wt.% Pb, 30-5% AuIn2 may be examined unetched
Au-In-Te-Chemical etching
Au-Mn alloy-Electro thinning
Au-Mn alloys-Electrolytic polishing
Au-Ni alloys-Electro polishing
Au-Ni-Fe system-Fe-4Au-2Ni
Au-Ni-Fe system-Used on gold plated Ni-Fe alloys for intermediate layer diffusion
Au-Sn-Pb alloys-AuSn-Pb section of diagram Au-Sn-Pb
Au-Sn-Pb alloys-Chemical etching
Au-Ti alloys-For cast alloys < 12.3 at.% Ti
Au-V alloy (Au4V)-Electro thinning
Au-V alloys-For cast alloys with < 60 at.% V and > 41.5 at.% V
Au-V system-Chemical etching
Au-Zn alloys-For cast alloys with < 30 at.% Zn
Au-Zn as an evaporated metal contact on InGaAsP/InP(100)-Chemical ecthing
Au/TiW thin films on Al film deposited on (111) silicon wafers-xgas, blister forming
Au2Bi specimens as Bi-Au2Bi-Chemical etching
Au2Bi specimens-Chemical etching
Au2Cs specimens-Chemical etching-Aqua regia, dilute
Au2Ga thin films-Ionized gas thinning
AuAg(x) single crystal ingots-Chemical etching
AuGa2 (100) oriented thin films on NaCl-Chemical etching
AuGe (13%) alloy as Au/AuGe/Ni evaporated multilayered films-Chemical etching
AuGe (13%) alloy as pellets, sheets-Chemical etching
AuGe (13%) alloy ribbon-Chemical etching
AuHg alloy specimens-Chemical polishing
AuSn (20%) alloy as an evaporated thin film-Chemical etching
AuSn (20%) alloy as evaporated thin films-Chemical etching
AuSn (20%) alloy ribbon-Chemical etching
AuSn (20%) alloy ribbon-Chemical etching
AuTi thin films-Chemical thinning
Austenite grain boundaries in case-hardened steels and steels for hardening and tempering-Chemical etching
Austenite grain boundaries in case-hardened steels-Chemical etching
Austenite grain boundaries in cold-worked steels-Chemical etching
Austenite grain boundaries in cold-worked steels-Chemical etching
Austenite grain boundaries in valve steels. Hardening and tempering steels, case-hardening steels-Chemical etching
Austenitic CrNi steels-Chemical etching
Austenitic CrNi steels-Chemical etching
Austenitic and Ferritic-Austenitic stainless steels-Chemical etching
Austenitic heat resistant materials-Austenitic heat resistant materials, e.g. 80% Ni-20% Cr, 35% Ni-20%-45% Fe
Austenitic heat resistant materials-Austenitic heat resistant materials; 80% Ni-20% Cr, 35% Ni-20% Cr-45% Fe
Austenitic nickel steels-Chemical etching
Austenitic stainless steel-Fe-0.02/0.13 C-0.3/1.6Si-0.4/8.0Mn-16/27 Cr-5/21 Ni-0.1/5.0 Mo-0/0.4 Cu
Austenitic stainless steel-Fe-0.02/0.13C-0.2/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mn-0/01.9N
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.4/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo-0/0.8Nb
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-0.1/5.0Mo
Austenitic stainless steel-Fe-0.02/0.13C-0.3/1.6Si-0.7/8.0Mn-16/27Cr-5/21Ni-4.0/5.0Mo-0/0.6Ti
Austenitic stainless steels and high alloy nickel steels-Electrolytic etching
Austenitic stainless steels and high alloy nickel steels-Electrolytic etching
Austenitic stainless steels-Attacks carbides and sigma phase
Austenitic steels, CrNi steels , N-alloyed-Electropolishing
Austenitic steels, CrNi steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
Austenitic steels, CrNiMo steels-Electropolishing
B as boron nitride test blanks-Metal, removal/preferential
B grown as thin films-Growth
B single crystal ingot
B single crystal ingot-Chemical etching
B-C alloys-Chemical etching
B-C alloys-Electrolytic etching
B-Ge system-Sample preparation
B-Pt alloys-Chemical etching
B-Si alloys-Chemical etching
B1900 alloy-Ni-8Cr-6Mo-1Ti-6Al-10Co-4Ta-0.1C (+B, Zr)
B2 high temperature steel-Fe-9.3Cr-1.55Mo, high temperature ferritic-martensite steel
B2Te3 single crystal-Chemical etching
B4C ceramic with SiC-Electrolytical etching
B4C-Electrolytic etching
B4C-Electrolytic etching
B4Ge3Ol2 single crystal-Chemical cleaning
B4Si specimens-Chemical etching
BF (100) oriented thin film-Chemical etching
BN (100) cubic boron nitride-Metal, removal
BN amorphous thin films-Chemical etching
BN as pressed powder test blanks
BN as pressed powder test blanks-Chemical etching
BN as pressed powder test blanks-Chemical etching
BN as pressed powder test blanks-Chemical etching
BN single crystal films-Gas, crystallization
BP (100) and (111) single crystals-Molten flux
BP single crystal wafers-Electrolytic etching
BSG as borosilicate glass on silicon-Metal diffusion
Ba specimen-A general removal and polish etch for barium
Ba specimen-This and other single acids can be used as general etchants for barium
Ba-Zr-S system (BaZrS3)-Chemical etching
Ba2Si2TiO2 single crystal-Chemical etching
Ba2TiO3 (111) and (100) wafers, single crystals-Chemical etching-Iodine A etchant
Ba2TiO3 polycrystalline hemispheres-Cut, forming
Ba2TiO3 single crystal-Thermal processing
Ba2TiO3 specimens-Chemical polishing
BaF2 (111) specimen-Gas cleaning
BaF2 (111) wafers-Acid, float-off
BaF2 (111) wafers-Chemical polishing
BaF2 (111) wafers-Chemical polishing
BaF2 specimens-Chemical etching
BaF3 (111) wafers-Chemical etching
BaO in BaTi3O7, grain boundary etchant-Physical etching
BaSO4-Chemical etching
BaTiO3 and BaSrTiO3-Chemical etching
BaTiO3 specimens-Chemical etching
BaTiO3-Chemical etching
BaWO4 single crystal-Chemical polishing
Barium chloride (fluoride)-Chemical etching
Barium sulphate-Chemical polishing
Barium magnesium titanate-Bax-Ti(8-x)-Mgx-O16, 1.14>x>0.6
Barium sodium niobate (Ba2NaNb5O15)-This gives square etch pits with sides parallel to [110]T
Barium fluoride (BaF2)-Chemical etching
Barium fluoride (BaF2)-Chemical polishing
Barium fluoride (BaF2)-Physical etching
Barium fluoride single crystal (BaF2)-Chemical etching
Barium oxide (BaO)-Chemical etching
Barium oxide (BaO)-Chemical etching
Barium silicate (3BaO x 5SiO2)-Chemical etching
Barium titanate (Samarium doped)-Chemical etching
Barium titanate-Also used for La, Ne and Sc doped material
Barium titanate-BaTiO3, BaTi3O7
Barium titanate-Chemical etching
Barium titanate-Chemical polishing
Barium-Electro polishing
Barium-lead-titanate-zirconate-(Pb0.7Ba0.3) x (Zr0.7TiO.3)3
Barker's reagent
Baumann's print
Be (001), (100), and (110) wafers-Electrolytic polishing
Be dispersed Ni-Co-Mo alloys-Ni-4.5Mo-30Co-2 vol.% BeO
Be alloys, precipitates-Chemical etching
Be dispersed Ni-Ni-1 vol.% BeO
Be polycrystaline spheres-Thermal processing
Be single crystal-Electrolytic polishing
Be specimens-Chemical etching
Be specimens-Chemical etching
Be thin film-Acid, removal
Be thin film-Electrolytic thinning
Be thin film-Freeze etchant
Be-3% Fe alloy-Chemical etching
Be-Ag alloys-Alloys with < 10% Ag
Be-Al alloys-Alloys with < 1% Al
Be-B alloys-For alloys with up to 10% B
Be-Bi alloys-Alloy with 0.5% Bi
Be-Bi alloys-Alloy with 0.5% Bi
Be-C alloys-Chemical etching
Be-Ca alloys-For alloys with up to 1% Ca
Be-Ca alloys-For alloys with up to 1% Ca
Be-Ce alloy-Chemical cleaning
Be-Co alloys-Chemical etching
Be-Co alloys-For alloys with up to 10% Co
Be-Cr alloys-Chemical etching
Be-Cu alloys with high Cu content, Be-Ag and Be-Al-Ti alloys-Chemical etching
Be-Cu alloys-For alloys with up to 15% Cu
Be-Cu specimens-Chemical etching
Be-Fe alloys-Chemical etching
Be-Fe alloys-Electro polishing and chemical thinning
Be-Fe alloys-For alloys with up to 6% Fe
Be-Fe alloys-Jet etching
Be-Ge alloys-Chemical etching
Be-Mg alloys-Chemical etching
Be-Mn alloys-Chemical etching
Be-Mo alloys-For alloys with < 1% Mo
Be-N alloys-Chemical etching
Be-Nb alloys-For alloys with up to 10% Nb
Be-Ni alloys-For alloys with up to 10% Ni
Be-O alloys-Chemical etching
Be-Os alloys-For alloys with up to 10% Os
Be-Pd alloys-For alloys with up to 10% Pd
Be-Pt alloys-For alloys with up to 20% Pt
Be-Rh alloys-For alloys with up to 10% Rh
Be-Ru alloys-For alloys with up to 10% Ru
Be-S alloys-Chemical etching
Be-Se alloys-Chemical etching
Be-Si alloys-Chemical etching
Be-Sn alloys-Chemical etching
Be-Sn alloys-Chemical etching
Be-Ta alloys-For alloys with < 1% Ta
Be-Th alloys-For alloys with up to 10% Th
Be-Ti alloys-For alloys with < 10% Ti
Be-U alloys, Be-Nb, Be-Y, and Be-Zr alloys-Chemical etching
Be-U alloys-For alloys with up to 5% U
Be-U-Y system-Chemical etching
Be-W alloys-For alloys with < 1% W
Be-Zn alloys-For alloys with < 0.6% Zn
Be-Zr alloys-For alloys with up to 5% Zr
BeO (0001) single crystal wafers-Chemical ecthing
BeO (0001) single crystals-Mechanical, defect
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafer-Chemical etching
BeO (0001) wafers and pressed powder substrates-Chemical etching
BeO+UO2+Y2O3-Chemical etching
BeO specimens-Chemical etching
BeO-Chemical etching
BeO-Chemical etching
Beaujard and Tordeux`s tint etch for steels-Reveals grain boundaries and ferrite orientations
Beck's solution
Beraha's E reagent
Beraha's I reagent
Beraha's II reagent
Beraha's III I reagent
Beraha's III reagent
Beraha's tint etch for Al alloys-Chemical etching
Beraha's tint etch for irons, steels, tool steels
Beraha`s lead sulfide tint etch-Chemical etching
Beraha`s tint etch for Fe, Ni, or Co base heat resistant alloys
Beraha`s tint etch for stainless steels
Beraha`s tint etch for cast iron and steels
Beraha`s tint etch for iron and steels
Beraha`s tint etch for stainless steels
Beryllia (BeO)-Thermal and chemical etching
Beryllia single crystals (BeO)-Dislocation etching
Beryllia-tellurium system-Chemical etching
Beryllium-beryllia alloys (BeO)-Electro thinning by Mirand-Saulnier technique
Beryllium and its alloys-Alternative when etchant (10 ml HCl, 4 g NH4Cl, 90 ml H2O) not work
Beryllium and its alloys-Works best on coarse grained Be
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical etching
Beryllium oxide (BeO)-Chemical polishing
Beryllium oxide (BeO)-single crystal-Chemical etching
Beryllium specimens-Grinding and polishing
Beryllium specimens-Be and Be alloys
Beryllium specimens-Be and Be alloys
Beryllium specimens-Be, grain boundary etch
Beryllium specimens-Be-Ag and Be-Al-Ti alloys
Beryllium specimens-Be-U, Be-Nb, Be-Y and Be-Zr alloys
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching
Beryllium specimens-Chemical etching for Be and Be alloys
Beryllium specimens-Chemical polishing, chemical thinning, electrochemical thinning
Beryllium specimens-Chemical thinning
Beryllium specimens-Chemical thinning
Beryllium specimens-Electro thinning
Beryllium specimens-Electro thinning by Mirand-Saulnier technique
Beryllium specimens-Electro thinning by window technique
Beryllium specimens-Electro thinning by window technique and electro polishing
Beryllium specimens-Electro thinning of large specimens
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing
Beryllium specimens-Electrolytic polishing and etching
Beryllium specimens-Electrolytical etching
Beryllium specimens-Electropolishing
Beryllium specimens-Electropolishing
Beryllium specimens-Electropolishing and etching
Beryllium specimens-For most types of Be and Be alloys
Beryllium specimens-Grain boundary etch
Beryllium specimens-Grinding and polishing
Beryllium specimens-Jet electro polishing
Beryllium specimens-Jet electro polishing
Beryllium specimens-One of the best electrolyte for universal use
Beryllium specimens-Polishing and chemical etching
Beryllium specimens-Precipitates
Beryllium specimens-Precipitates, grain boundary
Beryllium specimens-Technical types of Be
Beryllium specimens-Technical types of Be. Especially with large grain siz
Beryllium-Electrolytic lapping
Beryllium-Electrolytic polishing
Beta alumina-418: 90.5% Al2O3, 9.25% Na2O, 0.25% Li2O. A: 90.2% Al2O3, 9.0% Na2O, 0.8% Li2O
Beta alumina-90.4% Al2O3, 8.9% Na2O, 0.7% Li2O
Beta alumina-90.6% Al2O3, 8.7% Na2O, 0.7% Li2O
Beta alumina-Physical etching
Beta SiC thin films grown on Si, (100) wafers-Chemical etching
Beta brass (45% Zn)-Chemical and electro polishing
Beta brass (Cu-Zn)-Alloys with 45-48% Zn
Beta brass (Cu-Zn)-Chemical polishing and electro thinning
Beta-Al2O3:Na doped substrate-Chemical cleaning
Beta-Al2O3:Na doped substrate-Cleaning
Beta-alumina-silica system-Al2O3-up to 7.5% SiO2
Beta-III titanium alloys-Chemical polishing
Beta-III titanium alloys-Ti-11.5Mo-5-6Zr-4.5Sn
Beta-III titanium alloys-Ti-11.5Mo-6Zr-4.5Sn
Beta-III titanium alloys-Ti-11.5Mo-6Zr-4.5Sn
Beta-SiC (0001) wafers-Molten flux etching
Beta-SiC (001) single crystal blanks-Ionized gas ecthing
Beta-SiC (001) single crystal blanks-Thermal cleaning
Beta-SiC thin films grown on (100) silicon-Chemical cleaning
Beta-tin (Sn)-Chemical etching
Bi (0001) wafers-Chemical etching
Bi (0001) wafers-Chemical polishing
Bi and Sb alloys-Chemical etching
Bi single crystal-Chemical etching
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys
Bi(2-y)Sb(y)Te(x)Se(3-x)-BiSbTeSe alloys
Bi-Cd alloy and single crystal specimens-Chemical etching
Bi-In alloys-Chemical etching
Bi-Mn system-Bi-MnBi eutectic
Bi-Sb-Te system-Bi0.5 x Sb1.5 x Te3+x
Bi-Sb-Te-Se system-Bi0.52 x Sb1.48 x Se0.13 x Te3.09
Bi-Sb-Te-Se system-Chemical etching
Bi-Se system-Bi2Se3+x
Bi-Sn alloy (50 at.% Sn)-Chemical etching
Bi-Te system-Chemical etching
Bi-Te-Tl alloys-Chemical etching
Bi12-GeO20 specimens-Chemical polishing
Bi12GeO20 single crystal-Chemical etching
Bi12SiO20 single crystal-Chemical etching
Bi2O3 deposited as a thin film-Chemical etching
Bi2Se3 (0001) cleaved wafers-Electrolytic, oxidizing
Bi2Se3 (0001) wafers-Chemical cleaning
Bi2Se3 (0001) wafers-Chemical polishing
Bi2Se3 single crystal ingot-Chemical polishing
Bi2Te3 (0001) wafers-Chemical ecthing
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 (0001) wafers-Chemical etching
Bi2Te3 specimens-Etchant for revealing dislocations in Bi2Te3
Bi2Te3 specimens-Thermal etching for etch pits
BiSb alloys-Chemical polishing
BiSb single crystals Te doped-Dislocation etching
BiSn alloy and single crystal specimens-Chemical etching
BiTe and BiSe-Electrolytic etching
BiTe and GaP-Chemical etching
Billig's etchant
Bismuth-single crystal-Electro polishing
Bismuth-single crystal-Etching for etch pits
Bismuth specimens telluride-Electro jet polishing
Bismuth specimens-Bi-Sn eutectic, Bi-Cd alloys
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical etching
Bismuth specimens-Chemical polishing and etching
Bismuth specimens-Electro polishing
Bismuth specimens-Electro polishing
Bismuth specimens-Electro polishing and etching
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electrolytic polishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-Electropolishing
Bismuth specimens-For pure and technically pure types of Sb
Bismuth specimens-Physical etching
Bismuth specimens-Physical etching
Bismuth specimens-Sb and Sb alloys
Bismuth specimens-Sb, Bi and their alloys
Bismuth specimens-Sb-Bi alloys
Bismuth specimens-Sb-Pb, Bi-Sn alloys
Bismuth-Electrolytic polishing
Bismuth-Electrolytic polishing
Bitter-technique
Blackburn and Williams's solution
Boron carbide (B4C)-Electrolytic etching
Boron carbide (BC)-silicon carbide system (SiC)-Electrolytic etching
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Chemical etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Electrolytic etching
Boron carbide (B4C)-Physical etching
Boron carbide B4C-Etching
Boron nitride (BN)-Chemical etching
Boron nitride (BN)-Chemical etching
Boron specimens-Chemical etching
Brass (70Cu-30Zn), and bronze parts-Chemical etching
Brass (70Cu-30Zn), bronze, and copper alloys-Chemical etching
Brass (70Cu-30Zn), bronze, and copper parts-Chemical etching-Bichromate finish dip etchant
Brass (70Cu-30Zn)-Chemical etching
Brass (70Cu-30Zn)-Scale dip or fire-off dip
Brass specimens (70Cu-30Zn)-Chemical etching
Brass specimens (Cu-Zn)-Electrolytic etching
Brass specimens and parts (70Cu-30Zn)-Chemical etching
Brass specimens-Acid, cutting
Brass specimens-Electro polishing
Brass specimens-Electrolytic etching
Brass specimens-Electrolytic polishing
Brass specimens-Electrolytic polishing
Brass specimens-Electrolytic polishing
Brass, as single crystal alpha-brass-Electrolytic polishing
Brass, bronze, and copper alloy parts-Chemical etching
Brass, bronze, and copper alloys-Bright dip etchant
Brass, bronze, and copper alloys-Chemical cleaning-Pickling's etchant
Brasses (Cu-Zn) specimens-Electro polishing
Brasses, alpha bronze, Alpaca, Cu-Be, Cu-Cr, Cu-Mn, Cu-Ni, and Cu-Si alloys-Chemical etching
Brilliant etchant
Bronze (up to 6% Sn)-Electrolytic polishing
Bronze (up to 9% Sn)-Electrolytic polishing
Bronze and brass cryogenic trailer piping-Chemical cleaning
Bronze and brass cryogenic trailer piping-Chemical cleaning
Bronze artifact-Chemical etching
Bronze specimen-Chemical etching
Bronze specimens-Electropolishing
Bronze-Electropolishing
C (0001) cleaved pyrolytic graphite-Physical etching
C (0001) specimens-Molten flux etching
C as natural graphite-Chemical etching
C as both carbon and graphite parts-Chemical etching
C as bulk graphite or thin film deposit-Acid reduction
C as bulk graphite or thin film deposit-Chemical etching
C as graphite single crystal material-Stress, defect
C as natural graphite specimens-Chemical etching
C as single crystal graphite specimens-Gas oxidation
C as single crystal graphite specimens-Metal decoration
C as single crystal graphite-Cleave
C as thin films-Cleaning
C doped Nb-Al alloy-Nb3Al + up to 0.4 at.% C
C specimens-Chemical cleaning
C4F8 (octofluorocyclobutane)
CMSX-6 alloy-Electro polishing
CO2 as solid "Dry Ice"-Alcohol, chilling
CO2 single crystal-Cryogenic gas, forming
CP4 Etch
Ca metal-acid, reactive
Ca metal-metal, reactive
Ca pure metal specimens-Oxidation
Ca specimens-Chemical removal
Ca(x)Zr(10-x)O(y)-Chemical etching
Ca-Co alloy-Approx. Cu5Ca
Ca-In alloys-Chemical etching
Ca-Yb system-Electrolytic polishing
Ca2B6O11 x 5H2O (010) cleaved wafers-Chemical etching
Ca2N3 thin films-Chemical etching
Ca3Al2Ge3O12 single crystal ingot-Chemical cleaning
Ca5(PO4)1F-Nd single crystals-Chemical etching
Ca5(PO4)3F-Physical polishing
CaCO3 (1011) cleaved substrates-Chemical polishing
CaCO3 (1011) cleaved wafers-Dislocation etching
CaCO3 (10l1) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Acid cleaning
CaCO3 r(1011) cleaved wafers-Acid cleaning-EDTA etchant
CaCO3 r(1011) cleaved wafers-Dislocatiin etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3 r(1011) cleaved wafers-Dislocation etching
CaCO3-Chemical polishing
CaF2 (100) cleaved wafers-Cleaning
CaF2 (100) thin films deposited on GaAs, (100) substrates-Chemical etching
CaF2 (111) cleaved wafers-Chemical etching
CaF2 (111) cleaved wafers-Dislocation etching
CaF2 (111) wafers-Chemical etching
CaF2 natural fluorite crystals-Chemical polishing and cleaning
CaF2 specimen-Chemical etching
CaF2 specimen-Chemical etching
CaF2 specimen-Chemical etching
CaF2 specimens-Cleaning
CaMoO4 single crystals
CaO, MgO-Chemical etching
CaO-Chemical etching
CaSiF2 single crystals-Chemical etching
CaSnF2 thin film-Chemical etching
CaTiO3-Chemical etching
CaW04 (100) wafers-Chemical etching
CaW04 single crystal specimens-Chemical polishing
CaW04 single crystal specimens-Dislocation etching
CaWO4 (001) wafers-Chemical etching
CaWO4 (001) wafers-Chemical etching
CaWO4 (001) wafers-Chemical etching
CaWO4 single crystal specimens-Chemical polishing
CaWO4 single crystals-Pressure processing
Cadmium selenide (CdSe) single crystal-Etch for (0001) facet
Cadmium selenide (CdSe) hexagonal single crystal-Chemical etching
Cadmium selenide (CdSe)-Chemical ecthing
Cadmium single crystal-Chemical etching
Cadmium single crystal-Chemical polishing
Cadmium single crystal-Chemical polishing
Cadmium single crystal-Chemical-mechanical polishing
Cadmium specimens-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cadmium specimens-Cathodic etching
Cadmium specimens-Cd and Cd alloys, Tl
Cadmium specimens-Cd and solder alloys containing Cd, Tl
Cadmium specimens-Cd, In, Tl, In-Sb and In-As alloys
Cadmium specimens-Cd-Sn and Cd-Zn eutectics
Cadmium specimens-Chemical etching
Cadmium specimens-Chemical thinning
Cadmium specimens-Electro polishing
Cadmium specimens-Electro-mechanical polishing
Cadmium specimens-Electrolytic etching
Cadmium specimens-Electrolytic polishing
Cadmium specimens-Electrolytic polishing
Cadmium specimens-Electropolishing
Cadmium sulphide (CdS) single crystal-Chemical etching
Cadmium sulphide (CdS) single crystals-Chemical polishing and etching
Cadmium sulphide (CdS) single crystals-Chemical polishing and etching
Cadmium sulphide (CdS)-Chemical etching
Cadmium sulphide (CdS)-Chemical etching
Cadmium sulphide (CdS)-Chemical polishing
Cadmium sulphide (CdS)-Chemical polishing and etching
Cadmium sulphide (CdS)-Electro-mechanical polishing and etching
Cadmium sulphide (CdS)-Removal of surface damage
Cadmium telluride (CdTe) single crystal-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing
Cadmium telluride (CdTe)-Chemical polishing and etching
Cadmium telluride (CdTe)-Chemical polishing and etching
Cadmium telluride (CdTe)-Dislocation etching
Cadmium telluride (CdTe)-This will remove work hardened layer
Cadmium telluride (CdTe)-To distinguish from Cd(x)Hg(1-x)Te, CdTe may be stained with above etchant
Cadmium-Chemical polishing
Cadmium-Chemical polishing
Cadmium-Copper (Cd-Cu)-Electric contact material
Cadmium-Electrolytic polishing
Cadmium-Electrolytic polishing
Cain's 'B' etchant
Calcium fluoride (CaF2)-Chemical etching
Calcium fluoride (CaF2)-Chemical etching
Calcium fluoride (CaF2)-Etch pit etch
Calcium fluoride (CaF2)-Etching for etch pits
Calcium fluoride (CaF2)-Final chemical polishing
Calcium fluoride (CaF2)-Jet chemical thinning
Calcium fluoride (CaF2)-Thermal etching
Calcium fluoride (CaF2)-This etchant produce etch pits parallel to <111> cleavage planes
Calcium fluoride (CaF2)-This will produce etch pits
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium oxide (CaO)-Chemical etching
Calcium phosphate-Ca3(PO4)2
Calcium specimen-Electro polishing
Calcium tartrate crystals-CaC4H4O6 x 3H2O
Calcium zirconate (Ca0.16 xZr0.34 x O1.84)-Chemical etching
Californium-Chemical etching
Can be used for all compositions-Chemical etching
Carapella's reagent
Carbides in steels-Chemical ecthing
Carbon (diamond)-Chemical etching
Carbon (graphite carbon fibre composite)-Chemical etching
Carbon alloys-Electropolishing
Carbon and alloy steel specimens- For sulfide and oxide inclusions
Carbon and alloy steel specimens-Carbon segregation
Carbon and alloy steel specimens-Carburization and decarburization
Carbon and alloy steel specimens-Dendritic structure of cast steel specimens
Carbon and alloy steel specimens-Dendritic structure of cast steel specimens
Carbon and alloy steel specimens-Grain size, weld examination
Carbon and alloy steel specimens-Phosphorus rich areas, banding
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks
Carbon and alloy steel specimens-Segregation, porosity, hardness penetration, cracks, inclusions, dendrites
Carbon and alloy steels with medium carbon content-Detection of overheating and burning
Carbon and alloy steels with medium carbon content-Examination of inclusions
Carbon and alloy steels with medium carbon content-For austenite grain boundaries
Carbon and alloy steels with medium carbon content-For resolution of hardened structures
Carbon and alloy steels with medium carbon content-General structure
Carbon and alloy steels with medium carbon content-General structure
Carbon and alloy steels with medium carbon content-General structure (most used etchant for routine work)
Carbon and alloy steels with medium carbon content-Reveals intergranular oxidation
Carbon and alloy steels with medium carbon content-Reveals lead inclusions
Carbon and alloy steels-Develops ferrite grain boundaries in low carbon steels
Carbon and alloy steels-Etches some alloy steels
Carbon and alloy steels-For contrast etching
Carbon and alloy steels-For detection of overheating and burning
Carbon and alloy steels-For general structure
Carbon and alloy steels-For grading inclusions
Carbon and alloy steels-For resolution of hardened structures
Carbon and alloy steels-Good general-purpose electrolyte
Carbon and alloy steels-Produces good contrast in as-quenched martensitic structures
Carbon and alloy steels-Reveals integranular oxidation
Carbon and alloy steels-Reveals lead inclusions
Carbon and alloy steels-Reveals lead inclusions by coloring them red
Carbon and alloy steels-Reveals maximum detail in pearlite, untempered and tempered martensite
Carbon and alloy steels-Reveals pearlite colonies
Carbon dioxide (CO2)-Gas oxidation
Carbon specimens-Chemical cleaning
Carbon specimens-Chemical etching
Carbon specimens-Gas cleaning
Carbon specimens-Thermal, forming
Carbon steels-Electro polishing
Carbon steels, alloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels, slloy steels, tool steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Color etching
Carbon steels-Electro polishing
Carbon steels-Electro polishing
Carbon steels-Electrolytic polishing
Carbon steels-Electrolytic polishing
Carbon-carbon composites-Chemical etching
Carbon-Chemical etching
Cast iron specimens-Electrolytic polishing
Cast iron specimens-One of the best electrolyte for universal use
Cast and carburized NiCr 8020 steel-Chemical etching
Cast iron-Chemical etching
Cast irons-Color etching
Cast irons-30% chromium irons
Cast irons-Austenite cast irons
Cast irons-Blackens cementite
Cast irons-Blacknens cementite
Cast irons-Chemical etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Color etching
Cast irons-Electropolishing-For TEM sample preparation
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-General purpose etching of all pearlitic gray, melleable and ductile cast irons
Cast irons-Good general-purpose electrolyte
Cast irons-High chromium irons
Cast irons-High chromium irons
Cast irons-High phosphorus irons
Cast irons-High-silicon irons (14 to 16% Si)
Cast irons-Observation of ferrite grains boundaries at higher magnification
Cast irons-Reveals carbide and phosphide distribution
Cast irons-Used to reveal macrostructure in white irons
Cast irons-Used to reveal macrostructure in white irons
Cast steel CrMo130L
Cast steel CrMo130L
Cast steel CrMo130L
Cast steel PK12SPL
Cast steel PK3M-L
Cast steel PK3M-L
Cd (111) and (100) single crystal wafers-Chemical polishing
Cd as single crystals and alloy specimens-Chemical etching
Cd dislocation free single crystals-Mechnical, defect
Cd powder used for epitaxy growth of CdSe and (Cd,Se)(1-x)Zn(x)-Chemical cleaning
Cd pre-forms and alloy wire-Chemical cleaning
Cd single crystal specimens-Chemical thinning
Cd single crystal specimens-Physical etching
Cd single crystal wafer-Mechanical, orientation
Cd single crystals-Dislocation etching
Cd specimens and alloys-Chemical cleaning
Cd specimens-Chemical polishing
Cd spheres-Plastic, forming
Cd tellerude-CdTe2O5
Cd-Ag alloys-Chemical etching
Cd-Cu alloy-Cd-CuCd3 eutectic
Cd-Ga alloys-Selective etchant for Cd to allow SEM examination
Cd-Ga-S-Se system-CdGa2S(1-x)Se(4x)
Cd-Ge alloy-Alloy with eutectic composition
Cd-Hg-Te system-Cd(0.15)Hg(0.85)Te
Cd-Hg-Te system-Chemical etching
Cd-Hg-tellerude-Dislocation etching
Cd-Hg-tellerude-Hg(1-x)Cd(x)Te
Cd-Hg-tellerude-Etching for etch pits
Cd-Mg alloy (low Mg)-Chemical polishing and etching
Cd-Mg alloy-Mg3Cd-Thinning for TEM
Cd-Pb eutectic-Chemical etching
Cd-Pb eutectic-Physical etching
Cd-Sc alloy-Alloy with 3% Sc
Cd-Zn eutectic alloys-Chemical polishing
Cd-Zn eutectic alloys-Electrolytic polishing
Cd-Zn alloys-Chemical etching
Cd-Zn eutectic alloy-Chemical etching
Cd-Zn eutectic alloy-Electro polishing
Cd-Zn eutectic alloy-Electro polishing
Cd3As2 single crystal specimen-Chemical polishing
CdF2 single crystal ingots-Thermal, annealing
CdF2 specimen-Chemical polishing
CdF2 specimen-Chemical polishing-etching
CdI2 (0001) wafers-Chemical polishing
CdIn2Se4 single crystal specimens-Chemical etching
CdIn2Se4 single crystal specimens-Chemical polishing
CdIn2Te4 wafers-Chemical polishing
CdO as a surface oxide-Chemical cleaning
CdO native oxide-Chemical etching
CdP2 deposited as a thin film on InP-Chemical etching
CdS (0001) and (1010) wafers-Chemical etching
CdS (0001) and (1013) wafers-Chemical etching
CdS (0001) wafer-Chemical etching
CdS (0001) wafer-Chemical etching
CdS (0001) wafer-Chemical ething
CdS (0001) wafer-Chemical/mechanical polishing
CdS (0001) wafers and CdSe (1010) cleaved wafer-Light, reactive
CdS (0001) wafers-Chemical cleaning
CdS (0001) wafers-Chemical cleaning
CdS (0001) wafers-Chemical etching
CdS (0001) wafers-Chemical etching
CdS (0001) wafers-Chemical etching
CdS (100) wafer-Chemical polishing
CdS (100) wafers-Chemical etching
CdS (1010) wafers-Chemical etching
CdS (1010) wafers-Chemical etching
CdS (111) wafer-Chemical etching
CdS (111) wafers-Chemical polishing
CdS (111) wafers-Chemical polishing
CdS speciman-Chemical etching
CdS single crystal specimen-Chemical and thermal etching
CdS wafers copper plated-Chemical etching
CdS-Chemical etching
CdSb (100) wafer-Chemical polishing
CdSe (0001) or (1120) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001) wafers-Chemical etching
CdSe (0001), (1010) and (1120) wafers-Chemical etching
CdSe (0001), (lOlO) and (1120)-Chemical etching
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical cleaning
CdSe (0001)-Chemical etching
CdSe (1010) cleaved wafers-Light, reactive
CdSe and (Cd,Se)xZn(1-x) single crystal thin films-Chemical etching
CdSe as a deposited polycrystalline thin film-Chemical etching
CdSe polycrystalline thin film-Chemical polishing
CdSe thin film-Chemical etching
CdSe thin film-Chemical etching
CdSe(120) n-type wafers-Chemical etching
CdSiAs2 (001) and (111) wafers-Chemical etching
CdTe (100) wafers-Chemical polishing
CdTe (100), (111) and (110) wafers-Chemical etching-EAg1 etchant
CdTe (100), (111), and (110) wafers-Chemical etching
CdTe (100), (111), and (110) wafers-Chemical etching-EAg2 etchant
CdTe (111) n-type wafers-Chemical polishing
CdTe (111) wafers and ingots-Chemical etching
CdTe (111) wafers-Acid, burn
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical etching
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Chemical polishing
CdTe (111) wafers-Dislocation etching
CdTe (111), (100) and (110) wafers-Chemical etching
CdTe (111), (100), and (110) wafers-Chemical etching-PBr etchant
CdTe (111), (100), and (110) wafers-Thermal etching
CdTe (111)-Electrolytic oxidation
CdTe single cystal ingot-Chemical cleaning
CdTe thin film-Chemical float-off
CdTe-HgTe specimens-Chemical polishing/etching
Ce-Ag alloys-Chemical etching
Ce-Ag alloys-Chemical etching
Ce-Al alloy-Anodising
Ce-Au alloys-Chemical etching
Ce-Bi system-Chemical etching
Ce-Co alloys (CeCo5)-Electro polishing
Ce-Co alloys-Chemical etching
Ce-Mg alloys-Alloys with 0-10 wt.% Mg
Ce-Mn alloys-Alloys with 0-20 at.% Mn
Ce-Ni alloy (Laves phase CeNi2)-Chemical etching
Ce-Zn alloys-Chemical etching
CeAl3 single crystal-Chemical etching
CeB6 ingots-Thermal annealing
CeBr (001) specimens-Metal decoration
CeBr (100) specimens-Chemical polishing
CeC2-Chemical etching
CeCu6 single crystal-Chemical etching
CeO2 or Ce2O3 specimens-Chemical etching
CeO2-Chemical etching
CeO2-Chemical etching
CePt specimens-Chemical etching
CeSi2 specimens-Chemical etching
Cellulose nitrate-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Chemical etching
Cemented carbides (Co)-Electrolytic etching
Cemented carbides, Kovar (Fe)-Chemical etching
Ceramic Cr-SiO (30%)-Chemical etching
Ceramic Cr-SiO (30%)-Chemical etching
Ceramic specimens-Metal, contacts
Ceramic-EBSD sample preparation
Ceramics, carbides-ThC (toxic)
Ceramics, borides (Cr, Mo)-CrB2, MoB2
Ceramics, borides (Hf, Nb)-HfB2-NbB2 mixtures
Ceramics, borides (Ta, La)-TaB2, LaB4
Ceramics, borides (Ti)-TiB2
Ceramics, borides (Ti)-TiB2
Ceramics, borides (Zr)-ZrB2
Ceramics, borides (Zr, Ti)-ZrB2, TiB2
Ceramics, carbides (B)-B4C
Ceramics, carbides (Cr, Hf, V, Al)-CrC, HfC, VC, (Al, Ti)C
Ceramics, carbides (Fe, Si)-(Fe, Si) C
Ceramics, carbides (Mo, Cr)-MoC2, CrC2
Ceramics, carbides (Nb)-NbC, NbC2
Ceramics, carbides (Pu)-PuC (dendritic), toxic
Ceramics, carbides (Pu)-PuC (toxic)
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Si)-SiC
Ceramics, carbides (Ta)-Ta(C, N, O)
Ceramics, carbides (Ta)-Tac
Ceramics, carbides (Th)-(Th, U)C (toxic) with U/Th ratio. ThC2 (toxic)
Ceramics, carbides (Th)-(Th, U)C2 (toxic)
Ceramics, carbides (Th)-ThC (toxic)
Ceramics, carbides (Th)-ThC2 (toxic)
Ceramics, carbides (Ti)-TiC
Ceramics, carbides (Ti, Ta)-TiC, TaC
Ceramics, carbides (U)-(U, Pu)C high in U. UC-PuN mixtures (toxic)
Ceramics, carbides (U)-(U, Pu)C. Toxic
Ceramics, carbides (U)-UC, U(C, O), UC-UC2, UC2-U2C3 mixtures, (U, Pu)C high in C. U(C, N) UC-ZrC
Ceramics, carbides (U)-UC-Cr23C6 mixtures (toxic)
Ceramics, carbides (U)-UC-Pu mixtures (toxic)
Ceramics, carbides (U, Pu)-(U, Ou)C high in Pu. Toxic
Ceramics, carbides (W)-WC
Ceramics, carbides-KC
Ceramics, carbides-ThO2 (toxic)
Ceramics, nitrides (Al)-(Al, Ti)N
Ceramics, nitrides (Nb)-NbN (yelow), Nb2N (light red)
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4
Ceramics, nitrides (Si)-Si3N4, UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN (toxic)
Ceramics, nitrides (U)-UN, UN-U2N mixtures (toxic)
Ceramics, nitrides (U)-UN-U(N2O)-U2N3 mixtures (toxic)
Ceramics, nitrides (U)-UN-U2N3 mixtures (toxic)
Cerium oxide (CeO2)-Chemical etching
Cerium oxide-Chemical etching
Cerium oxide-silicon nitride system-(1Si3N4:1CeO2)
Cerium specimens-Chemical etching
Cerium specimens-Chemical etching
Cerium specimens-Chemical etching
Cerium specimens-Chemical solution
Cerium specimens-Electro polishing
Cerium specimens-Electro polishing
Cermets (Cr, U)-Cr23C6-UF2 (toxic), US-U (toxic), UC2-UNi5 (toxic)
Cermets (Nb)-NbCz-NbFe-Nb
Cermets (Ti)-TiCN-Co, TiN-Fe, TiN-Mo, TiN-W
Cermets (Ti)-TiC-Ni
Cermets (U)-PuC-Pu (toxic)
Cermets (U)-UN-U, UN-W (toxic)
Cermets (U)-UO2-Al (toxic)
Cermets (U)-UO2-Cr (toxic)
Cermets (U)-UO2-Mo (toxic)
Cermets (U)-UO2-Nb (toxic)
Cermets (U)-US-Co, UC22-Fe, (UZr)C-Nb, (UZr)C-Ta, (UZr)C-W (toxic)
Cermets (Y)-(Y3Al)C-Y3C-Y
Cermets (Zr, Th, W, U)-ZrO2-W, ThO2-W, W2C-W, UC-Cr, UC-Fe, UC-Ni, UC-UFe2
Chemical and electrolytic polishing of cobalt and cobalt alloys
Chen-Hendrickson's etchant
Chi phase (M18C or Fe36Cr12Mo10) in steels-Chemical etching
Chlorine water-Acid, disinfectant
Chlorine-Electrolytic, gas jet
Chlorine-Gas etching
Chrome etchant
Chrome-regia etchant
Chromium and chromium alloys-Electropolishing
Chromium and chromium alloys-Electropolishing
Chromium and chromium alloys-Electropolishing
Chromium and its alloys-Electropolishing
Chromium boride (CrB2)-Chemical etching
Chromium films-Chemical etching
Chromium films-Physical etching
Chromium oxide (Cr2O3)-Chemical etching
Chromium plating-Electropolishing
Chromium specimens-Cr and Cr base alloys
Chromium specimens-Chemical etching
Chromium specimens-Chemical etching
Chromium specimens-Chemical etching
Chromium specimens-Cr and Cr alloys
Chromium specimens-Cr and Cr base alloys. Fe-Cr alloys and V
Chromium specimens-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Chromium specimens-Cr, Nb, and alloys
Chromium specimens-Electro mechanical polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro polishing
Chromium specimens-Electro thinning for electron microscopy
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic and chemical etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching
Chromium specimens-Electrolytic etching and electro thinning
Chromium specimens-Electrolytic polishing
Chromium specimens-Electrolytic polishing
Chromium specimens-Electropolishing
Chromium specimens-Electropolishing
Chromium specimens-Good general-purpose elctrolyte
Chromium specimens-Physical etching
Chromium specimens-Physical etching
Chromium specimens-Produces etch pits on surface near to (111)
Chromium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Chromium-Chemical-Mechanical polishing
Chromium-copper (Cr-Cu)-Electric contact material
Chromium-Electrolytic polishing
Chromosulfuric acid
Cl2 single crystal-Pressure
Co (0001) wafers-Co (0001) wafers and other orientations used in a structure study
Co (0001) wafers-Electrolytic polishing
Co (0001) wafers-Electrolytic polishing
Co alloys-Chemical etching
Co alloys-For cobalt oxides and sulphides
Co alloys-For grain boundaries. Co-97.2 Cu alloy
Co alloys-Revels oxide in sulphides
Co and Co-Al alloys-Chemical etching
Co borides-Chemical etching
Co oxide (CoO) single crystal-Chemical etching
Co oxide (CoO)-Chemical etching
Co oxide (CoO)-Electro thinning
Co oxide (CoO)-Physical etching
Co oxide single crystal-Chemical etching
Co oxide single crystal-Chemical etching and electro thinning
Co silicides-Chemical etching
Co specimens-Physical etching
Co spheres-Electrolytic polishing
Co superalloys-Chemical etching
Co superalloys-Chemical etching
Co-Al alloys-Chemical etching
Co-Al alloys-Electrolytic etching
Co-B alloys-Chemical etching
Co-B compounds-Chemical etching
Co-C-Si-W-Fe-Cr alloy-64Co-1.2C-1.1Si-4.8W-0.25Fe-28.6Cr, Stellite 6
Co-Ce alloys (Co5Ce)-Chemical etching
Co-Ce-Al alloy-Ce(1-x) Al (x) Co5, 0< x < 0.6
Co-Ce-Al alloy-Co5CeAl0.2
Co-Ce-Cu-Fe alloys-Approx. Co(3.5)Fe(0.5)CuCe
Co-Ce-Fe alloy-Co5CeFe02
Co-Ce-Ni alloy-Laves phase, Ce(Co(1-x)Ni(x))2 0<=x<=0.17
Co-Cr (40%)-Ni-Fe alloys-Electrolytic etching
Co-Cr alloys-Electrolytic etching
Co-Cr-C alloys-Chemical etching
Co-Cr-C alloys-Co-25.3Cr-0.25C
Co-Cr-C alloys-Co-25/33 Cr-0.2/0.3 C
Co-Cr-C alloys-Co-41Cr-2.4C
Co-Cr-C alloys-Preferential etch for non-carbides
Co-Cr-Mo alloys-Chemical etching
Co-Cr-Mo alloys-Chemical etching
Co-Cr-Mo alloys-Electro thinning by Bollmann technique
Co-Cr-Mo-(Nb) dental alloys-Electrolytic etching
Co-Cr-Mo-C alloy-Co-2>Cr-5.5Mo-0.15C
Co-Cr-Mo-C alloy-Hynes Stellite 21
Co-Cr-Mo-C alloy-Vitallium or H.S.21, Co-27/30Cr-5.5Mo-0.15/0.3C
Co-Cr-Mo-C-Mn-Fe-Ni alloy-Co-28.3Cr-5.4Mo-0.26C-0.66Mn-0.39Fe-0.12Ni
Co-Cr-Mo-Ni alloys-Chemical etching
Co-Cr-Mo-Ni alloys-Chemical etching
Co-Cr-Mo-Ni-C-Fe-Si-Mn alloy-Co-28.5Cr-6Mo-2.2Ni-0.3C-0.4Fe-0.4Si-0.5Mn, HS21 alloy
Co-Cr-Mo-Ni-Fe-Si-C-Mn-Al-Ti alloy-Co-29Cr-6No-1.8Ni-0.6Fe-0.6Si-0.24C-0.2Mn-0.1Al-0.1Ti
Co-Cr-Mo-Si alloys-Tribaloy 400: 62-Co-28Mo-2Si-8Cr, Tribaloy 800: 52Co-28Mo-3Si-17Cr
Co-Cr-Ni alloys-For identification of sigma phase. Co-Cr-Ni alloys. For replica EM use Murakami reagent
Co-Cr-Ni-Ta alloy-35% Cr, 15% Ni, 6% Ta
Co-Cr-Ni-Ta carbide alloy-Co-15Cr-25Ni-13Ta
Co-Cr-Ni-W-Si-C alloy-Stellugine 778, Co-25/29Cr-1.3/22.5Ni-1.6/1.7C-8.5/11.5W-0.9/2.7Si
Co-Cr-Ta carbide alloy-Co-15Cr-13Ta
Co-Cr-W alloys-Chemical etching
Co-Cu-Ce alloys ((Co, Cu)5Ce)-Chemical etching
Co-Cu-Ce alloys ((Co, Cu)5Ce)-Electro micro and chemical etching
Co-Cu-Fe-Sm alloy-Modified Co5Sm. Etch for sintered alloy
Co-Cu-Pr alloy-(Co, Cu)5Pr
Co-Dy alloy-DyCo5
Co-Dy-Ag alloy-Co5DyAg0.2
Co-Dy-Al alloy-Co5DyAl0.2
Co-Dy-Au alloy-Chemical etching
Co-Dy-C alloy-Co5DyC0.7
Co-Dy-Cr alloy-Co5DyCr0.2
Co-Dy-Cu alloy-Co5DyCu0.2
Co-Dy-Fe alloy-Co5DyFe0.2
Co-Dy-Ga alloy-Co5DyGa0.2
Co-Dy-Ge alloy-Co5DyGe0.2
Co-Dy-Mn alloy-Co5DyMn0.2
Co-Dy-Ni alloy-Co5DyNi0.2
Co-Dy-Pb alloy-Co5DyPb0.2
Co-Dy-Pd alloy-Co5DyPd0.2
Co-Dy-Pt alloy-Co5DyPt0.2
Co-Dy-Si alloy-Co5DySi0.2
Co-Er alloys-Chemical etching
Co-Er-Al alloy-Co5ErAl0.2
Co-Er-Fe alloy-Co5ErFe0.2
Co-Fe alloys-Alloys with up to 11.2 at.% Fe
Co-Fe alloys-Chemical ecthing
Co-Fe alloys-Chemical etching
Co-Fe alloys-Fe-24-28% C
Co-Fe single crystal-Co-8 wt.% Fe
Co-Fe-Au alloys-Chemical etching
Co-Fe-C system-FeCo-0.5/2C
Co-Fe-Nb alloy-85Co-12Fe-3Nb
Co-Fe-Nb alloy-85Co-12Fe-3Nb
Co-Fe-Ni-V alloys-((Fe,Co,Ni)3) - 30 at.% Fe, 37.5 at.% Co, 7.5 at.% Ni
Co-Fe-V alloys-((Fe,Co)3V - 11/25% Fe - 64/50% Co - 25% V
Co-Fe-V alloys-49 Co - 47 Fe - 3 V
Co-Fe-V alloys-FeCo-V
Co-Fe-V, Co-Ni-V, Co-Fe-Zn alloys-Chemical etching
Co-Fe-Y alloy-Y-Co(1-x)-Fe(x)
Co-Fe-Zn alloys-Chemical etching
Co-Ga alloys-Co-48.5 at.% Ga
Co-Ga, Co-Fe-V, and Co-Ni-V alloys-Chemical etching
Co-Gd alloys (Approx. GdCo)-Chemical etching
Co-Gd alloys-Chemical etching
Co-Gd alloys-Laves phase GdCo2
Co-Gd-Al alloy-Co5GdAl0.2
Co-Gd-Fe alloy-Co5GdFe0.2
Co-Ge-Si system-Chemical etching
Co-Hf alloys (HfCo2)-Chemical etching
Co-Ho system-Approx. HoCo5
Co-Ho-Al alloy-Co5HoAl0.2
Co-Ho-Fe alloy-Co5HoFe0.2
Co-La-Al alloy-Co5LaAl0.2
Co-La-Fe alloy-Co5LaFe0.2
Co-Lu alloys-Approx. LuCo5
Co-Mo alloys-Chemical etching
Co-Mo alloys-Electrolytic etching
Co-Mo-Si alloys-55Co-35Mo-10Si
Co-Nd-Al alloy-Co5NdAl0.2
Co-Nd-Fe alloy-Co5NdFe0.2
Co-Ni-Al-Fe alloys-Chemical etching
Co-Ni-Cr alloy-Cu-29Ni-3Cr
Co-Ni-Cr carbide system-Co2Ni-Cr23C6
Co-Ni-Cr-Mo-C alloy (Vitallium)->20%Co-26% Cr-6% Mo-0.4 or 1.0% C-Ni
Co-Ni-Cr-Nb-Al superalloy-40Co-38Ni-17Cr-2.0Nb-1.5Al by weight
Co-Ni-Cr-Nb-Fe alloys-Electro polishing
Co-Ni-Cr-Ta alloys-29-31 wt.% Ni, 28-32% Co, 31-34% Cr, 3-11% Ta
Co-Ni-Cr-W-Fe alloy-Haynes No.25: Co-10Ni-20Cr-14W-3Fe (+C)
Co-Ni-Cr-W-Fe alloy-Stellite X40, Haynes 31: 55Co-25Cr-10Ni-8W-1Fe (+C,Mn,Si)
Co-Ni-O system-Approx. (Co0.81Ni0.2)O
Co-Ni-V alloy-((Co,Ni)3V-32 at.% Co-43Ni-25V)
Co-Pr alloy-Co5Pr
Co-Pr alloys-Chemical etching
Co-Pr-Al alloy-Co5Pr(x)Al(1-x)
Co-Pr-Al alloy-Co5PrAl0.2
Co-Pr-Fe alloy-Co5PrFe0.2
Co-Sb-Zr alloy-ZrSbCo
Co-Si alloy-Alloy with 11.8 at.% Si
Co-Si alloys-Chemical etching
Co-Si-Al alloys-Chemical etching
Co-Si-Ta alloy-Co-25at.% Si-5 at.% Ta
Co-Si-W alloy-Co-25at.% Si-5 at.% W
Co-Sm alloy-Co5Sm
Co-Sm alloys, grain boundary etchant-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Chemical etching
Co-Sm alloys-Sintered Co5Sm
Co-Sm-Al alloy-Co5SmAl0.2
Co-Sm-Fe alloy-Co5SmFe0.2
Co-Sn alloys-Chemical etching
Co-Sn0Sb alloys-For carbides
Co-Ta alloys-Co-Co2Ta eutectic
Co-Tb alloys-Approx. TbCo5
Co-Tb-Al alloy-Co5TbAl0.2
Co-Tb-Fe alloy-Co5TbFe0.2
Co-Ti in carbide system-Co-2.3/5 mol.% TiC
Co-Tm alloys-Approx. Co5Tm
Co-V alloy-Co3V
Co-W alloys-Electrolytic etching
Co-Yb alloys-Aprox. YbCo5
Co-Zr alloys-ZrCo
Co-Zr alloys-ZrCo2
Co-base casting material and rolling stock, stellite, color etchant-Chemical etching
Co-base superalloys, color etchant-Chemical etching
Co3S4 single crystal sphere-Chemical etching
CoFe alloys-Electro thinning
CoFeO (100) wafers-Chemical etching
CoO (100) wafers-Chemical etching
CoO (100) wafers-Gas oxidation
CoO (100) wafers-Thermal processing
CoO-Chemical etching
CoSi2 (100) wafers-Dislocation etching
CoSi2 thin film grown on substrates of Si, (111) and (100)-Chemical etching
CoSi2 thin films grown on Si substrates-Ionized gas, removal
Coated Hastelloy X-Chemical etching
Coated cutting insert-Chemical etching
Coated steel sheet-Steel sheeet coated with Zn for automotive industry
Coates's etchant
Cobalt Stellite-Chemical etching
Cobalt Stellite-Chemical etching
Cobalt Stellite-Electrolytic etching
Cobalt Stellite-Show grain size, general structure
Cobalt alloys-Chemical etching
Cobalt alloys-Co + dispersed oxides, TiO2, etc
Cobalt alloys-Co silicide
Cobalt alloys-Co silicide
Cobalt alloys-Co-Cr + dispersoids alloys
Cobalt alloys-Co-In + other alloys
Cobalt alloys-Co-In rich alloys
Cobalt alloys-Electrolyticpolishing
Cobalt aluminate (CoAl2O4)-Chemical etching
Cobalt and alloys-Cemented carbides and other Co base alloys
Cobalt and alloys-Chemical etching
Cobalt and alloys-Co base wear resistant alloys and materials used for cutting tools
Cobalt and alloys-Co-Fe alloys
Cobalt and alloys-Co-Ga alloys
Cobalt and alloys-Co-Sm alloys
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Grain boundary etch
Cobalt and alloys-Pure Co, Co base superalloys
Cobalt and alloys-Pure Co, Co-Al alloys
Cobalt and alloys-Pure Co, Co-Fe alloys, WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-Stellite up to 70% Co, Co base superalloys, Co silicides
Cobalt and alloys-WC-TiC-(Ta, Nb)C-Co tye cemented carbides
Cobalt and alloys-WC-TiC-NbC-Co type cemented carbides
Cobalt and alloys-WC-TiC-TaC-Co and WC-NbC-Co type cemented carbides
Cobalt and cobalt alloys-2V-Permendur, some stellites. Shows general structure and porosity
Cobalt and cobalt alloys-Chemical etching
Cobalt and cobalt alloys-Chemical etching
Cobalt and cobalt alloys-Co, Ni and Fe base high temperature alloys
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-HA 36 alloy. Shows grain size and general structure
Cobalt and cobalt alloys-HS-31, HA-151 and N-155 alloys. Shows grain size and general structure
Cobalt and cobalt alloys-High temperature alloys
Cobalt and cobalt alloys-High temperature alloys
Cobalt and cobalt alloys-Kovar (17Co-29Ni, balance Fe) cemented carbides matrix
Cobalt and cobalt alloys-NASA SP alloy (38Ni-37.4Co-14W)
Cobalt and cobalt alloys-Nimonic 90 and 100, Ni-Cr-Co, Ni-Cr-Co-Mo
Cobalt and cobalt alloys-Refractaloy, K-42-B, some Stellites
Cobalt and cobalt alloys-Refractaloys (20-30 Co-Fe base alloys)
Cobalt and cobalt alloys-Wrought Cr-Co-X alloys
Cobalt and alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cobalt and alloys-Chemical ecthing
Cobalt and alloys-Electro polishing
Cobalt and alloys-Electro thinning by window technique
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Electrolytic polishing
Cobalt and alloys-Hexagonal Co. For optical and electron microscopy
Cobalt and alloys-Physical etching
Cobalt and alloys-Worked + recrystallized Co
Cobalt and alloys-Worked + recrystallized Co
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and cobalt alloys-Electrolytic polishing
Cobalt and its alloys-Co alloys, stellites. General structure, porosity
Cobalt and its alloys-Stellite 31, 151, Inco 713 C, GMR 235, Ni 155
Cobalt and its alloys-Stellite 36 (Co)
Cobalt base alloys-Cobalt wrought alloys
Cobalt base alloys-Cobalt wrought alloys
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type)
Cobalt base alloys-Heat resistant high temperature (superalloys) (Co-Cr-X type), Hayness No, 1, 2, 3,4, 6 alloys
Cobalt base superalloy L605-Chemical etching
Cobalt hard facings alloys-Chemical etching
Cobalt oxide (CoO)-Chemical etching
Cobalt single crystal-Chemical polishing
Cobalt specimens-Cemented carbides with Co binder phase
Cobalt specimens-Co-25Cr-10Ni-8W, Co-21Cr-20Ni, and Co-3Cr-3Mo-1Nb alloys, other stellites
Cobalt specimens-Co-Cr alloys, also Stellite
Cobalt specimens-Co-Ni-Fe base alloys
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Chemical etching
Cobalt wrought alloys-Electrolytic etching
Cobalt wrought alloys-Electrolytic etching
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electrolytic polishing
Cobalt-Electropolishing
Color etching Ni-Cr alloys-Chemical etching
Color etching for ADI iron-Beraha-Martensite etchant
Complex Mg alloys containing Al, Bi, Cd, Zn-Electrolytic etching
Contrast etchant
Cooper-Chemical polishing
Cooper-Chemical polishing
Cooper-Chemical polishing
Cooper-Chemical polishing
Copper samples-Brasses containing Si. Si bronzes
Copper samples-Cu and all types of brasses. Grain contrast
Copper samples-Cu and all types of brasses. Grains and cracks
Copper samples-Cu and brasses. Grain contrast
Copper samples-Verification of stresses in brass
Copper alloys-Color etching
Copper alloys-Color etching
Copper alloys-Color etching
Copper alloys-Electrolytic polishing
Copper alloys-Electropolishing
Copper and copper alloys-Jet machinning
Copper and copper alloys-All Copper and copper alloy
Copper and copper alloys except Tin-bronze-Electro polishing
Copper and copper alloys-All brasses. produce brilliant, deep etch
Copper and copper alloys-Alpha anbd alpha + beta alloys
Copper and copper alloys-Aluminium bronze, free-cutting brass
Copper and copper alloys-Aluminium bronze, free-cutting brass
Copper and copper alloys-Attack polishing of brasses and bronzes
Copper and copper alloys-Attack polishing of coppers and some copper alloys
Copper and copper alloys-Beryllium copper and aluminium bronze
Copper and copper alloys-Brass. General macro
Copper and copper alloys-Cartridge brass, free-cutting brass, admirality, gilding metal
Copper and copper alloys-Chemical etching
Copper and copper alloys-Chemical etching
Copper and copper alloys-Cold worked brasses
Copper and copper alloys-Copper alloys of Be, Mn, and Si; nickel silver; bronzes, chromium copper
Copper and copper alloys-Copper-nickel alloys
Copper and copper alloys-Coppers and all brasses. Grains; cracks and other defects
Copper and copper alloys-Coppers and all brasses. Grains; cracks and other defects, reveal grain contrast
Copper and copper alloys-Coppers, all brasses, aluminium bronze
Copper and copper alloys-Coppers, brasses, bronzes, aluminium bronzes
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver
Copper and copper alloys-Coppers, brasses, bronzes, nickel silver, Al bronze
Copper and copper alloys-Coppers, brasses, nickel silver; darkening large areas of beta in alpha-beta brass
Copper and copper alloys-Coppers, high Cu alloys, phosphor bronze. Grain boundaries, oxide inclusions
Copper and copper alloys-Electrolytic etching
Copper and copper alloys-Electrolytic etching
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Electropolishing
Copper and copper alloys-Especially for copper and brass. For revealing the microstructure
Copper and copper alloys-Etching and attack polishing of coppers and Cu alloys
Copper and copper alloys-For Ci-Sn Alloys
Copper and copper alloys-For copper an alpha brass
Copper and copper alloys-For copper and alpha brass
Copper and copper alloys-For nickel silver and bronzes
Copper and copper alloys-For revealing the general macro-structure
Copper and copper alloys-Good contrast between tha alpha phase and beta phase in brass
Copper and copper alloys-Jet electro polishing (0.1 cm jet)
Copper and copper alloys-Jet electro polishing (0.15 cm jet) of discs
Copper and copper alloys-Silicon brass, silicon bronze. General macrostructure
Copper and copper alloys-Suitable for revealing differences in alloy concentration
Copper and copper alloys-To reveal susceptibility to stress corrosion
Copper and copper alloys-To reveal the (100) texture in copper
Copper and copper alloys-To reveal the (100) texture in copper
Copper and copper base alloys-Electropolishing
Copper and its alloys-Brass. Strain lines
Copper and its alloys-Brilliant deep etch
Copper and its alloys-Cu and all brasses
Copper and its alloys-Cu and all brasses. Emphasizes grains and cracks
Copper and its alloys-Cu and all brasses. Good grain contrast
Copper and its alloys-Cu, high Cu alloys, P-Sn bronzes. Emphasizes grain boundaries and oxide inclusions
Copper and its alloys-Silicon brass or bronze
Copper base alloys-Colour etchant
Copper-cobalt-beryllium (Cu-Co-Be)-Electric contact material
Copper-cobalt-silicon (Cu-Co-Si)-Electric contact material
Copper-cobalt-silicon (Cu-Co-Si)-Electric contact material
Copper-tungsten (Cu-W)-Electric contact material
Copper chloride (CuCl)-Chemical etching
Copper polyerystalline parts-Chemical cleaning
Copper single crystal-Chemical etching
Copper single crystal-Chemical polishing, electrolytic etching, etch pit etching
Copper single crystal-Electro etching for etch pits
Copper single crystal-Electro polishing
Copper single crystal-Etching for etch pits
Copper single crystal-Etching for etch pits
Copper single crystals-Electro polishing
Copper specimens-All types of Cu. Cartridge brass. Tombac. Muntz metal, Easily machinable brasses
Copper specimens-Al bronzes which are difficult to etch otherwise
Copper specimens-Al bronzes, Cu-Be alloys
Copper specimens-All types of Cu. Cu-Be alloys
Copper specimens-Alpha-beta brass. Special brass. Al brass. Red cast bronze. German silver. Cu-Sn alloys
Copper specimens-An extremely useful electrolyte for certain applications, but dangerous
Copper specimens-Beta brasses.German silver. Monel and Cu-Ni alloys
Copper specimens-Brasses. Alpha bronze
Copper specimens-Brasses. Especially brasses containing Co
Copper specimens-Cathodic etching
Copper specimens-Cathodic etching
Copper specimens-Chemical etching
Copper specimens-Chemical etching
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing
Copper specimens-Chemical polishing and etching
Copper specimens-Chemical thinning
Copper specimens-Color etchnat and grain size contrast of bronzes
Copper specimens-Cu, brasses, bronzes, Al bronzes, Cu-Ni and Cu-Ag alloys, German silver
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing
Copper specimens-Electro polishing and thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning
Copper specimens-Electro thinning in P.T.F.E. holder
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by Bollman technique
Copper specimens-Electro thinning by Mirand-Saulnier technique
Copper specimens-Electro thinning by modified voltage technique
Copper specimens-Electro thinning by window (W) or Bollman (B) technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electro thinning by window technique
Copper specimens-Electrolytic etching
Copper specimens-Electrolytic polishing
Copper specimens-Electrolytic polishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Electropolishing
Copper specimens-Fast, good polish and etch for Cu and Cu with oxide and sulfide inclusions
Copper specimens-For revealing the grain boundaries
Copper specimens-Grain surface etching
Copper specimens-Ion etching
Copper specimens-Most types of Cu and Cu Alloys. Cu-Ag solder layers. Mn, P, Be, Al-Si bronzes
Copper specimens-Most types of Cu and Cu Alloys. Flow lines in brass
Copper specimens-Multiple constituent Sn bronzes. Delta phase
Copper specimens-Physical etching
Copper specimens-Physical etching
Copper specimens-Physical etching
Copper specimens-Pondos reagent
Copper specimens-Thinning of Cu wire for electron microscopy
Copper specimens-This etchant reveals segregation structure and grain boundaries in 99.999% Cu
Copper thin films-Chemical etching
Copper, brasss, bronzes-Electropolishing
Copper, brasss, bronzes-Electropolishing
Copper-cobalt-beryllium (Cu-Co-Be)-Electric contact material
Copper-Color and grain contrast etchant for Cu
Copper-Electrolytic polishing
Copper-Electrolytic polishing
Copper-Electrolytic polishing
Copper-Electrolytic lapping
Copper-graphite (Cu-C)-Electric contact material
Copper-tungsten (Cu-W)-Electric contact material
Corning glass #7059 used as substrates for a-ZnGeAs2 epitaxy-Solvent cleaning
Corning glass #7059-Acid, float-off
Corning glass 7720-Chemical cleaning
Corning glass 7720-Chemical cleaning
Corning glass 7740 (borosilicate)-Chemical cleaning
Coronze CDA 638 alloy
Corrosion resistant cast steel HU-The composition is 37-41% Ni, 17-21% Cr, 2.5% max. Si, 0.35-0.75% C
Cr and Cr alloys, C-Fe alloys, Mo (grain-contrast etchant), Re and Re-base alloys, V and V-base alloys-Electrolytic etching
Cr and CrNi steels. Carbide etch. Cast iron and alloy cast iron-Electrolytic etching
Cr and Hf carbides-Chemical etching
Cr and Mo carbides-Chemical etching
Cr as evaporated deposits in vacuum systems-Chemical cleaning
Cr as evaporated deposits in vacuum systems-Chemical cleaning
Cr carbide-Ni alloy-83% carbide-15% Ni
Cr evaporated thin films-Chemical etching
Cr evaporation deposits-Chemical etching
Cr specimens-Chemical etching
Cr stainless steels-Chemical etching
Cr steel specimens-0.4.1.0 C-3.6 Cr-Fe
Cr steel-Fe-0.9/1.5C-1/8Cr
Cr steels specimens-Fe-4Cr-0.25/0.35C
Cr steels specimens-Fe-4Cr-0.3C
Cr steels-Electrolytic etching
Cr thin film deposits on glass substrates-Chrome etchant, modified
Cr thin films deposits-Chemical etching
Cr thin films-Chemical etching
Cr thin films-Chemical etching
Cr thin films-Chemical etching-Kodak EB-5 etchant
Cr thin films-Gas oxidation
Cr thin films-Physical etching
Cr, Mo, Nb, Ta, V, W and their alloys-Chemical-Mechanical polishing
Cr-alumina alloy (Al2O3)-70% Cr-30% Al2O3
Cr-Fe alloys-Electro thinning
Cr-Fe alloys-Fe-24/25Cr
Cr-Hf carbide-0.5 mol % HfC
Cr-Ir alloys-Chemical etching
Cr-Mo alloys (Mo-rich)-Chemical etching
Cr-Mo steel-Electrolytic etching
Cr-Mo steel-Fe-0.05C-10Cr-2Mo-0.5Mo-0.5Mn-0.4/0.6Si
Cr-Mo steel-Fe-0.1C-2.2Cr-0/1.5Mo
Cr-Mo steel-Fe-0.1C-2.3Cr-1Mo
Cr-Mo-Nb-V steel-Fe-0.05C-10Cr-2Mo-0.2V-up.to 0.1Nb-0.5Mn-0.4/0.6Si
Cr-N system (Cr-rich)-Chemical etching
Cr-Nb alloys-Chemical etching
Cr-Nb carbide-0.5 mol % NbC
Cr-Nb-Zr-C alloy-0.7% Zr, 1.0% Nb, 0.04% C
Cr-Ni stainless steels-Chemical etching
Cr-Ni-Fe alloys-Etching of weld structures
Cr-Ni-Si steel-Fe-0.3C-1.7Cr-3.5Ni-0.6Si
Cr-Re alloys-Thinning for electron microscopy
Cr-Rh system-Electrolytic etching
Cr-Ru alloys-Electrolytic etching
Cr-Sc alloys-May be examined unetched
Cr-Si system-For alloys with up to 40 at.% S and over
Cr-Ta boride-Chemical etching
Cr-Ta carbide-0.5 mol % TaC
Cr-Ti carbide-0.5 mol % TiC
Cr-Ti carbide-Chemical etching
Cr-Ti steels-Fe-4Cr-0.25/0.35C-0/0.2Ti
Cr-W alloys-Alloys with 29-40 at.% W
Cr-Y alloys-May be examined unetched
Cr-Zr carbide-0.5 mol % ZrC
Cr-Zr carbide-Chemical etching
Cr-Zr-C alloys-Electrolytic etching
Cr2O3 (0001) and (1011) wafers-Chemical etching
Cr2O3 (0001) wafers-Chemical etching
Cr2O3 (111) single crystal-Material growth
Cr2O3 amorphous thin films-Chemical etching
Cr2O3 thin film-Chemical etching
Cr3B2 specimens-Chemical etching
Cr3B2 specimens-Chemical etching
Cr3B2 specimens-Chemical etching
CrB2 specimens-Chemical etching
CrB2, MoB2-Chemical etching
CrSi2 thin films deposited on silicon substrates-Gas oxidation
Crowell's etchant
Cs metal specimens-Chemical etching
Cs2O (111) wafers-Chemical cleaning
CsBr (001) wafers-Alcohol polishing
CsCl single crystal-Chemical etching
CsI (100) oriented single crystal wafers-Chemical polishing/etching
Cu (100) wafers-Chemical polishing
Cu (111) single crystal wafers-Dislocation etching
Cu (111) single crystal-Chemical cleaning
Cu (111) wafers-Chemical etching
Cu (111) wafers-Electrolytic polishing
Cu (111) wafers-Gas cleaning
Cu (111) within 2-3 deg. orientation-Dislocation etching
Cu (1O0) single crystal wafers-Gas removal
Cu OFHC copper specimens-Chemical etching
Cu alloys, Cu-Si alloys-Chemical etching
Cu alloys, brasses, Cu-Be alloys, Al bronzes without eutectoid, Alpaca-Chemical etching
Cu and Cu alloy parts-Chemical etching
Cu and Cu alloy specimens-Chemical etching-General etchant
Cu and Cu alloys as sheet or foil-Chemical cleaning
Cu and Cu alloys except Sn bronze-Electrolytic polishing
Cu and Cu alloys with soft solders-Chemical etching
Cu and Cu alloys, Be bronzes-Chemical etching
Cu and Cu alloys-Chemical cleaning
Cu and Cu alloys-Chemical cleaning-Scale dip etchant
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical etching
Cu and Cu alloys-Chemical polishing
Cu and Cu alloys-Chemical polishing
Cu and Cu-base alloys-Electrolytic polishing
Cu and alloy parts-Chemical etching
Cu and alloys-For copper, brass and nickel silver
Cu bicrystals-Chemical etching
Cu brases, bronzes-Chemical etching
Cu cryogenic trailer piping-Chemical cleaning
Cu ferrite-CuO: 0.33/2.5 Fe2O3
Cu oxide (Cu2O)-Chemical polishing, thinning
Cu oxide-Chemical polishing, thinning
Cu oxides-Chemical ecthing
Cu oxides-Chemical etching
Cu oxides-single crystals-Chemical polishing
Cu parts as sheet, pans and piping-Mineral cleaning
Cu piping on cryogenic transport tailers-Chemical cleaning
Cu piping-Chemical cleaning
Cu single crystal ingots-Chemical etching
Cu single crystal specimens-Acid cleaning
Cu single crystal specimens-Chemical etching
Cu single crystal specimens-Chemical etching
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Chemical polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Electrolytic polishing
Cu single crystal specimens-Physical etching
Cu single crystal sphere-Acid oxidation
Cu single crystal sphere-Chemical etching
Cu single crystal sphere-Gas, preferential
Cu single crystal spheres-Acid oxidation
Cu single crystal spheres-Electrolytic oxide removal
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Electrolytic polishing
Cu single crystal spheres-Gas, preferential
Cu single crystal spheres-Salt, removal/preferential
Cu single crystal spheres-Thermal forming
Cu single crystal spheres-Thermal forming
Cu single crystal wafers of various orientations-Dislocation etching
Cu single crystal wafers-Chemical etching
Cu single crystal wafers-Chemical etching
Cu single crystal wafers-Dislocation etching
Cu single crystals-Chemical cleaning
Cu single crystals-Deformation
Cu specimens and copper alloys-Chemical etching
Cu specimens and copper alloys-Chemical etching
Cu specimens and parts-Chemical polishing-Copper britte dip etchant
Cu specimens-Acid cutting
Cu specimens-Chemical etching
Cu specimens-Chemical etching
Cu specimens-Chemical etching
Cu specimens-Chemical polishing
Cu specimens-Electrolytic polishing
Cu specimens-Electrolytic polishing
Cu specimens-Gas corrosion
Cu thin films evaporated on NaCl-Acid, float-off
Cu wire and OFHC copper parts-Chemical polishing/cleaning
Cu wire and coupons-Chemical cleaning
Cu-Ag alloy-Alloy with 20 wt % Ag
Cu-Ag alloys-Electro thinning
Cu-Ag alloys-Grain boundary etching (primary and deformed)
Cu-Ag-Al alloy-Electro polishing
Cu-Ag-Ni alloy-23Cu-75Ag-2Ni
Cu-Al alloy single crystal-Alloy with 0.3-0.7 at.% Al
Cu-Al alloys-Alloys with 5.5-7.5% Al
Cu-Al system-Electro thinning by Bollmann technique
Cu-Al-Fe alloy-Alloy with 9% Al and up to 4% Fe
Cu-Al-Fe alloy-Ampco 8: 6.3% Al, 2-5% Fe
Cu-Al-Mn alloys-Alloys with 3-4% Cu, 0.5 Mn
Cu-Al-Mn system-Electro thinning
Cu-Al-Ni alloy-82-83% Cu, 14-15% Al, 3% Ni
Cu-Al-Ni alloy-Chemical polishing
Cu-Al-Ni alloys-Chemical etching
Cu-Al-Ni-Fe alloy-Cu-10Al-5Ni-5Fe
Cu-Al-Si-Co alloy-Coronze CDA 638: 95Cu-2.8Al-1.8Si-0.4Co
Cu-Al-Ti alloys-Cu-2% Ti-2.3-5% Al
Cu-Al-Ti alloys-Cu-9.5Al-0.75/2.5Ti
Cu-As alloys-Chemical etching
Cu-Au alloys-Electro polishing
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electro thinning
Cu-Au alloys-Electropolishing and micro
Cu-Au alloys-Electropolishing and micro
Cu-Au alloys-Primary etching (cast structures, segregation)
Cu-Au alloys-Secondary etching
Cu-Au and Cu-Au-Zn alloys-Electropolishing
Cu-Au single crystal (Cu3Au)-Electro polishing
Cu-B alloys-Chemical etching
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning
Cu-Be alloys-Electro thinning by Bolmann technique
Cu-Be alloys-Electro thinning by Mirand-Saulnier technique
Cu-Be spring shim stock-Chemical cleaning
Cu-Be-Co alloys-Cu-2% Be-0.3% Co
Cu-Be-Ni alloy specimens-Chemical etching
Cu-Ce alloys-Electrolytic and chemical etching
Cu-Co alloy-Alloy with 2 at.% Co
Cu-Co alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Co alloys-Cast alloys <= 7 at.% Co
Cu-Co alloys-Cu-2/3% Co
Cu-Co alloys-Electro thinning
Cu-Cr alloys-Alloys with < at.% Cr
Cu-Cr eutectic alloy-Chemical etching
Cu-Cr-Zr alloy-Chemical etching
Cu-Fe alloy-Alloy with 2.5% Fe
Cu-Fe alloy-Alloy with 50% Cu
Cu-Fe alloys-Alloy with < 5.5 at.% Fe
Cu-Fe alloys-Alpha or beta brass, Cu-Fe, Cu-Co, Co, Cd
Cu-Fe single crystal-Up to 1.58 wt.% Fe
Cu-Fe, Cu-Co alloys-Electrolytic polishing
Cu-Fe-Ni alloy-19Cu-61Fe-20Ni
Cu-Fe-Ni alloys-Electro thinning by window technique
Cu-Ga alloy specimens-Chemical etching
Cu-Ga alloy specimens-Chemical etching
Cu-Ga alloys-Alloys with < 14.5 at.% Cu
Cu-Ga alloys-Beta phase quenched alloys
Cu-Ga alloys-Chemical polishing
Cu-Ga sulphide (CuGeS2 single crystal)-Chemical etching
Cu-Ga-In selenide-CuGa(x)In(1-x)Se2
Cu-Ga-Zn alloys-Cu-20.4 at.% Zn-12.5 at.% Ga
Cu-Ge alloy-Alloy with 6 at.% Ge
Cu-Ge alloy-Alloy with 8.5 at.% Ge
Cu-Ge alloy-Electrolytic polishing
Cu-Ge alloys-Alloys with < 9.5 at.% Ge
Cu-Ge alloys-Electro polishing
Cu-Ge alloys-Electro polishing
Cu-Ge alloys-Electro thinning
Cu-Ge alloys-Electro thinning by window technique
Cu-Ge alloys-Electrolytic polishing
Cu-Ge oxide system-Cu-GeO2
Cu-Ge-Sn alloys-Chemical etching
Cu-In alloy-Alloy with 9% In
Cu-In alloys-Electro thinning by window technique
Cu-In eutectoid-31.4% In
Cu-In-Se (CuInSe2)-Chemical polishing
Cu-In-Se (CuInSe2)-Chemical polishing
Cu-In-Se single crystals (CuInSe2)-Chemical etching
Cu-In-Te-Chemical etching
Cu-Mg alloys-Electro thinning
Cu-Mg-Ca alloys-Chemical etching
Cu-Mn alloys-Alloys with < 50 at.% Mn
Cu-Nb alloys-Cu-15-20Nb
Cu-Nb-Sn system-Cu-0.3/1.0Nb-0.2/0.5Sn
Cu-Ni alloys-Electro thinning
Cu-Ni alloys-Electro thinning by window technique
Cu-Ni alloys-Physical etching
Cu-Ni-Co alloys-Chemical thinning
Cu-Ni-Cr alloy-Cu-32Ni-2Cr
Cu-Ni-Fe alloy-Cathodic etching
Cu-Ni-Fe alloy-Chemical and electro polishing
Cu-Ni-Fe system-32-64% Cu, 27-46% Ni, 9-23% Fe
Cu-Ni-Fe system-50/70 at.% Cu - 33/19 at.% Ni - 15/11 at.% Fe
Cu-Ni-Mn alloy-Cu-20Ni-20Mn
Cu-Ni-Nb alloy-Cu-30Ni-1Nb
Cu-Ni-Sn alloy-Cu-15Ni-8Sn
Cu-Ni-Sn alloy-Cu-15Ni-8Sn
Cu-Ni-Ti alloy-Cu-5Ni-2.5Ti
Cu-Ni-Ti alloys-27/47Ni-7/29Cu-44/46Ti, TiNixCu(1-x)
Cu-Ni-Ti alloys-Jet electro thinning, Cu-5-16Ni-4-4.5Ti
Cu-Ni-Zn alloys
Cu-Ni-Zr alloy-Ni-30Cu+0.2Zr, alloy Monel
Cu-P alloys-Cu-5-10% P
Cu-Pb alloys-Good up to 30% Pb
Cu-Pb alloys-Selective etchant to allow SEM examination
Cu-Pd thin film-Chemical etching
Cu-Pt alloy-Chemical etching
Cu-Pt alloy-Electro thinning as Corke
Cu-Pt alloy-Electro thinning by window technique
Cu-Pt alloys-Electro etch in Corke and Amelincky's electropolish solution
Cu-Si alloy-Cu-0.24% SiO2
Cu-Si alloys-Electro polishing
Cu-Si alloys-Electro thinning
Cu-Si system-Electro thinning by Bollman technique
Cu-Si system-For alloys with 1% Si
Cu-Si system-For alloys with 17-25 at.% Si
Cu-Si-Zn alloys-Copper rich alloys
Cu-Sn (30%) standard bronze-Chemical etching
Cu-Sn alloys-Chemical etching
Cu-Sn alloys-Electro thinning by modified Mirand-Saulnier technique
Cu-Sn alloys-Electro thinning by window technique
Cu-Sn alloys-For alloys with 5 at.% Sn
Cu-Sn-Ag dental alloys-Chemical etching
Cu-Sn-As alloys-Chemical etching
Cu-Sn-Zn alloy-Cu-34 wt.% Zn-4% Si
Cu-Te alloys-Electro thinning
Cu-Ti alloys-Cu-1% Ti
Cu-Ti alloys-Electro polishing
Cu-Ti alloys-For alloys with < 5 wt.% Ti
Cu-Ti alloys-For alloys with < 9.5 at.% Ti
Cu-Ti alloys-For alloys with 1-4% Ti
Cu-V alloy-For alloys with < 14.7 at.% V and > 94 at.% V
Cu-W composite-Chemical polishing, electro polishing
Cu-Zn alloy specimens-Chemical etching
Cu-Zn alloy-Electrolytic polishing
Cu-Zn alloys (90-10 brass)-Chemical etching
Cu-Zn alloys (alpha-brass)-Chemical etching
Cu-Zn alloys (alpha-brass)-Electrolytic polishing
Cu-Zn alloys (gamma brass)-Electro thinning
Cu-Zn alloys-52.55 at.% Cu-48.45 at.% Zn
Cu-Zn alloys-58 at % Cu-42 at.% Zn
Cu-Zn alloys-Alloys with low Zn content
Cu-Zn alloys-Alloys with up to 35% Zn
Cu-Zn alloys-Copper and Cu-Zn alloys
Cu-Zn alloys-Electro polishing
Cu-Zn alloys-Electro thinning
Cu-Zn alloys-Electro thinning by Bollmann technique
Cu-Zn alloys-Electro thinning by window technique
Cu-Zn alloys-Electro thinning by window technique
Cu-Zn alloys-Electrolytic etching
Cu-Zn alloys-For alloys with < 30 at.% Zn
Cu-Zn alloys-For alloys with 38% Zn
Cu-Zn alloys-Zn rich alloys
Cu-Zn-Al alloy-47Cu-21Zn-2Al
Cu-Zn-Al alloy-Chemical etching
Cu-Zn-Al alloy-Cu68Zn15Al17
Cu-Zn-Al alloys-Electro thinning and polishing
Cu-Zn-Be alloys-Cu-20/30% Zn-0.11% Be
Cu-Zn-Ga alloys-Electro polishing
Cu-Zn-Mn alloys-44-48% Zn, 1-4% Mn
Cu-Zn-Ni alloy-IN 836: 48Cu-37Zn-15Ni
Cu-Zn-Ni alloys-45-48% Zn, 2-5% Ni
Cu-Zn-Ni-Mn alloy-Alloy IN 629: Cu-28Ni-15Ni-13Mn. alloy IN 836: Cu-38Zn-16Ni-0.1Mn
Cu-Zn-Ni-Mn alloy-Alloy IN 829: 44Cu-28Zn-15Ni-13Mn
Cu-Zn-Sn alloy-64 at.% Cu-33.5 at.% Zn-2.5 at.% Sn
Cu-Zn-Sn alloy-No etching
Cu-Zr alloy (CuZr)-Chemical etching
Cu-Zr alloys-Chemical etching
Cu-Zr alloys-For alloys with 40 wt.% Zr
Cu20 thin films-Acid oxidation
Cu2O native oxide-Oxide removal
Cu2O as a native oxide on copper surfaces-Acid removal
Cu2O as a native oxide thin film on surfaces-Oxide removal
Cu2O as a native oxide-Chemical etching
Cu2O material-Chemical polishing
Cu2O specimens-Chemical etching
Cu2O thin films-Chemical cleaning
Cu2Sb and SbAu2Sb specimens-Chemical etching
Cu3Au single crystal specimens-Electrolytic polishing
Cu3Au single crystal specimens-Electrolytic polishing
Cu4Te3 specimens-Chemical etching
Cu6PS3-halogens-Chemical etching
Cu6PS5-I single crystal-Chemical etching
CuBr single crystals-Chemical polishing
CuCl single crystals-Chemical polishing
CuGaS2 single crystals-Chemical cleaning
CuGaSe3 single crystal-Chemical etching
CuGaTe2 single crystals-Chemical etching
CuGe2P3 single crystal ingots-Chemical etching
CuI single crystals-Chemical polishing
CuInS2 (112) wafers-Dislocation etching
CuInS2 (112) wafers-Dislocation etching
CuInS2 (112) wafers-Dislocation etching
CuInS2 n-type wafers-Chemical polishing
CuInS2 n-type wafers-Photo etch-polishing
CuInS2 wafer-Chemical polishing
CuInS2 wafers-Chemical etching
CuInSe2 p-type wafers-Chemical cleaning
CuInSe2 single crystal-Chemical polishing/staining
CuInSe2 wafers-Chemical etching
CuInTe2 single crystals-Chemical etching
CuInTe2 thin films-Acid, float-off
CuInTe2 thin films-Chemical thinning
CuNi single crystal specimens-Chemical etching
CuS specimens-Chemical etching
CuZn (30%) specimens-Chemical etching
CuZn (30%) specimens-Chemical etching
Czochralski's etchant
D(100), (111), and (110) oriented wafers-Physical etching
D(111) oriented small parts-Detergent cleaning
D(111) platelets-Physical etching
D(111) single crystal specimens-Thermal processing
D(111) specimens-Sample preparation
D(111) wafers-Chemical cleaning
D(111) wafers-Ionized gas
D(111) wafers-Metal, implatantion
D, fabricated as artificial diamond
D43 alloy-Nb-10W-12V-0.1C
Deep-etching of Al-Si-For most aluminum and aluminum alloys
Delta ferrite phase in 316LS austenite stainless steel-Electrolytic etching
Determining grain structure in A356 aluminum
Determining grain structure in A356 aluminum
Deutron-Particle, transmutation
Diamond
Dickensens's reagent
Different steels-Chemical etching
Disapol A2 electrolyte
Disapol D2 electrolyte
Disapol D2 solution
Dispersion strengthened ceramics-Thermal etching
Dix-Keller's reagent
Dix-Keller's etchant
Doped ZnO-ZnO-0.5 mole % each of Bi2O3, CaO, MnO, SnO2-1 mol.% Sb2O3, ie. ZnO-2.7% Bi2O3-0.4% CaO-0.4% MnO-0.9% SnO2-3.4% Sb2O3
Duaraluminium and Al cast alloys-Chemical etching
Dow's etchant
Dual phase steel etchants-Chemical etching
Duplex stainless steel-Selective etching
Duplex stainless steel-Selective etching
Duplex stainless steel-With this etch, you can easily see your sigma phase
Duraluminium-Cathodic etching
Duraluminium-Chemical etching
Dy as single crystal spheres-Chemical etching
Dy-, Er-, Ho-, La-base alloys, RE-Co alloys-Chemical etching
Dy-Ag alloys-Chemical etching
Dy-Al alloys-Anodising
Dy-Au alloys-Chemical etching
Dy-Bi system-Chemical etching
Dy-Er alloys-Electolytic polishing and etching
Dy-Ho alloys-Electro polishing and etching
Dy-Pb system-Electro polishing
Dy-Pd alloys-Chemical etching
Dysprosium oxide-zirconia system (Dy2O3 x ZrO2)-Chemical etching
Dysprosium-Chemical etching
Dysprosium-Dy, Er, Gd, Ho base allyos. Rare earths-Co alloys
Dysprosium-Electro polishing
Dysprosium-Polishing and chemical etching
EI-IR etchant
Electroless Ni-For revealing the grain structure
Electrolyte A2
Electrolyte V2A 'Micro'
Electrolytes for TEM preparation od intermetallics
Ge (111) wafers-Electrolytic polishing
Electropolishing NiTi alloys
Epsilon phase in Pb-Sb-Sn alloys-Chemical etching
Er as an evaporated thin film-Chemical etching
Er single crystal specimens-Thermal processing
Er-Ag alloys-Chemical etching
Er-Al alloys
Er-Au alloys-Chemical etching
Er-Bi system-Chemical etching
Er-Fe system-Chemical polishing
Er-Ho alloys-Electro polishing and chemical etching
Er-Tb alloys-Electro polishing and chemical etching
Er-Y alloys-Electro polishing and chemical etching
ErH2 and ErH3-Acid, float-off
ErSi2 thin films grown on Si (100)-Thermal forming
Erbium alloys-Dy, Er, Gd, Ho base allyos. Rare earths-Co alloys
Erbium alloys-Electro polishing
Erbium alloys-Polishing, chemical etching
Erbium hydride (ErH2)-Chemical etching
Etchant for 316 SS Coreloy-This etchant should reveal the general microstructure
Etchant for copper wire-Chemical etching
Etchant for neodymium-Chemical etching
Etchant for titanium aluminide-Chemical etching
Etchant for ZnO varistor materials-For etching commercial ZnO varistors
Etchant of M-type ferrites-Chemical etching
Etchant/procedure to examine for overheated titanium-Chemical etching
Etchants for ZK60 Mg alloy-Chemical etching
Etchants for revealing prior austenite grain in alloy steels
Etches segregations in unalloyed and low alloy steels-Chemical etching
Etches the (100) texture of Cu-Chemical etching
Etching 14k gold-For alloy with 70% Cu, 20% Ag, 10% Zn and also some amount of Si
Etching Rene 80 alloy-Electrolytic etching
Etching agent for 80Ni-20Fe-Chemical etching
Etching for grain boundaries in microalloyed steel
Etching of gold-Chemical and electrolytic etching
Etching of Zr-10% Ag-Chemical etching
Etching on a 90% Pb-Sn-Grain bondaries etching
Eu-Ag alloys-Chemical etching
Eu-Pb system-Electro polishing
Eu-Zr system-Chemical etching
Eu2O3 specimens-Chemical etching
Eu2O3-Chemical etching
Eu3Sc2Fe3OI2 single crystal
Europium
Europium oxide (Eu2O3)-Chemical etching
Europium-Electro polishing
Europium-The method of Roman can be used for polishing and etching
Eutectoid steel-Fe-0.8C-0.5Mn-0.2Si
Evidence of susceptibility for intercrystalline corrosion in Al-Mg alloys-Chemical etching
Exhaust valve steel-Fe-19Cr-8Ni-0.4C
Fe (100) wafers and other orientations-Chemical etching
Fe (100) wafers used in a magnetics study-Chemical etching
Fe (100) wafers-Chemical etching
Fe (100) wafers-Dislocation etching
Fe 3% Si steel-Electropolishing
Fe as SST 305-Gas cleaning
Fe as SST 401 wire 0.020 diameter-Electrolytic forming
Fe as flat soft iron lap platens-Chemical cleaning
Fe as flat soft iron lap platens-Chemical cleaning
Fe as grey iron flame hardened-Chemical etching
Fe as grey iron specimens-Chemical etching
Fe as grey iron specimens-Chemical etching
Fe as iron alloy specimens-Ionized gas cutting
Fe as residual metal in vacuum systems-Chemical cleaning
Fe as stainless steel tubing-Chemical cleaning
Fe cast alloys-Will develop concentrations of Steatite
Fe colloidal spheres-Electrolytic forming
Fe polycrystalline discs-Electrolytic polishing
Fe polycrystalline specimens-Chemical cleaning
Fe polycrystalline specimens-Chemical etching
Fe polycrystalline specimens-Electrolytic polishing
Fe polycrystalline whiskers-Electrolytic polishing
Fe pure metal samples-Chemical etching
Fe pure metal samples-Chemical etching
Fe single crystal and polycrystalline spheres-Thermal forming
Fe single crystal spheres-Chemical etching
Fe single crystal whiskers-Chemical etching
Fe single crystal whiskers-Fe single crystal whiskers etched in this solution to observe dislocations
Fe single crystal whiskers-Thermal etching
Fe specimen-Cleaning and removal solution with some preferential attack
Fe specimens of alpha-iron-Electrolytic thinning
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical etching
Fe specimens-Chemical polishing-Marshall's solution
Fe specimens-Heat cleaning
Fe specimens-Solution used as a general removal and surface cleaning etch
Fe specimens-Solution used as a polishing etch
Fe thin films deposited by MBE on GaAs, (110) wafer substrates-Chemical etching
Fe thin films deposited by MBE on GaAs, (110) wafer-Polishing
Fe(3-x)Ti(x)O4 single crystal-Chemical etching
Fe, single crystal iron spheres-Chemical etching
Fe, single crystal iron whiskers-Dislocation etching
Fe-26Cr-1Mn alloy (oxidised)-Electro polishing and electrolytic etching
Fe-Ag alloys-Chemical etching
Fe-Al alloy-Al-Al9Fe eutectic
Fe-Al alloy-Alloy with 35.5 at.% Al
Fe-Al alloy-Alloy with 8 wt.% Fe
Fe-Al alloys-Alloys with 2-6% Fe
Fe-Al alloys-Alloys with 49-54% Fe
Fe-Al alloys-Chemical etching
Fe-Al alloys-Electro polishing
Fe-Al alloys-Electro polishing with double jet
Fe-Al alloys-Electro thinning
Fe-Al-C alloys-Alloys with 7% Al and 1-2% C
Fe-Al-C alloys-Fe-0.3C-0.5-10Al
Fe-As alloys-For alloys with 0.2-1.4% As
Fe-As alloys-For alloys with 0.6-4.6 at.% As
Fe-Au alloys-Electro polishing
Fe-Au alloys-For alloys with 4% Au
Fe-B alloy-Fe80-B20
Fe-B alloy-Fe80-B20
Fe-B alloy-Fe80-B20
Fe-B alloy-Fe83-B17
Fe-B-Si alloy-Electro thinning for TEM
Fe-Be (20%) polycrystalline wire-Electrolytic cleaning
Fe-C (1.5%)-Ni (5%) alloy specimens-Chemical polishing
Fe-C-Cr alloy-Fe-0.1C-3Cr
Fe-C-Mn alloy-Fe-0.1C-3.1Mn
Fe-C-Ni alloy-Fe-0.6C-20Ni
Fe-C-Ni alloys-Fe-0.1/0.4C-3.3/7.5Ni
Fe-C-Si alloy-Fe-0.4C-1.7Si
Fe-Co alloys-Electropolishing
Fe-Co-Al alloy-Alloy with 15% Co and 11% Al
Fe-Co-Ni alloys-Chemical etching
Fe-Co-Ni-C-Cr-Mo alloy-HY-180M steel, Fe-0.16C-14Co-10Ni-2Cr-1Mo
Fe-Co-Si alloys-Electropolishing
Fe-Co-Ti alloys-10-20% Co, 2-6% Ti
Fe-Co-Ti alloys-82% Co-12% Fe-6% Ti
Fe-Co-V alloy-Chemical etching
Fe-Cr alloy-14-18% Chromium ferrite stainless steel
Fe-Cr alloy-Electro polishing, electro etching, chemical etching
Fe-Cr alloy-Fe-10Cr
Fe-Cr alloy-Fe-26Cr
Fe-Cr alloy-Thinning for electron microscopy
Fe-Cr alloys-Alloys with 15-20% Cr
Fe-Cr alloys-Chemical etching
Fe-Cr alloys-Electro thinning
Fe-Cr alloys-Fe-10/50 at.% Cr
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn alloys-Chemical etching
Fe-Cr, Fe-Cr-Ni and Fe-Cr-Mn steels-Chemical etching
Fe-Cr-Al system-Chemical etching and thinning
Fe-Cr-Al system-Fe-10/50 at.% Cr-5/40 at.% Fe
Fe-Cr-C alloy-Chemical etching
Fe-Cr-C alloy-Chemical etching
Fe-Cr-C alloy-Electro thinning
Fe-Cr-C alloys-Fe-0.2C-5/10Cr
Fe-Cr-C alloys-Fe-0.8/1.2C-5/6Cr
Fe-Cr-C alloys-Fe-4.9% Cr-1.1% C
Fe-Cr-Co alloy-Fe-28Cr-10.5Co
Fe-Cr-Mn-C alloys-Chemical etching
Fe-Cr-Mn-Mo-C alloy-Chemical etching
Fe-Cr-Mn-Ti alloys-10Cr-4/5Si-12/16Mn-0.5/2Ti
Fe-Cr-Mo alloys-14-18 Cr-2 Mo (+ 0.05% Ti), ferritic stainless steel
Fe-Cr-Mo alloys-Fe-24Cr-3Mo
Fe-Cr-Mo-C alloy-Chemical etching
Fe-Cr-Mo-Ni alloy-Fe-29Cr-4Mo-2Ni, stainless steel
Fe-Cr-Mo-Ti alloy-Fe-13Cr-1.5Mo-2.5Ti
Fe-Cr-Nb alloy-Pseudo-binary eutectic at 13.3% Nb and 23% Cr
Fe-Cr-Ni alloy-Fe-28Cr-5Ni
Fe-Cr-Ni alloys-Alloy 800, Fe-30/35Ni-19/23Cr
Fe-Cr-Ni alloys-Fe-16/18Cr-10/14Ni
Fe-Cr-Ni-C alloy-Chemical etching
Fe-Cr-Ni-C-Mo-Mn-Si alloy-Fe-9Cr-8Ni-3Mn-3Si-4Mo-026C
Fe-Cr-Ni-Mn-C alloy-Chemical etching
Fe-Cr-Ni-Mn-Mo-Si alloy-Fe-24.5Cr-5.5Ni-3.1Mo-0.6Mo-0.4Si
Fe-Cr-Ni-Mo alloy-Fe-24Cr-3Mo-5Ni
Fe-Cr-Ni-Mo-Cu-Mn-Si alloys-U50 alloy: Fe-21Cr-7.4Ni-2.4Mo-1.8Cu-0.6Mn-0.5Si
Fe-Cr-Ni-Nb stainless steel-Fe-20Cr-25Ni-0.5Nb (+ C)
Fe-Cr-Si-Ti alloys-Fe-10/16Cr-4.5/6Si-2Ti
Fe-Cr-Ta alloy-Fe-1 at.% Ta-7 at.% Cr
Fe-Cr-Ti-Mo alloy-Fe-12Cr-2Mo-2.5Ti
Fe-Cr-Ti-Mo-Nb alloy-Fe-13Cr-2Mo-2.5Ti-1Nb
Fe-Cu-Ni alloy-Fe-2Cu-2Ni
Fe-Mn (1%) single crystal specimens-Chemical etching
Fe-Mn alloys-Alloys with 5-20% Mn
Fe-Mn alloys-Chemical etching
Fe-Mn alloys-Chemical thinning
Fe-Mn alloys-Chemical thinning
Fe-Mn alloys-Electro thinning
Fe-Mn alloys-Electro thinning
Fe-Mn alloys-Electro thinning by Bollman technique
Fe-Mn alloys-Fe-1 at.% Mn
Fe-Mn alloys-Fe-12% Mn
Fe-Mn system-Electro polishing
Fe-Mn system-Electro thinning
Fe-Mn-Al-C alloys-Electro thinning
Fe-Mn-Al-C-Co alloys-Electro thinning
Fe-Mn-Al-C-Cr alloys-Electro thinning
Fe-Mn-Al-C-Cu alloys-Electro thinning
Fe-Mn-Al-C-Mo alloys-Electro thinning
Fe-Mn-Al-C-Nb alloys-Electro thinning
Fe-Mn-Al-C-Si alloys-Electro thinning
Fe-Mn-Al-C-Ti alloys-Electro thinning
Fe-Mn-Al-C-V alloys-Electro thinning
Fe-Mn-C alloys-Fe-14% Mn-0.4% C, plus Cr, V, Mo
Fe-Mn-Si-Ti alloy-Fe-9Mn-4.7Si-2.5Ti
Fe-Mn-Zn pressed powder blanks-Chemical cleaning
Fe-Mo solid solution alloys-Chemical polishing
Fe-Mo alloys-Alloys with 1.94% Mo
Fe-Mo alloys-Alloys with 11 at.% Mo
Fe-Mo alloys-Alloys with 12-20 at.% Mo
Fe-Mo alloys-Alloys with 8% Mo
Fe-Mo alloys-Electro polishing
Fe-Mo-Al alloys-Electropolishing
Fe-Mo-C alloys-Fe-0.5/5Mo-1C with impurities
Fe-Mo-Co alloy-Chemical etching
Fe-Mo-Mn-C alloys-Chemical etching
Fe-Mo-N alloys-Alloys with 3 at.% Mo, 2-3 at.% N
Fe-Mo-Ni-C alloys-Chemical etching
Fe-N alloy-Alloys with 1.5% N2
Fe-Ni (5%)-O (15%) specimens-Chemical etching
Fe-Ni (65%) alloy specimens-Chemical etching
Fe-Ni alloys-Alloys with 3-9% Ni
Fe-Ni alloys-Chemical and electro thinning
Fe-Ni alloys-Chemical thinning
Fe-Ni alloys-Electro thinning
Fe-Ni alloys-Electro thinning by Bollman technique
Fe-Ni alloys-Electro thinning by Bollmann technique
Fe-Ni alloys-Electro thinning by Bollmann technique
Fe-Ni alloys-Electropolishing
Fe-Ni alloys-Electropolishing
Fe-Ni alloys-Fe-10-40% Ni
Fe-Ni alloys-Fe-12 at.% Ni
Fe-Ni alloys-Fe-12Ni
Fe-Ni alloys-Fe-40/80Ni
Fe-Ni alloys-Jet electro polishing
Fe-Ni alloys-Low voltage electro thinning
Fe-Ni and Fe-Co magnetic alloys-Chemical etching
Fe-Ni and Fe-Co magnetic alloys-Grain size
Fe-Ni and Fe-Co magnetic alloys-Grain size
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Grain size, structure
Fe-Ni and Fe-Co magnetic alloys-Recommended for electron microscopy. Grain size, structure
Fe-Ni and Ni-Al alloys-Chemical etching
Fe-Ni or Fe-Co alloys-Electropolishing
Fe-Ni oxide couple-Chemical etching
Fe-Ni thin film-Chemical cleaning
Fe-Ni-Al alloys-Alloys with 10-60% Fe, 30-80% Ni, 4-30% Al
Fe-Ni-Al-C alloys-Electro thinning
Fe-Ni-Al-C-Co alloys-Electro thinning
Fe-Ni-Al-C-Cr alloys-Electro thinning
Fe-Ni-Al-C-Cu alloys-Electro thinning
Fe-Ni-Al-C-Mo alloys-Electro thinning
Fe-Ni-Al-C-Nb alloys-Electro thinning
Fe-Ni-Al-C-Si alloys-Electro thinning
Fe-Ni-Al-C-Ti alloys-Electro thinning
Fe-Ni-Al-C-V alloys-Electro thinning
Fe-Ni-Al-Ti alloys-Fe-3.4Ni-1.9/2.3Al-0.7/2.1Ti
Fe-Ni-As system-Chemical etching
Fe-Ni-B alloy-Fe40-Ni40-B20
Fe-Ni-B alloy-Fe50-Ni30-B20
Fe-Ni-C alloy-Alloy with 31% Ni and 0.3% C
Fe-Ni-C alloy-Electro polishing
Fe-Ni-C alloy-Fe-24Ni-0.5C
Fe-Ni-C alloy-Fe-31Ni-0.3C
Fe-Ni-C alloys-10-40% Ni, 0.1% C
Fe-Ni-C alloys-21-33 wt.% Ni, < 0.6 wt.% C
Fe-Ni-C alloys-Alloys with 20-30% Ni and < 0.6% C
Fe-Ni-C system-Fe-27Ni-0.03C
Fe-Ni-Co alloys-Fe, 29 wt.% Ni, 18 wt.% Co
Fe-Ni-Co alloys-Iron rich alloys
Fe-Ni-Co alloys-Ni, 68% Fe, up to 15% Co
Fe-Ni-Co-Ta alloys-Fe, 18/29 Ni, 8/20 Co, 2/3 Ta
Fe-Ni-Co-W system-Fe-17/18.5 Ni-8/9 Co-5/10 W
Fe-Ni-Cr alloy-Fe-15Ni-15Cr-single crystal
Fe-Ni-Cr alloys-Very low C stainless steel
Fe-Ni-Cr heat resistant casting alloys- Used after glyceregia; outlines carbides particles, stains sigma phase
Fe-Ni-Cr heat resistant casting alloys-Attacks sigma phase with little or no effect on carbide particles
Fe-Ni-Cr heat resistant casting alloys-Blackens sigma phase without oylining other phases
Fe-Ni-Cr heat resistant casting alloys-Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys-Electrolytic etching
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for delineating general structure
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Etchant for staining or film forming
Fe-Ni-Cr heat resistant casting alloys-Intermediate etch between Vilella's and ammonium hydroxide (electrolytic)
Fe-Ni-Cr heat resistant casting alloys-Outlines carbide and sigma
Fe-Ni-Cr heat resistant casting alloys-Stains austenite, then sigma phase, then carbide particles
Fe-Ni-Cr-Al-Y alloy-Austenite alloy, FeNi45Cr20Al5Y0.02
Fe-Ni-Cr-Mo-Nb-Ti-Al alloy-Inconel 718, Fe-22Ni-19Cr-5Mo-5Nb-1Ti-0.5Al
Fe-Ni-Cr-Nb-Ti-Al alloy-Fe-40% Ni-15.8% Cr-2.5% Nb-1.6% Ti-0.20% Al+C, Mn, B, superalloy 706
Fe-Ni-Cr-Ti-Al alloys-Fe-35Ni-15Cr-3(Ti+Al), Fe-35Ni-20Cr-3(Ti+Al)
Fe-Ni-Mn alloy-Fe-19-24% Ni-3-5% Mn
Fe-Ni-Mn alloys-Fe-6-8% Ni-2-4% Mn
Fe-Ni-O alloys-Chemical etching
Fe-Ni-P alloys-Chemical and electrolytic thinning
Fe-Ni-Pt alloys-Etch for Pt rich, high Fe alloys
Fe-Ni-Ta alloy-Fe-32 at.% Ni-3 at.% Ta
Fe-Ni-Ti alloys-Chemical polishing and eletro thinning
Fe-Ni-Ti alloys-Fe-30Ni-6Ti
Fe-Ni-Ti alloys-Fe-33Ni-3Ti
Fe-Ni-Ti-Al alloy-Fe-34Ni-3Ti-0.5Al
Fe-Pd alloys-For Pd rich alloys
Fe-Pt alloys (approx. Fe3Pt)-Electro polishing
Fe-Pt alloys-Alloys with 20.5% Pt
Fe-Pt system-Chemical etching
Fe-Rh alloys-Alloy with approx. 50 at.% Rh
Fe-Sb alloys-For alloys with < 5% Sb
Fe-Si (3%) single crystal specimens-Electrolytic polishing
Fe-Si (4%) polycrystalline rods-Chemical etching
Fe-Si alloys-Electro thinning
Fe-Si alloys (1.75% Si)-Electro polishing and etching
Fe-Si alloys (3% Si)-Dislocation etch pit etch
Fe-Si alloys (3% Si)-Electro polishing
Fe-Si alloys (approx. FeSi2)-Chemical etching
Fe-Si alloys-Al, Al-Si alloys, Fe-Si alloys
Fe-Si alloys-Electro thinning
Fe-Si alloys-Electro thinning
Fe-Si alloys-Electro thinning by Bollman technique
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Electropolishing
Fe-Si alloys-Particullary good for Al-Si alloys
Fe-Si alloys-Universal electrolyte
Fe-Si single crystals-Chemical and elctrolytic etching
Fe-Si specimens and other iron alloys-Chemical etching
Fe-Si specimens-Electrolytic etching
Fe-Sn alloy (1.3% Sn)-Electro thinning
Fe-Sn alloy (Alpha-Fe alloys)-Chemical etching
Fe-Sn alloy (Alpha-Fe alloys)-Chemical polishing
Fe-Ta alloys-Alloys with low Ta
Fe-Ta alloys-Alloys with low Ta
Fe-Ti alloy (FeTi)-Chemical etching
Fe-Ti alloys-Electro thinning
Fe-Ti system (< 1.4% Ti)-Chemical polishing
Fe-Ti-Al alloys-Fe-0/24 at.% Al
Fe-V alloys (0.1 wt.% V)-Electro polishing
Fe-V alloys (0.49% V)-Electro thinning
Fe-V alloys-Chemical etching
Fe-W alloys (0.31% W)-Electro thinning
Fe-W alloys-Electro polishing
Fe-W-C alloy-Fe-0.21/0.75C-6.3/23W
Fe-W-Cr-V alloy-Fe-0.75C-18W-1.1V-4Cr
Fe-W-Mo-Cr-V-C alloy-M2 alloy, Fe-3.5W-3Mo-3.5Cr-1V-0.5C
Fe-W-Mo-Cr-V-Cr alloys-Etchants for carbides
Fe-Zn system-Actually used for distunguishing layer in galvanised plate
Fe/Ni specimen-Chemical polishing
Fe/Ni specimen-Electrolytic polishing
Fe2Al3Si3O12 as natural single crystal almandite-Chemical cleaning
Fe2Mo3O8 single crystals-Chemical etching
Fe2O3 natural single crystals-Chemical etching
Fe2O3 specimens and powder-Molten flux, removal
Fe2O3 thin film-Chemical etching
Fe3C steel specimens and iron specimens-Chemical etching
Fe3C-Fe specimens-Chemical etching
Fe3Ge2 as a crystalline deposit-Chemical etching
Fe3Ge3 thin films-Chemical etching
Fe3O4 grown as a single crystal ingot-Chemical cleaning
Fe3O4 artificial single crystal magnetite-Cutting
Fe3O4 as fine natural single crystal-Chemical cleaning
Fe3O4 single crystal-Chemical etching
Fe3O4 single crystals-Chemical etching
Fe3O4 specimen-Chemical polishing
Fe3O4 specimens-Chemical etching
FeAl intermetalics-Chemical etching
FeAl single crystal specimens-Chemical etching
FeC single crystal alloys-Chemical thinning
FeGe2 (100) and (110) wafers-Chemical etching
FeGe2 (100) and (110) wafers-Chemical etching
FeO x nH2O the natural mineral limonite-Chemical cleaning
FeO(x) as thin film-Chemical cleaning
FeO(x) thin films-Chemical etching
FeP2 as precipitate-Chemical etching
FePd (100) and crystalline thin films-Gas corrosion
FeS2 as artificial and natural single crystals-Pressure
FeS2 single crystal ingot-Chemical polishing
FeSi (7.7%) single crystal (100)-Thermal de-stress
FeSi specimens-Gas etching
FeWSi thin films deposited on silicon, (100) wafers-Chemical etching
Ferrite specimens-Thermal etching
Ferritic Cr steels-Chemical etching
Ferritic stainless steel with 17% Cr-Electropolishing
Ferritic chromium steels-Ferritic chromium steels, min. 12% Cr
Finlay's 'A' etchant (Remington's 'A' etchant)
Finlays 'B' etchant
Fisher-Marcinkowski's electropolish solution
Flat's reagent
Flick's etchant
Flick's etchant
Flint glass-Etching for revealing recrystallization effects
Flow lines in low carbon N2 steels, convertor steels-Chemical etching
Fluorapatite-Cu5FP3O12-Chemical polishing
Fluorine specimen
For most Al materials and Al alloys-Chemical etching
For most Al type alloys, Al-Be alloys-Chemical etching
For most Al types an alloys, especially Cu-containing alloys-Chemical etching
For most Al types and alloys except for Al alloys with high Si content, Al foils-Chemical etching
For most Ti materials and Ti alloys, Ti-Mn and Ti-V-Cr-Al alloys-Chemical etching
For most Ti materials, especially for Ti-Al-V-(Sn) alloys-Chemical etching
For most alloys of RE metals, CeMM alloys-Chemical etching
Frank's reagent
Fry's reagent (1)
Fry's reagent (2)
GTD-111 alloy etching-Be careful of overetching
GX6CrNi13-4 steel-Electrolytic-potentiostatic isolation of residues
GX6CrNi13-4 steel-Sample preparation
Ga (100) wafers-Chemical cleaning
Ga as a constituent in single crystal GaAs p-type wafers-Chemical etching
Ga as solid material-Chemical cleaning
Ga as solid material-Chemical cleaning
Ga as solid material-Chemical etching
Ga-As-P alloy (GaAsP)-Chemical polishing and etching
Ga-As-P specimens-(111) faces etched as cleaved. Dislocation etch in Abraham's AB etch
Ga-As-P specimens-GaAs(1-y)P(x), 0.6 >x<1
Ga-As-P system-Dislocation etching for (111)A -(111)B faces
Ga-As-P-Sb specimens-GaAs(x)Sb(y)P(1-x-y)
Ga-Au alloys-Chemical etching
Ga-Gd garnet-Gd3Ge4O12
Ga-In-As phosphide-Chemical etching
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Chemical polishing
Ga-In-As phosphide-Etching for pit etch
Ga-In-As phosphide-In a study of etching characteristics of InGaAsP/InP wafers
Ga-In-As phosphide-Selective etching for GaInAsP against InP
Ga-In-Sb specimens-In(x)Ga(1-x)Sb
Ga-Nd garnet-Nd3Ga5O12
Ga2O3 and Ga(OH)3 on GaAs, (100), p-type wafers-Chemical etching
Ga2O3 as a native oxide on gallium arsenide wafers-Chemical cleaning
Ga2O3 as native oxide on GaAs (100) wafers-Physical etching
Ga2O3 as native oxide on GaAs-Physical etching
Ga2O3 doped with iron and grown as single crystal ferrites-Chemical etching
Ga2O3 thin film growth of GaAs, (100), p-type wafers-Chemical oxidizing
GaAs (100) Si-doped wafers-Chemical cleaning
GaAs (100) Si-doped wafers-Chemical etching
GaAs (100) Te-doped wafer-Chemical cleaning
GaAs (100) Te-doped wafers-Chemical etching
GaAs (100) Zn-doped, p-type wafers-Chemical etching
GaAs (100) Zn-doped-Chemical cleaning
GaAs (100) and (111) wafers doped with Se, Te, Zn, and Pd-Dislocation etching
GaAs (100) and (111) wafers-Acid oxide removal
GaAs (100) and (111) wafers-Chemical cleaning
GaAs (100) and (111) wafers-Chemical cleaning
GaAs (100) and (111) wafers-Chemical etching
GaAs (100) and GaAs (111) wafers-Electrolytic oxidation
GaAs (100) and InSb (100) wafers-Etch cleaning
GaAs (100) ingot and wafers-Dislocation etching
GaAs (100) n+ wafers-Chemical etching
GaAs (100) n-type wafers grown by LEC as ingots-Chemical etching-Caro's etchant
GaAs (100) n-type wafers-Chemical cleaning
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching
GaAs (100) n-type wafers-Chemical etching/polishing/cleaning
GaAs (100) n-type wafers-Chemical polishing
GaAs (100) n-type, 0.001-0.04 Ohm cm resistivity wafers-Chemical thinning
GaAs (100) n/n +, Si-doped wafers-Chemical cleaning
GaAs (100) p-type wafers-Chemical cleaning
GaAs (100) p-type wafers-Chemical etching
GaAs (100) substrates-Chemical etching
GaAs (100) undoped wafers-GaAs (100) undoped wafers
GaAs (100) wafer Zn-doped-Chemical etching
GaAs (100) wafer substrates-Chemical thinning
GaAs (100) wafers Be diffused-Chemical etching
GaAs (100) wafers Cut 2 deg.-off plane toward (110)-Chemical cleaning
GaAs (100) wafers fabricated as Schottky barrier diodes-Chemical thinning
GaAs (100) wafers used as substrates for Gunn diode-Chemical etching
GaAs (100) wafers used as substrates for OMVPE growth of GaInAs and GaInP layers-Dislocation etching
GaAs (100) wafers and other low index planes-Chemical thinning
GaAs (100) wafers and other orientations-Chemical etching
GaAs (100) wafers and other orientations-Chemical etching
GaAs (100) wafers and other orientations-Dislocation etching
GaAs (100) wafers as substrates-Chemical etching
GaAs (100) wafers cut within 2-3 deg. of plane-Chemical polishing
GaAs (100) wafers cut within +/- 2 deg. of plane, Te-doped-Chemical etching
GaAs (100) wafers doped with germanium-Chemical etching
GaAs (100) wafers fabricated as diodes-Electrolytic polishing
GaAs (100) wafers ion implanted with Si, Zn, and Be-Chemical thinning
GaAs (100) wafers ion implanted with zinc-Chemical etching
GaAs (100) wafers used as substrates for LPE growth of GaAlAs-Chemical etching
GaAs (100) wafers used as substrates for MBE deposition of AlGaAs-Chemical cleaning
GaAs (100) wafers used as substrates for deposition of AlN-Chemical cleaning
GaAs (100) wafers used for epitaxy growth of InGaAs-Chemical cleaning
GaAs (100) wafers used for zinc diffusion at 85O�C-Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion at 850�C-Chemical polishing
GaAs (100) wafers used in a study of zinc diffusion-Chemical polishing
GaAs (100) wafers used to fabricate Schottky barrier diodes-Chemical polishing
GaAs (100) wafers with epitaxy grown heterostructure-Chemical etching
GaAs (100) wafers zinc diffused-Chemical etching
GaAs (100) wafers zinc diffused-Chemical etching
GaAs (100) wafers, Zn diffused-Chemical etching
GaAs (100) wafers-Cemical thinning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical cleaning
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical etching
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing
GaAs (100) wafers-Chemical polishing/cleaning
GaAs (100) wafers-Chemical thinning
GaAs (100) wafers-Dislocation etching
GaAs (100) wafers-Dislocation etching
GaAs (100) wafers-Electrolytic, oxidation
GaAs (100) wafers-Ionized gas
GaAs (100) wafers-Lift-off
GaAs (100) wafers-Metal, replication
GaAs (100) wafers-Physical thinning
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111) and (110) wafers-Chemical etching
GaAs (100), (111), (110), (211) wafers-Chemical etching
GaAs (100), Te-doped, n-type wafers-Chemical cleaning
GaAs (100), and InP, (100) wafers-Chemical thinning
GaAs (100), n-type wafers-Chemical cleaning
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), n-type wafers-Chemical etching
GaAs (100), wafers, Si or Be doped wafers-Chemical cleaning
GaAs (110) wafers were cleaved under UHV-Vacuum cleaning
GaAs (110), (111), (100) wafers-Chemical polishing
GaAs (110), (111), and (211) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical etching
GaAs (111) and (100) wafers-Chemical polishing
GaAs (111) and (100) wafers-Chemical polishing
GaAs (111) as single crystal wafers and spheres-Chemical etching
GaAs (111) n-type and undoped material-Chemical polishing
GaAs (111) wafer-Chemical etching-51 etchant
GaAs (111) wafers Cr, Te, and Zn doped-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical etching
GaAs (111) wafers and spheres-Chemical polishing
GaAs (111) wafers fabricated as Esaki diodes-Chemical polishing
GaAs (111) wafers used as substrates for epitaxy growth of Ge and ZnSe-Chemical etching
GaAs (111) wafers used in a polarity etching study-Chemical etching
GaAs (111) wafers used in a polarity study of III-V compound semiconductors-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in a polarity study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers used in an etch development study-Chemical etching
GaAs (111) wafers with (111 )Ga surface polished-Chemical polishing
GaAs (111) wafers with zinc diffusion-Chemical etching-A/B etchant
GaAs (111) wafers-Chemical cleaning
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching
GaAs (111) wafers-Chemical etching-Schell's reagent
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Chemical polishing
GaAs (111) wafers-Dislocation etching-RC-1 etchant
GaAs (111), (100) and (110) wafers-Dislocation etching
GaAs (111), (100), and (110) wafers-Chemical etching
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers-Chemical etching
GaAs (111), n-type, 5-30 Ohm cm resistivity wafers-Chemical polishing
GaAs (111)A and (TTT)B wafers-Chemical polishing
GaAs (111)A wafer surfaces-Chemical etching
GaAs (111)A wafer-Chemical etching
GaAs (111)As, (100) and (110) oriented wafers-Chemical cleaning
GaAs (111)B and (100) both n-type and undoped wafers-Chemical etching
GaAs (1OO), n-type wafers-Chemical etching
GaAs grown as a (111) ingot-Chemical etching
GaAs and GaP (100) and (111)B high n-type wafers-Chemical polishing
GaAs and GaP, etches A and B planes in GaAs-Chemical etching
GaAs and Si (100) wafers-Chemical etching
GaAs as thin film epitaxy grown on germanium substrate-Chemical etching
GaAs single crystal sphere-Chemical etching
GaAs single crystal spheres-Chemical etching
GaAs single crystal spheres-Chemical etching
GaAs specimens cut as cylinders and hemispheres-Chemical etching
GaAs wafers grown by orizontal Bridgman (HB) technique-Chemical etching
GaAs wafers of various orientations-Chemical polishing
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical etching
GaAs wafers-Chemical polishing
GaAs wafers-Chemical polishing
GaAs wafers-Electrolytic etching-SSA etchant
GaAs, (100) wafers-Chemical cleaning
GaAs-etchant for revealing twin lamellae by staining (211) and etching the (211)
GaAs-etchant for revealing twin planes
GaAs-etchant for revealing twin planes
GaAs:B (111) n-type wafers and (100) undoped wafers-Chemical etching
GaAs:Be (100) p-type wafers-Metal passivation
GaAs:Be (110) p-type wafers-Chemical cleaning
GaAs:CR (100)(SI) wafers-Chemical polishing/cleaning
GaAs:Cr (100) (SI) or n+ diffused wafers-Chemical etching
GaAs:Cr (100) (SI) wafers used as substrates for GaAs growth by MBE-Chemical cleaning
GaAs:Cr (100) (SI) wafers used as substrates-Oxide removal
GaAs:Cr (100) (SI) wafers used in a study of surface cleaning-Chemical polishing/cleaning
GaAs:Cr (100) (SI) wafers-Chemical cleaning
GaAs:Cr (100) (SI) wafers-Chemical cleaning
GaAs:Cr (100) (SI) wafers-Chemical cleaning
GaAs:Cr (100) (SI) wafers-Chemical cleaning
GaAs:Cr (100) (SI) wafers-Chemical cleaning/etching
GaAs:Cr (100) (SI) wafers-Chemical etching
GaAs:Cr (100) (SI) wafers-Chemical etching
GaAs:Cr (100) (SI) wafers-Chemical etching
GaAs:Cr (100) (SI) wafers-Chemical etching
GaAs:Cr (100) (SI) wafers-Chemical etching/polishing
GaAs:Cr (100) (SI) wafers-Chemical polishing
GaAs:Cr (100) (SI) wafers-Chemical polishing
GaAs:Cr (100) (SI) wafers-Chemical polishing
GaAs:Cr (100) (SI) wafers-Chemical polishing/etching
GaAs:Cr (100) (SI) wafers-Etch cleaning
GaAs:Cr (100) (SI) wafers-Oxidation/cleaning
GaAs:Cr (100) wafers within 1/2 degrees of plane-Chemical etching
GaAs:Cr (100) wafers-Chemical cleaning
GaAs:Cr (100), (111) (SI) and n-type Si doped wafers-Molten flux
GaAs:Cr, (100) (SI) and InP:Fe (100) (SI) wafers-Molten flux
GaAs:Cr, (100) (SI) wafers-Halogen, polish
GaAs:Te (100) n-type wafer substrates-Chemical cleaning
GaAs; Zn, (100) wafers Cut 2-3 deg.-off plane toward (110)-Chemical polishing
GaAsP wafers as highly p-type doped with Mn-Dislocation etching
GaFeO3 single crystal ingot-Acid, removal
GaN (0001) single crystal thin films-Chemical etching
GaN (0001) single crystal thin films-Electrolytic etching
GaN thin films-Chemical etching
GaN thin films grown by MBE on (0001), and (01.12) single crystals sapphire substrates to 1000 A thickness-Thermal cleaning
GaOxNy surface contamination of Gallium arsenide wafers-Chemical etching
GaP (100) and (111) wafers-Chemical polishing
GaP (100) and (111) wafers-Gas polishing
GaP (100) and (111)B, p-type, 0.2 Ohm cm resistivity wafers-Chemical polishing
GaP (100) n-type wafers-Chemical polishing
GaP (100) wafers-Chemical etching
GaP (100), (111)A and (111)B wafers-Chemical polishing
GaP (110) undoped wafers-Chemical polishing
GaP (111) and (100) wafers-Chemical polishing
GaP (111) and GaAs (111) wafers-Chemical polishing
GaP (111) and GaAs (111) wafers-Chemical polishing
GaP (111) and GaAs (111)A wafers-Chemical polishing
GaP (111) wafer-Chemical polishing
GaP (111) wafers zinc diffused-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching
GaP (111) wafers-Chemical etching-Aqua regia, modified
GaP (111) wafers-Metal decoration
GaP (111), (100), (110) wafers-Chemical polishing
GaP (111)B wafers-Chemical etching
GaP material used for growth-of AlGaAsP single crystal ingots-Chemical cleaning
GaP polycrystalline material-Chemical cleaning
GaPO4 single crystals-Chemical ecthing
GaS (100), n-type wafers-Chemical polishing
GaSb (100) both undoped and Te-doped wafers-Acid passivating
GaSb (100) both undoped and Te-doped wafers-Acid passivation
GaSb (100) undoped and Te-doped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) undoped wafers-Chemical polishing
GaSb (100) wafers Te-doped-Chemical etching--A-B etchant
GaSb (100) wafers-Chemical etching
GaSb (100) wafers-Chemical polishing
GaSb (100) wafers-Chemical, oxide removal
GaSb (100) p-type wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical etching
GaSb (111) and (100) wafers-Chemical polishing
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (111) wafers-Chemical etching
GaSb (211) wafer-Chemical etching
GaSe (0001) wafers-Mechanical, dislocation
GaTe specimens-Thermal etching for etch pits
Gadolinium molybdate (Beta-Gd2(MoO4)3)-Chemical etching
Gadolinium molybdate (Gd-Mo-O)-Etch pits etching
Gadolinium molybdate (Gd2(MoO4)3)-For revealing the antiphase boundaries
Gadolinium telluride (GdTe)-Chemical etching
Gadolinium-Chemical etching
Gadolinium-Chemical polishing and etching
Gadolinium-Electrolytic polishing
Gadolinium-pure Gd, rare earths-Co alloys. Grain boundary etch
Gallium arsenide (GaAs polycrystalline)-Chemical etching
Gallium arsenide (GaAs)- Germanium junction-Chemical etching
Gallium arsenide (GaAs)-A study of the etching characteristics
Gallium arsenide (GaAs)-Chemical and electro polishing
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical etching
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical polishing
Gallium arsenide (GaAs)-Chemical thinning
Gallium arsenide (GaAs)-Electrolytic etching
Gallium arsenide (GaAs)-Etch for selective removal
Gallium arsenide (GaAs)-Etch pits on (111) face
Gallium arsenide (GaAs)-Etching for etch pitch
Gallium arsenide (GaAs)-Etching for etch pitch
Gallium arsenide (GaAs)-For (001) face
Gallium arsenide (GaAs)-For (001) face. Anodic etch for dislocations
Gallium arsenide (GaAs)-For differentiation from InAs stain in sodium hypochloridesoln
Gallium arsenide (GaAs)-For etch pits etching
Gallium arsenide (GaAs)-For pitch etching
Gallium arsenide (GaAs)-Polishing and chemical etching
Gallium arsenide (GaAs)-Removing the surface damage
Gallium arsenide (GaAs)-Selective etch for dislocations on (111) plane
Gallium arsenide (GaAs)-The p-n junction
Gallium arsenide (GaAs)-To distingish p-n junction
Gallium arsenide (GaAs)-To distinguish between (111)Ga - (111)
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Chemical etching
Gallium antimonide (GaSb)-Growth striations are revealed by this etchant
Gallium nitride (GaN)-Electro etching
Gallium phosphide (GaP) single crystals-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical etching
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing
Gallium phosphide (GaP)-Chemical polishing and etching
Gallium phosphide (GaP)-Chemical polishing and etching
Gallium phosphide (GaP)-Chemical polishing, chemical etching
Gallium phosphide (GaP)-Chemical thinning
Gallium phosphide (GaP)-Chemical thinning
Gallium phosphide (GaP)-Etch pits on (111)A, (111)B:(100)
Gallium phosphide (GaP)-Etching (chemical polishing)
Gallium phosphide (GaP)-S doped n-type, Zn doped p-type
Gallium specimens-Chemical etching
Gallium specimens-Electro polishing
Gallium sulphide (GaS)-Dislocation etching
Gallium-selenium system (Ga-Se)-Chemical etching
Gallium-selenium system (Ga-Se)-Etch pits etching
Gallium-selenium system (Ga-Se)-Etch pits etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-Chemical etching
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For aluminium-bearing galvanized coatings
Galvanneal and hot-dipped galvanized coatings (Fe-Zn)-For tight and extra tight galvanized coatings
Galvannel and hot-diped galvanized coatings on steels
Gamma-TiAl and alpha 2-Ti3Al-Chemical etching
Gamma-prime-age hardening, Ni-base alloys, grain-boundaries etch-Chemical etching
Garnets as natural single crystals-Chemical etching
Gd single crystal specimens-Thermal etching
Gd-Ag alloys-Chemical etching
Gd-Al alloys-GdAl, Gd3Al, Gd2Al
Gd-Bi system-Chemical etching
Gd-Cd alloys-Chemical etching
Gd-Ce alloys-Chemical polishing
Gd-Fe alloy-Laves phase GdFe2
Gd-Ga garnet-Gd3Ga5O12
Gd-Ga garnet-Gd3Ga5O12
Gd-Ga garnets-Chemical polishing
Gd-Yb alloys-Electrolytic polishing
Gd3Ga5O12 (0001) wafers 3" in diameter-Ketone cleaning
Gd3Ga5O12 (110) wafers-Abrasive polishing
Gd3Ga5O12 (111) cut wafers-Chemical cleaning
Gd3Ga5O12 (111) wafers-Abrasive polishing
Gd3Ga5O12 garnet-Chemical etching
Gd3Ga5O12 garnets-Chemical etching
Gd3Se1.8Ga3.2O12 (0001) wafers-Chemical cleaning
GdN12 specimens-Chemical etching
GdTbFe thin films-Chemical etching
Ge (100) and (110) wafers-Chemical etching
Ge (100) and (111) wafers-Metal etching
Ge (100) specimens-Electrolytic machinning
Ge (100) very thin films grown by PECVD on NaCl, Ge wafers-Thermal cleaning
Ge (100) wafers and other orientations-Chemical polishing/etching-Camp #4 (CP4) etchant
Ge (100) wafers cut within 1 deg. of plane-Physical cleaning
Ge (100) wafers-Chemical etching-100 etchant
Ge (100) wafers-Chemical etching-Peroxide etchant (on germanium)
Ge (100) wafers-Vacuum cleaning
Ge (111) 5-10 Ohm cm resistivity n-type wafers-Chemical etching
Ge (111) and (100) wafers used as substrates-Chemical polishing
Ge (111) and (100) wafers-Chemical etching
Ge (111) and (100) wafers-Solution used as a preferential etch
Ge (111) and Si (111) wafers-Chemical polishing/etching-1:1:1 etchant
Ge (111) dendritic ribbon crystals-Dislocation etching
Ge (111) grown ingot with grown-in p-n junction-Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction-Electrolytic etching
Ge (111) grown ingots with grown-in p-n junction-Electrolytic etching
Ge (111) ingots with grown-in p-n junction-Electrolytic etching
Ge (111) n-type wafers-Chemical etching
Ge (111) n-type wafers-Electrolytic etching
Ge (111) n-type, 0.004-40 Ohm cm resistivity wafers-Electrolytic polishing
Ge (111) rectangular bars with grown p-n junctions-Chemical etching
Ge (111) wafer and spherical shot-Chemical etching
Ge (111) wafer with p-n junctions-Electrolytic etching
Ge (111) wafers and cylinders-Metal diffusion
Ge (111) wafers and ingots-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Chemical etching
Ge (111) wafers and other orientations-Electrolytic etching
Ge (111) wafers and other orientations-Gas oxidation
Ge (111) wafers angle lapped at 5.43 deg.-Chemical etching
Ge (111) wafers fabricated as p-n junction diodes-Chemical etching
Ge (111) wafers fabricated with indium p-n junctions-Junction testing
Ge (111) wafers lithium diffused-Chemical etching
Ge (111) wafers p-type-Chemical polishing
Ge (111) wafers used as substrates for Ge epitaxy growth-Chemical etching
Ge (111) wafers with epitaxy grown Ge layers-Gas ecthing
Ge (111) wafers with indium-Metal decoration
Ge (111) wafers with lithium diffused p-n junctions-Chemical etching
Ge (111) wafers, p-type, 4 Ohm cm resistivity-Chemical polishing
Ge (111) wafers-Abrasive, damage
Ge (111) wafers-Acid, stress
Ge (111) wafers-Chemical cleaning
Ge (111) wafers-Chemical cleaning
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching
Ge (111) wafers-Chemical etching-Camp #2 (Superoxol, CP2) etchant
Ge (111) wafers-Chemical etching-Camp #3 (CP3) etchant
Ge (111) wafers-Chemical etching-WAg etchant
Ge (111) wafers-Chemical etching-White etchant
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing
Ge (111) wafers-Chemical polishing-BJ etchant
Ge (111) wafers-Chemical polishing-X-l114 etchant
Ge (111) wafers-Chemical polishing/etching-SR4 etchant
Ge (111) wafers-Cleave
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic etching
Ge (111) wafers-Electrolytic plating
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Electrolytic polishing
Ge (111) wafers-Junction testing
Ge (111) wafers-Metal, structure
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110) and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching
Ge (111), (100), (110), and (211) wafers-Chemical etching-CP4, dilute CP4, modified
Ge (111), (100), and (110) wafers-Chemical polishing
Ge (111), (110) and (100) wafers-Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres-Chemical etching
Ge (111), (110), (100), (211) wafers and single crystal spheres-Chemical etching
Ge (111), (110), and (211) wafers-Chemical etching
Ge (111), p- and n-type wafers-Electrolytic polishing
Ge and Ge alloys, GaAs, InAs, and AlAs, dislocations on the (111) planes, grain boundary etchant-Chemical etching
Ge and Ge alloys, grain-contrast etchant-Chemical etching
Ge and InP (100) and (111) wafers-Chemical thinning
Ge and Si discs
Ge and Si specimens-Halogen, laser
Ge and Si specimens-Metal, laser
Ge and Si wafers-Chemical etching
Ge and Si wafers-Chemical polishing
Ge and Si wafers-Electrolytic oxidation
Ge and Si wafers-Ionized gas cleaning
Ge as alloy junction transistors-Molten flux polishing
Ge as alloyed p-n junctions devices-Chemical etching
Ge as cut cubes oriented (001)/(001):(110)/(110)-Chemical polishing
Ge as devices with evaporated metal contacts-Contact etching
Ge as polyerystalline spheres-Thermal forming
Ge as single crystal spheres-Chemical polishing
Ge as single crystal spheres-Molten flux etching
Ge as single crystal-Chemical polishing/etching
Ge as surface barrier diodes-Chemical etching
Ge both p- and n-type specimens-Electrolytic etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching
Ge hemispheres-Chemical etching-Ferric cyanide etchant
Ge hemispheres-Chemical etching-Superoxol #2
Ge hemispheres-Chemical etching-Superoxol, dilute
Ge hemispheres-Chemical etching-Superoxol, varity
Ge hemispheres-Ge hemispheres used in a preferential etching study
Ge ingot-Alkali, cutting
Ge n-p-n transistors-Electrolytic etching
Ge n-type wafers-Chemical polishing
Ge p-n diffused diode-Electrolytic etching
Ge p-n-p transistors-Acid passivation
Ge p-n-p transistors-Electrolytic passivation
Ge polycrystalline spheres-Gas cleaning
Ge samples-Irradiation
Ge single crystal hemispheres-Chemical etching
Ge single crystal specimens
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal spheres-Chemical etching
Ge single crystal wire filaments-Electrolytic shaping
Ge single crystal-Acid, cover
Ge single cyrstal spheres-Chemical etching
Ge specimens
Ge specimens-Acid oxidation
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical cleaning
Ge specimens-Chemical etching
Ge specimens-Chemical polishing
Ge specimens-Electrolytic etching
Ge specimens-Electrolytic etching
Ge specimens-Electrolytic removing
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Electrolytic shaping
Ge specimens-Ge specimens
Ge specimens-Metal, optics
Ge specimens-Power, plasticity
Ge sphere-Chemical etching
Ge spheres and hemispheres-Chemical etching-Ellis's #1 etchant
Ge spheres and hemispheres-Chemical etching-Ellis's #5 etchant
Ge spheres and hemispheres-Ge spheres and hemispheres-Ellis's #7 etchant
Ge spheres of single crystal germanium and silicon-Chemical polishing
Ge thin films evaporated on GaAs:Cr (SI) substrates-Chemical cleaning
Ge thin films evaporated on GaAs:Cr (SI) substrates-Chemical etching
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate-Physical etching
Ge thin films-Dislocation etching
Ge wafers doped with copper-Chemical polishing
Ge wafers of different orientations-Chemical cleaning
Ge wafers of different orientations-Dislocation etching
Ge wafers studied for neutron irradiation effects
Ge wafers used as substrates-Chemical polishing
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical etching
Ge wafers-Chemical polishing
Ge wafers-Chemical polishing/etching
Ge wafers-Chemical thinning
Ge wafers-Metal, contamination
Ge(x)Se(1-x) thin films-Chemical etching
Ge(x)Se(x-1) thin films-Chemical etching
Ge, Si-B-P alloys-Chemical etching
Ge-In alloys with Ag, Au, Bi, and Cu additions, grain boundary etchant-Chemical etchant
Ge-Si alloys-Chemical etching
Ge-Zn eutectic-Chemical etching
Ge2O3, DC sputtered thin films-Chemical etching
Ge3N4 and Ge3O(1-x)N(x)-Chemical etching
Ge3N4 and Ge3OxNy thin films-Chemical etching
Ge3N4 thin films-Gas densification
GeAs (111) wafer-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeAs (111) wafers-Chemical etching
GeO glass-Alcohol cleaning
GeO2 as glass blanks-Chemical cleaning
GeO2 thin films-Gas forming
GeS single crystal platelets-Chemical cleaning
GeTe single crystal specimens-Chemical etching
Germanium telluride (GeTe)-Chemical etching
Germanium-Chemical etching
Germanium-Chemical etching
Germanium-Chemical etching
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing
Germanium-Chemical polishing and etching
Germanium-Electrolytic etching
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electrolytic polishing
Germanium-Electropolishing
Germanium-Electropolishing
Germanium-Electropolishing
Germanium-Etch pits etching
Germanium-Etch pits etching
Germanium-Etch pits etching
Germanium-Etch pits on (111) face
Germanium-Etch pits on n-type (111) face
Germanium-Etchant for revealing twin planes
Germanium-Final chemical polishing
Germanium-For removal of surface damage
Germanium-Ge and its alloys. GaAs, InAs, Al As. Grain boundaries. Dislocations on (111) planes
Germanium-Ge and its alloys. Grain boundaries
Germanium-Ge and its alloys. Grain contrast
Germanium-Ge, Te, Se, telurides, selenides and Zr silicide
Germanium-Ge-In alloys with Ag, Au, Bi, Cu additions
Germanium-Jet polishing, chemical polishing
Germanium-Jet thinning by chemical polishing
Germanium-Removal of work damage by ethching
Germanium-Se, Ge, and their alloys. InAs, InSb, GaSb, GaAs, AlSb, ZnTe, CdTe, InP
Germanium-Si, Ge, and their alloys
Germanium-Si, Ge, and their alloys. GaSb, InSb
Germanium-Si, Ge, and their alloys. InSb. Etch pitch on (111) planes , p-n junctions
Gilman's solution (1)
Gilman's solution (2)
Glass-borosilicate and soda-lime-Chemical cleaning
Glass-lead, soda-lime, borosilicate-Thermal processing
Glass-Microscope slides-Chemical etching
Glass-soda-lime-Chemical lapping/etching
Glass-various types-Chemical cleaning
Glass-various types-Chemical etching
Glass-various types-Chemical etching
Glass-soda-lime-Chemical cleaning
Glass-thin film deposition and growth-Chemical cleaning-AB etchant (RCA)
Glass-various types, as both sheet and rods-Chemical cleaning
Glass-various types-Chemical cleaning
Glass as microscope slides-Chemical cleaning
Glass fiber reinforced epoxy resins-Chemical etching
Glass fiber reinforced epoxy resins-Chemical etching
Glass fiber reinforced polyester resins-Chemical etching
Glass reinforced polymeric materials-Chemical etching
Glass, soda-lime blanks-Chemical cleaning
Glass-various types-Chemical cleaning
Glass-various types-Chemical cleaning
Glyceregia (1)
Glyceregia (2)
Gold single crystal-Electro polishing
Gold alloy-Electrolytic etching
Gold alloys-Chemical etching
Gold and gold alloys-Electropolishing
Gold and precious metals-Chemical etching
Gold specimens-Au alloys with less thn 90% content of precious metals
Gold specimens-Au, Pt alloys and Pd alloys
Gold specimens-Electro polishing
Gold specimens-Electro polishing
Gold specimens-Electro polishing
Gold specimens-Electro thinning
Gold specimens-Electrolytic polishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Electropolishing
Gold specimens-Etching for etch pits
Gold specimens-For Au alloys with high content of precious metals. White gold. Pd and Pt alloys
Gold specimens-Grain contrast
Gold specimens-Pt and Pt alloys, Au and Au alloys
Gold specimens-Pure Au and Au-rich alloys. Pd and Pd alloys
Gold specimens-Pure Pt and Pd. Au alloys
Gold-Chemical etching
Gold-Chemical etching
Gold-Electrolytic lapping
Gold-plated nickel-iron (Au-Ni-Fe)-Electric contact material
Gold-pure Au and Pd
Gold-silver clad palladium (Au-Ag, Pd)-Electric contact material
Gold-silver-platinum (Au-Ag-Pt)-Electric contact material
Gorsuch's etchant
Grain boundaries in zinc layer of electrogalvanized steel sheet
Grain boundaries in heat treated Cr alloy steels-Chemical etching
Grain boundaries in martensitic microstructures-Chemical etching
Graphite porous-Physical etching
Grard's No.1 reagent
Gray cast irons-Colour etchant
Green's contrast etchant
Groesbeck and titanium nitride etchant-Alloys with Cr and or Co
Groesbeck's etchant
Gypsum single crystal-CaSo4 x 2H2O
HAFNIC 10 alloy-Ni-10Cr-5Al-5Co-8.3Hf-1.1Zr-0.7C
HT 12 steel-Fe-0.08C-1.5Mn-0.3Si-0.05Nb. Etch to differentiate old and recently formed ferrite by annealing
Hadfield Mn steel-Fe-1.13C-11
Hafnia-Chemical etching
Hafnia-scandia system-Chemical etching
Hafnium and alloys-Chemical etching
Hafnium and its alloys-Zircalloy-2
Hafnium carbide (HfC)-Chemical polishing
Hafnium diboride (HfB2)-Chemical etching
Hafnium diboride (HfB2)-Chemical etching
Hafnium single crystal-Chemical polishing
Hafnium specimens-Zicaloy-2 and Hf
Hafnium specimens-Zr and Hf and their alloys with small additional constituents
Hafnium specimens-Zr anf Hf and their alloys
Hafnium-Chemical polishing
Hafnium-Chemical polishing
Hafnium-Electrolytic polishing
Hafnium-Electropolishing
Hafnium-Electropolishing
Hafnium-Hf base alloys
Hafnium-Pure and low alloy Hf and Zr for observation in polarized light
Hafnium-Thinning for transmission electron microscopy (TEM)
Hafnium-Used to polish Hf wires
Hafnium-Zr and Hf base alloys. Zr-Nb alloys
Hard facing alloys-Chemical etching
Hard facing alloys-Phsyical etching
Hard metals-Chemical etching
Hardmetals-Electrolytic polishing
Hasson's etchant
Hasson's tint etch for Mo
Hastelloy X etching-Electrolytic etching
Hastelloy X-Chemical etching
Hastelloy X-Ni-22Cr-18.5Fe-9Mo-0.6W
Hasteloy B-Ni-28Mo-1Fe-0.7Cr+C
Hatch's reagent
Hayness No. 21 alloy-Electrolytic etching
Hayness No. 21 alloy-Electrolytical etching
Hayness No. 25 alloy-Shows magnetic domain
Hayness No. 30, X40 alloys-Electrolytic etching
Hayness No. 36 alloy-Electrolytic etching
He-Au alloys-Chemical etching
Heat resistant steels
Heat resistant steels-Chemical etching
Heat resisting alloys-Electrolytic polishing
Heat resisting alloys-One of the best electrolyte for universal use
Heat treated 18/8 steels-Chemical etching
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heat-resisting steels and alloys-Color etching
Heyn's etchant
Hf and Zr alloys, Zr-Nb alloys-Chemical polishing
Hf single crystal wafers and HfN thin films-Chemical cleaning
Hf specimens-Chemical etching
Hf thin films deposited on silicon wafers-Chemical etching
Hf-Al-Pa system-HfAl1.67Pd0.23
Hf-C alloys-Etch for detecting free hafnium
Hf-Cr alloys-Chemical etching
Hf-Cr alloys-Electro etching
Hf-Er system-Chemical etching
Hf-Er-Sc system-Chemical etching
Hf-Ir system-Chemical and electrolytic etchant
Hf-Nb alloys (Hf rich)-Electrolytic polishing and jet electro thinning
Hf-Nb alloys-Chemical etching
Hf-Nb alloys-Chemical polishing and electrolytic polishing
Hf-Nb-B system-Chemical etching
Hf-Nb-Si system-Hf(85-x)Nb(x)Si(15); x< 45
Hf-O system-Chemical etching
Hf-O system-Hf-HfO2 section
Hf-Si system (Hf85Si15)-Electro thinning
Hf-Ta alloys-Chemical polishing
Hf-V alloys-Electrolytic etching
Hf-V-Si system-Hf(85-x)V(x)Si(15); x < 37
Hf-W alloys-Chemical etching
Hf-Y-O system (HfO2-Y2O3)-Physical etching
Hf3Sn2 single crystal specimens-Chemical etching
HfB-TaB2-Chemical etching
HfB2 with TaB2, ZrB2-Chemical etching
HfB2-NbB2-Chemical etching
HfB2-TaB2-Chemical etching
HfC carbide-Chemical etching
HfN thin film-Chemical cleaning
Hg applied as a thin film-Chemical etching
Hg as a smeared surface contact-Ketone, freezing
Hg liquid frozen by submersion in LN2-Gas etching
Hg liquid frozen into solid form-Gas etching
Hg liquid frozen-Air etching
Hg(1-x)Cd(x)Te (111) wafers-Chemical etching
Hg(1-x)Cd(x)Te single crystal-Chemical polishing
HgAg natural single crystal-Acid, removal
HgCdTe (111) thin films-Chemical etching
HgCdTe (111) wafers and other orientations-Chemical polishing
HgCdTe (111) wafers-Chemical polishing
HgCdTe single crystal ingots and wafers-Chemical etching
HgCdTe single crystal material-Chemical polishing/etching
HgCdTe single crystal wafers-Chemical polishing
HgCdTe specimens-Chemical polishing
HgCdTe thin films-Chemical etching
HgCdTe wafers-Chemical etching
HgI2 single crystals-Ketone, growth
HgO as a native oxide on mercury-Chemical etching
HgSe (111) wafers-Chemical etching
HgSe (111) wafers-Chemical etching
HgSe (111) wafers-Chemical polishing
HgSe single crystal specimens-Chemical polishing
HgTe (111) wafers-Chemical etching
HgTe (111) wafers-Dislocation etching
HgTe single crystal wafers-Chemical polishing
High carbon silicon steel-Fe-0.75/1C-2/2.4Si, 0.4/0.8Cr-0.5Mn
High carbon steel-Steel with 1.2% C
High carbon steels-Colour etchant
High Cr containing alloys, Cr silicide, galvanic Cr layers, Mo-Cr-Fe alloys, U-Nb alloys, ferrovanadium-Electrolytic etching
High temperature supercondictors (YBa2Cu3O7)-For revealing grain boundaries, twin boundaries and cracks
High alloy content steels-Revelas different structural constituents in high alloy steels
High alloy steel specimens-Etching to reveal segregations
High alloy steels and castings-Chemical etching
High alloy steels-Electropolishing
High purity Al, most Al alloys, grain boundaries are preferentially attacked-Chemical etching
High speed steels-Chemical etching
High speed steels-Chemical etching
High speed steels-Electrolytic polishing
High speed steels-Electropolishing
High speed steels-To reveal grain size in quenched and tempered high speed steels
High stregth steels-Extraction of the precipitates
High temperature CrMoN steels-Electropolishing
High temperature CrMoN steels-Electropolishing
High temperature nickel alloys-Chemical and electrolytic etching
High-temperature alloys-Electrolytic polishing
High-alloy steels-Electrolytic etching
High-alloy, corrosion-reistant steels-Chemical etching
Ho single crystal specimens-Thermal etching
Ho-Ag alloys-Chemical etching
Ho-Bi system-Chemical etching
Ho-Co alloy sputter deposited on Glass and NaCl, (100) substrates-Ionized gas cleaning
Ho-Fe alloys-Chemical etching
Ho-Fe alloys-Chemical etching
Ho-Tb alloys-Electrolytic polishing
Ho2Co14Fe3 specimens-Chemical polishing
Ho2Fe17 and Ho2Co14Fe3 specimens-Chemical etching
Ho2O17 specimens-Chemical polishing
HoCu2Ge2 single crystal specimens-Chemical etching
Holmium specimens-Chemical etching
Holmium specimens-Electrolytic polishing
Holmium specimens-Sample preparation procedure
Howarth's reagent
Huber and Linh's 'H' solution
Hydal's etchant
Hydrated tricalcium silicate-Chemical etching
Hydrated tricalcium silicate iron oxide system-Chemical etching
Hydrated tricalcium silicate-Chemical etching
Hydride in Zr-Nb alloys-Chemical etching
Hydrides in Ti, alpha-beta alloys-Chemical etching
Hydrochloric acid (HCl)-Gas cleaning
Hydroxyapatite-Ca5(PO4)3 x OH
I.M.I. 685 alloy-Ti-6Al-6Zr-0.5Mo-0.25Si
IN 100 alloy-56.1Ni-5.0Al-4.5Ti-12Cr-3.2Mo-18.4Co-0.8V-0.09C (+B) by weight
IN 738 alloy-Electrolytic-potentiostatic isolation of residues
IN 738 alloy-Sample preparation
INCO 625 alloy-Chemical etching
Identification of intermetallic phases in Al alloys-Chemical etching
In (100) wafers-Chemical etching
In as pellets-Chemical cleaning
In preform sheet alloyed on germanium (111) wafer-Chemical etching
In single crystal ingot-Chemical etching
In single crystal wires-Electrolytic etching
In specimens-Chemical etching
In-738 superalloy-Ni-0.2C-3.5Al-3.6Ti-8.4Co-15.75Cr-1.7Mo-0.9Nb-1.8Ta-2.8W
In-Bi alloys-Chemical etching
In-Bi eutectic alloy specimen-Chemical etching
In-Bi-Sn alloys-InBi-BiSn subsystem
In-Cd alloys-Chemical ecthing
In-Fe alloys-Chemical etching
In-Ga-As system-Preferential etch to delineate from Gallium arsenide
In-Ga-As system-Preferential etch to delineate from indium phosphide
In-La system-Electrolytic polishing
In-Ni eutectoid (30% Ni)-Chemical ecthing
In-Sb alloys-Chemical etching
In-Sb system-For revealing the segregation
In-Sb-Pb alloys-Chemical etching
In-Sn-Te alloys-In2Te3-SnTe section
In-Te-Bi alloys-In2Te3-Bi2Te3 section
In-Te-Bi alloys-InTe-InBi system
In-Zn alloys-Chemical etching
In203 specimens-Chemical etching
In2O3 (1010) deposited oriented thin film-Chemical etching
In2O3 (1010) grown as an oriented thin film-Chemical etching
In2O3 (1010) oriented thin films-Chemical etching
In2O3 as thin film-Chemical etching
In2O3 specimens-Chemical etching
In2O3 specimens-Chemical etching
In2Te3 specimens-Chemical polishing
In2Tl3 single crystal ingots-Chemical polishing
In5Bi3 single crystal specimens-Chemical polishing
InAs (100) n-type wafers-Chemical polishing
InAs (100) n-type wafers-Chemical etching
InAs (110) n-type wafers-Chemical polishing
InAs (111) wafers and other orientations-Thermal processing
InAs (111) wafers used in X-ray studies-Chemical etching
InAs (111) wafers used in a polarity study-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Chemical etching
InAs (111) wafers-Dislocation etching
InAs (111), (110) and (100) wafers-Chemical etching
InAs specimens-Chemical cleaning
InAs specimens-Chemical etching
InAs(x)P(x-1) polycrystalline ingot-Chemical polishing
InGaAs (001) thin film-Chemical etching
InGaAs (100) wafer-Chemical cleaning
InGaAsP as thin film layers-Chemical etching
InGaAsP epitaxy thin films-Chemical etching
InGaAsP thin film layer grown by LPE-Chemical etching
InGaSb deposited as a thin film on BaF2 substrate (111)-Chemical thinning
InGe used as a deposited Au/InGe alloy contact on (100) InP and GaAs wafers-Chemical etching
InP (100) Sn doped wafers-Chemical etching
InP (100) Zn doped p-type wafers-Chemical etching
InP (100) Zn doped p-type wafers-Chemical polishing
InP (100) cleaved wafers-Chemical etching
InP (100) n-type wafers-Chemical cleaning
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical etching
InP (100) n-type wafers-Chemical native oxide removal
InP (100) n-type wafers-Chemical polishing
InP (100) n-type wafers-Chemical polishing
InP (100) p-type wafers-Chemical etching
InP (100) tin-doped, n-type wafer-Chemical etching
InP (100) wafer fabricated as Schottky diodes-Chemical polishing
InP (100) wafer substrates-Halogen, grooving
InP (100) wafer used as a substrate-Acid oxidation
InP (100) wafer-Chemical etching
InP (100) wafer-Chemical etching
InP (100) wafers Cut 3 deg.-off toward (110)-Chemical polishing
InP (100) wafers cut within 1 deg. of plane-Chemical polishing
InP (100) wafers fabricated as Schottky diodes-Junction stain
InP (100) wafers used as substrates for InP epitaxy-Chemical etching
InP (100) wafers used as substrates for LPE deposition of InGaAsP-Chemical etching
InP (100) wafers used as substrates for LPE of InGaAsP-Chemical etching
InP (100) wafers used as substrates-Chemical etching
InP (100) wafers used for epitaxy growth of InGaAs/InGaAsP-Metal, etch-back
InP (100) wafers used for zinc deposition and anneal-Chemical thinning
InP (100) wafers used in a dislocation study-Dislocation etching
InP (100) wafers with channels in (011) and (011) directions-Chemical etching
InP (100) wafers with or without thin film InGaAsP epitaxy-Chemical etching
InP (100) wafers, S doped n-type-Ionized gas cleaning
InP (100) wafers, Zn doped p-type-Chemical etching
InP (100) wafers-Acid, stain
InP (100) wafers-Chemical cleaning
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching
InP (100) wafers-Chemical etching-BCK-111 etchant
InP (100) wafers-Chemical etching-BPK-221 etchant
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing
InP (100) wafers-Chemical polishing/etching
InP (100) wafers-Chemical thinning
InP (100) wafers-Electrolytic etching
InP (100) wafers-Electrolytic etching
InP (100) wafers-Electrolytic oxidizing
InP (100) wafers-Ionized gas
InP (100) wafers-Ionized gas, removal
InP (100) wafers-Physical etrching
InP (100) wafers-Thermal cleaning
InP (100), n-type, 0.3-0.4 Ohm cm resistivity, and p-type, 7-8 Ohm cm wafers-Chemical cleaning
InP (110) wafer cleaved under UHV-Chemical polishing
InP (111) wafers grown by LEC-Chemical etching
InP (111) wafers grown by LEC-Chemical polishing
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical etching
InP (111) wafers-Chemical polishing
InP (111)A and (100) wafers-Chemical etching
InP (TTT)B wafers-Chemical etching
InP ingot cut longitudinally on the (112) axis-Dislocation etching
InP ingot grown by LEC doped with both Ga and Sb-Dislocation etching
InP p-type single crystal wafers-Chemical polishing
InP-Fe (100) (SI) wafers-Chemical polishing
InP-Fe (100) wafers-Chemical cleaning
InP:Fe (100) (SI) wafers-Chemical etching
InP:Fe (100) (SI) wafers-Chemical etching
InP:Fe (100) (SI) wafers-Chemical etching
InP:Fe (100) (SI) wafers-Chemical polishing
InP:Fe (100) n-type wafers-InP:Fe (100) n-type wafers
InP:Fe (100) wafers used as substrates for MISFETT and EMISFET device fabrication-Chemical etching
InP:Fe (100) wafers within 5 deg. of plane-Chemical etching
InP:Fe (100) wafers-Chemical cleaning
InP:Zn epitaxy film grown by LPE-Chemical etching
InS (100) and (110) wafers-Chemical polishing
InSb (001) wafers-Alcohol cleaning
InSb (100) and (110) wafers-Chemical etching-Etchant #1
InSb (100) and (110) wafers-Chemical etching-Etchant #2
InSb (100) n-type wafers used in a study of adsorption coefficients
InSb (100) n-type wafers zinc diffused-Chemical cleaning
InSb (100) n-type wafers-Chemical etching
InSb (100) wafers and other orientations-Chemical polishing
InSb (100) wafers-Chemical etching
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Chemical polishing
InSb (100) wafers-Ionized gas cleaning
InSb (100) wafers-Oxide removal
InSb (100), (111)A and (111)B oriented wafers-Chemical etching
InSb (110) n-type and (100) p-type wafers-Chemical polishing
InSb (111) p-type wafers-Chemical polishing
InSb (111) specimens-Chemical etching
InSb (111) wafers and other orientation-Chemical polishing-CP4, variety CP4A etchant
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching
InSb (111) wafers-Chemical etching-H100 etchant
InSb (111) wafers-Chemical etching/polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing
InSb (111) wafers-Chemical polishing-Allen's etchant
InSb (111) wafers-Electrolytic anodization
InSb (111) wafers-Electrolytic anodizing
InSb (111) wafers-Ketone cleaning
InSb (111) wafers-Thermal etching
InSb (111), (112) and other bulk orientations-Chemical polishing
InSb (111)A, (TTT)B and (100) wafers-Chemical cleaning
InSb (311) and (110) wafers-Electrolytic polishing
InSb (311) wafers-Chemical etching
InSb (311) wafers-Chemical polishing
InSb cylinder-Chemical etching
InSb specimen-Chemical etching
InSb specimens-Etchant for revealing twin lamellae by staining (211) and etching the (211)
InSb thin films-Chemical polishing
InSb-Etchant for revealing twin planes
InSb-Te (111) n-type wafers-Chemical cleaning
InSe (0001) as hand cleaved wafers-Chemical etching
InSn alloy specimen-Electrolytic etching
InSnO2 single crystal-Acid, flux, removal
Incaloy 800-19Cr-30Ni-45Fe+ C,Mn,P,S,Cu,Si,Al,Ti
Incaloy 800-44Fe-31Ni-21.6Cr-1Mn-0.5Cu-0.4Ti-0.4Al-0.3Si
Inco 713LC superalloy-Electro etching
Inconel 617-54Ni-22Cr-12.5Co-9Mo-1Al-0.07C
Inconel 686-Chemical etching
Inconel 718 alloy (Ni)-Chemical etching
Inconel 718 etchant-For SEM examination to view gamma double prime in alloy 718 (no gamma prime)
Inconel 718-Ni-0.5Al-0.05C-5Nb-0.2/0.4Co-18Cr-18/20Fe-3Mo
Inconel 718-Ni-17Cr-22Fe-1Co-5Nb-0.8Ti-0.6Al-0.05C
Inconel X550, Inco 700, Waspaloy, M252-Chemical etching
Inconel-Electrolytic polishing
Indium arsenide (InAs)-Chemical etching
Indium arsenide (InAs)-For etch pits
Indium arsenide (InAs)-For revealing the defect density
Indium phosphide arsenide (InP(x)As(1-x))-Etching for etch pits
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical etching
Indium antimonide (InSb)-Chemical polishing
Indium antimonide (InSb)-Chemical polishing
Indium antimonide (InSb)-Chemical polishing and etching
Indium antimonide (InSb)-Chemical polishing and etching
Indium antimonide (InSb)-Electro polishing
Indium antimonide (InSb)-Etch pit etching
Indium antimonide (InSb)-For etch pits
Indium antimonide (InSb)-Shallow etch pits are produced on (111) face
Indium oxide (In2O3)-Etch pits etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical etching
Indium phosphide (InP)-Chemical polishing
Indium phosphide (InP)-Chemical polishing
Indium phosphide (InP)-Chemical polishing and etching
Indium phosphide (InP)-Chemical thinning
Indium phosphide (InP)-Dislocation etching
Indium phosphide (InP)-Dislocation etching
Indium phosphide (InP)-Etch for dislocations on (111)P, (100) and (110) faces
Indium phosphide (InP)-Etch pit etch for (111) face
Indium phosphide (InP)-Etch pits etch for (111) faces
Indium phosphide (InP, (001) face)-Chemical polishing
Indium single crystal-Chemical etching and polishing
Indium specimens-Chemical etching
Indium specimens-Chemical etching
Indium specimens-Electro mechanical polishing
Indium specimens-Electro thinning
Indium specimens-Electrolytic polishing
Indium specimens-Electropolishing
Indium specimens-For etch pits etching
Indium specimens-In and In rich alloys
Insb (111) wafers-Chemical etching
Intergranular oxidation in AISI 4150 steel-Chemical etching
Intermetallic compounds-Chemical ecthing
Invar-tin alloy (Fe-Ni-Sn)-62Fe-35Ni-3 at.% Sn
Ir crystalline specimens as wire, rod, sheet-Chemical etching
Ir thin films deposited on silicon (100), n-type-Chemical etching
Ir, Rh-Electrolytic etching
Ir-Mo system-Chemical etching
Ir-W alloy-Ir-0.3% W
IrPt as alloy mixtures-Chemical etching
IrV and Ir80V20 thin films-Chemical etching
Iridium specimen-Electro thinning
Iridium specimen-Electro thinning
Iridium specimen-Electro thinning by window technique
Iridium specimen-Electrolytic etching
Iridium specimen-Electrolytic etching
Iridium specimen-Electrolytic etching
Iridium specimen-Pt alloys, Rh, Ir
Iridium specimen-Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Iron and iron alloys-Electropolishing
Iron and steel specimens-Austenitic stainless steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-High alloy steel specimens
Iron and steel specimens-Mild steel specimens, Bessemer and high N2 steel specimens
Iron and steel specimens-Plain and alloy steel specimens
Iron and steel specimens-Plain and alloy steel specimens
Iron and steel specimens-Plain and low alloy steel specimens. For grain size and weldments
Iron and steel specimens-Stainless and high Cr steel specimens
Iron and steel specimens-Stainless steel specimens, high alloy steel specimens
Iron and steel specimens-Works well on 12% Cr steel specimens
Iron and steel specimens-lain and alloy steel specimens, high speed steel specimens
Iron and steels-Electropolishing
Iron and steels-Electropolishing
Iron and steels-Etchant for determination of chemical and physical hetrogenity
Iron disilicide (FeSi2)-Chemical thinning
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Chemical etching
Iron oxide layers on iron-Electrolytic etching
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing
Iron specimen-Chemical polishing and etching
Iron specimen-Chemical polishing in hot reagent
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Chemical thinning
Iron specimen-Dislocations in alpha-Fe whiskers
Iron specimen-Electro polishing
Iron specimen-Electro polishing
Iron specimen-Electro polishing
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning
Iron specimen-Electro thinning by Bollman technique
Iron specimen-Electro thinning by Mirand-Saulnier technique
Iron specimen-Electro thinning by low voltage technique
Iron specimen-Electro thinning by modified Mirand-Saulnier technique
Iron specimen-Electro thinning by modified voltage technique
Iron specimen-Electro thinning by window technique
Iron specimen-Electro thinning in PTFE holder
Iron specimen-Electro thinning using A.C.
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Electrolytic polishing
Iron specimen-Good general-purpose electrolyte
Iron specimen-Physical etching
Iron specimen-Universal electrolyte
Iron, steel specimens, cast irons-Versatile, useful for Fe and steel specimens
Iron, steel specimens, cast irons-Austenite and high temperature steel specimens
Iron, steel specimens, cast irons-Blowhole segregation. Primary structure. Fiber orientation
Iron, steel specimens, cast irons-Flow lines in low carbon N2 steel specimens
Iron, steel specimens, cast irons-Phosphorus distribution in cat steel specimens and cast iron
Iron, steel specimens, cast irons-Phosphorus segregation in low carbon steel specimens
Iron, steel specimens, cast irons-Verification, arrangemnet, and distribution of Fe and Mn sulfide inclusions
Iron, steel specimens, cast irons-Versatile etchant for alloyed and unalloyed steel specimen
Iron, steels, cast irons-Most common etchant
Iron, steels, cast irons-Austenite grain baoundaries in cold work steel
Iron, steels, cast irons-Austenite grain boundaries
Iron, steels, cast irons-Austenite grain boundaries in case hardened steels
Iron, steels, cast irons-Austenite grain size boundaries in cold work steels
Iron, steels, cast irons-Austenite grain size boundaries in tempered steels and case hardened steels
Iron, steels, cast irons-Carbides and phosphides in low alloy steels
Iron, steels, cast irons-Carbides, nitrides, phosphides, and sulfides are not attacked
Iron, steels, cast irons-Cementite (Fe3C) with up to 10% Cr is stained dark
Iron, steels, cast irons-Cr and Cr-Ni steels
Iron, steels, cast irons-Differntiation of cubic and tetragonal martensite
Iron, steels, cast irons-Fe-Cr-Ni cast alloy
Iron, steels, cast irons-Fe3C with more thn 10% Cr is stained more rapidly than Fe3C with less than Cr
Iron, steels, cast irons-Generally used for iron and heat treated steels
Iron, steels, cast irons-Grain boundaries in heat treated tool steel
Iron, steels, cast irons-Grain boundaries in martensitic microstructures
Iron, steels, cast irons-Grain contrast of ferrite in low carbon steels
Iron, steels, cast irons-High alloy Cr-Ni steels
Iron, steels, cast irons-Increases attack of Fe in alloyed steels
Iron, steels, cast irons-Mn alloyed Cr-Ni steels. Sigma phase and ferrite
Iron, steels, cast irons-Most common etchant
Iron, steels, cast irons-Normalized steels
Iron, steels, cast irons-Sgma phase etching
Iron, steels, cast irons-Stainless steels with high Cr content. Cr-Ni cast steels
Iron, steels, cast irons-Steels with high Si content
Iron, steels, cast irons-Tint etchant for pure iron and carbon steels, cast iron, and alloyed steels
Iron, steels, cast irons-Verification of sigma phase
Iron-manganese alloys
Iron-technetium system (Fe-Tc)-Fe-0.1 wt.% Tc
Iron-thorium (Fe-Th)-Th-2% Fe
Iron-oxide layers on iron-Fe2O3-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-Fe3O4-Chemical etching
Iron-oxide layers on iron-FeO-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-FeO-Fe3O4-Fe2O3-Chemical etching
Iron-oxide layers on iron-Physical etching
Iron-oxide layers on iron-Physical etching
Jacquet's etchant
Jacquet's solution
Jodid (high-purity, iodide-process) Ti-Chemical etching
K specimens-Alcohol polishing
K specimens-Alcohol polishing
K specimens-Chemical polishing
K specimens-Ketone polishing
K42B alloy-Chemical etching
KBr (001) wafers-Chemical etching
KBr (100) cleaved wafers-Chemical etching
KBr (100) wafers and single crystals-Water polishing
KBr and KI single crystal specimens-Solvent polishing
KBr specimens-Chemical etching
KCl (001) cleaved wafers-Chemical etching
KCl (100) cleaved wafers-Chemical etching
KCl (100) cleaved wafers-Chemical polishing
KCl (100) cleaved wafers-Gas etching
KCl (100) specimens-Chemical cleaning
KCl (100) wafers-Alcohol cleaning
KCl (100) wafers-Chemical etching
KCl (111) and (100) cleaved wafers-Chemical cleaning
KCl formed as dendritic structure-Acid, defect
KCl single crystal specimens-Acid forming
KCl single crystal specimens-Acid forming
KI (100) cleaved wafers-Chemical etching
KI (100) cleaved wafers-Chemical etching
KI (100) wafers-Alcohol polishing
KI (100) wafers-Chemical etching
KI and KBr single crystal specimens-Polishing
KMnFe3 single crystal sphere
KTaO3 iron doped single crystal wafer-Abrasive polishing
Kalling's reagent
Kalling's reagent 1
Kalling's reagent 2
Keller's reagent
Keller's etchant
Keller's etchant (2)
Kellers etch
Klemm's II tint etch
Klemm's I tint etch
Klemm's etchant
Klemm's etchant I
Klemm's etchant II
Klemm's etchant III
Klemms III tint etch-Chemical etching
Kovar alloy-Electrolytic etching
Kovar specimens-Chemical etching
Kovar specimens-Chemical polishing
Kovar specimens-Chemical polishing
Kovar, cemented carbides-Chemical etching
Kr (100) solid single crystal ingots-Pressure
Kr used as a gas ambient component in the RF magnetron sputter deposition of NbN thin films
Kroll's reagent
Kroll's etchant (1)
Kroll's etchant (2)
Krumm's etchant
La specimens-Arc forming
La specimens-Chemical polishing
La, U and Th used as pressed powders-Pressure
La-Ag alloys-Chemical etching
La-Au alloys-Chemical etching
La-Bi system-Chemical etching
La-Cd alloys-Chemical etching
La-Co alloys (Approx. LaCo5)-Chemical etching
La-Co system-Chemical etching
La-Co-Cu alloy-(Co,Cu)5La
La-Ni alloys-Chemical etching
La-Pd alloys-Approx. La3Pd4
La-Rh system-Chemical ecthing
LaB single crystal filaments-Electrolytic polishing
LaB6 single crystal specimens-Acid, forming
LaB6 specimen-Ceramic compunds
LaB6, TaB2-Electrolytic etching
LaBr3 (100) wafers-Chemical polishing
LaCu6 single crystal-Chemical etching
LaSrCoO3 single crystals cleaved (001)-Salt polishing
LaSrCoO3 single crystals-Chemical etching
LaSrFeO3 single crystals-Chemical etching
Lanthanides (rare earths)-For most rare earths metals and their alloys
Lanthanides (rare earths)-For most rare earths metals and their alloys
Lanthanum boride (LaB4)-Electrolytic etching
Lanthanum doped barium titanate-Thermal etching
Lanthanum-Chemical polishing and etching
Lanthanum-Electro polishing
Lanthanum-Electro polishing
Lanthanum-Electro thinning
Le Pera's reagent
Lead samples-Grain contrast. Pb containing Sb
Lead samples-Grain contrast. Welded seams. Layers
Lead samples-Removal of deformed layers. Pure and low alloy Pb
Lead arsenic alloys (Pb-As)-For lead rich alloys
Lead specimen-All Pb alloys. Hard lead. High Pb white metals and type metals
Lead specimen-Electrolytic polishing
Lead specimen-Grain contrast
Lead specimen-Lead solder. Pb-Sb alloys and high Pb white metals and type metals
Lead specimen-Lead solders. Pb-Sn alloys
Lead specimen-Pb and Pb alloys. Hard lead and high Pb white metals and type metals
Lead specimen-Pb, Pb-Sb and Pb-Sn alloys
Lead specimen-Pb, Pb-Sn, Pb-Cd, Pb-Ca alloys. Pb containing Cu and bronzes
Lead specimen-Pure Pb, Pb-Sb, Pb-Ca alloys. Grain boundaries
Lead alloys-Electropolishing
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Electrolytic etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Electrolytic etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Chemical etching
Lead and lead alloys-Development of microstructures and grain boundaries in lead
Lead and lead alloys-Pb-Sb alloys
Lead and its alloys-Antimonial lead
Lead and its alloys-Antimonial lead. Bright etch, grain structure
Lead and its alloys-Antimonial lead. Chemical polish-etch
Lead and its alloys-Antimonial lead. For grain structure
Lead and its alloys-Chemical etching
Lead and lead alloys-Electropolishing
Lead glass (PbO-SiO2)-25/35 mol.% PbO-75/65 mol.% SiO2
Lead niobate (modified)-Grain boundary etching
Lead oxide-boric oxide glass-Chemical etching
Lead oxide-vanadium oxide-germanium oxide glass (Ge-O-Pb-V)-4/55 V2O5-1/36 PbO-65/9 GeO2
Lead single crystal-Chemical polishing
Lead specimen-Chemical and electrolytic etching
Lead specimen-Chemical etching
Lead specimen-Chemical etching
Lead specimen-Chemical polishing
Lead specimen-Electro polishing
Lead specimen-Electro polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electrolytic polishing
Lead specimen-Electropolishing
Lead specimen-Universal electrolyte
Lead sulphide (PbS)-Chemical polishing
Lead sulphide (PbS)-Chemical polishing
Lead sulphide (PbS)-Chemical polishing and etching
Lead sulphide (PbS)-Sample preparation
Lead sulphide (PbS)-To delineate p-n junction
Lead sulphide-selenide (PbS(0.6)Se(0.4))-To delineate p-n junction
Lead sulphide-selenide (PbS(1-x) x Se(x))-Chemical polishing
Lead telluride (Pb-Te) system-Electrolytic polishing
Lead telluride (Pb-Te)-Chemical polishing
Lead telluride (Pb-Te)-Chemical polishing and etching
Lead telluride (Pb-Te)-Electrolytic polishing
Lead telluride (Pb-Te)-Etching for etch pits
Lead telluride (Pb-Te)-Ething for etch pits
Lead telluride (Pb-Te)-Polishing procedure
Lead-Electro polishing
Lead-Electrolytic polishing
Lead-lanthanum zirconate titanate-(Pb-La) (Zr-Ti)O3
Lead-strontium-titanate zirconate
Lead-strontium-titanate zirconate-(Pb0.94Sr0.06) x (Zr0.53Ti0.43)O3
Lenoir's solution
Lenoirs reagent
Lepito's reagent
Lepito's etchant
Lepito's reagent
Levenstein-Robinson's etchants (and (Hen-Hen) Rickson's modification)
Li tantalate-silicon-alumina system-Chemical etching
Li applied as molten LiOH on rutile-Salt removal
Li powder in oil-Diffision
Li samples-Chemical etching
Li single crystal spheres-Thermal forming
Li specimens-Chemical etching
Li specimens-Chemical polishing
Li(x)WO3 (blue) and Li(x)WO3-Oxide, growth
Li-Al orthosilicate-Li2O x Al2O3 x 3,4 as 8 SiO2
Li-alumina-silica glass-Li2O x Al2O3 x SiO2
Li-Ba-Ti-Zr glass-73% SiO2, 14% Al2O3, 8.7% Li2O, 1.75% BaO, 1.5% TiO2, 1% ZrO2 (+ NdO2)
Li-Se alloys
Li-Se-Rb-Br system-Li2Se-Se-(LiBr/RbBr eutectic)
Li-Zn ferrite-Li0.44 x Zn6.09 x Fe2.47 x O4
Li3Bi single crystal ingots-Chemical polishing
LiBr (100) cleaved wafers-Chemical etching
LiCl cleaved wafers-Chemical etching
LiCl wafers-Dislocation etching
LiF (100) and (111) wafers-Chemical etching
LiF (100) cleaved wafers-Dislocation etching
LiF (100) single crystal specimens-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching
LiF (100) wafers-Chemical etching-W" etchant
LiF (10O) cleaved wafers-Dislocation etching
LiF (111) cleaved wafers-Ulrasonic vibration
LiF specimen-Chemical etching
LiF-MgF2 system-LiF-MgF2 eutectic
LiInS2 (001) oriented thin films-Chemical etching
LiInS2 thin films on (111) silicon wafer substrates-Chemical etching
LiN thin films-Chemical etching
LiNbO3 single crystal specimens-Chemical etching
LiNbO3 single crystal specimens-Metal decoration
LiTaO3 single crystal specimens-Chemical etching
LiTaO3 single crystal wafers-Metal decoration
Lichtenegger and Bloech's etchant
Lime-silica system-Chemical etching
Lithia dispersed Nichrome (Cr-Li-Ni-O)-Ni-20Cr-1.3Li2O
Lithia-zinc oxide-silica system-Chemical etching
Lithium carbonate single crystal-Chemical etching
Lithium ferrite (Li0:5 Fe2:5 O4)-Thermal etching
Lithium ferrite (Li0:5 Fe2:5 O4)-Chemical polishing and etching
Lithium fluoride (LiF) single crysta-Chemical etching
Lithium fluoride (LiF) single crystal-Chemical etching
Lithium fluoride (LiF) single crystal-Chemical etching
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-Chemical polishing
Lithium fluoride (LiF)-For etch pits
Lithium fluoride (LiF)-For etch pits
Lithium glass-30.5 mol.% LiO2, 1.5 mol.% K2O, 1 mol.% Al2O3, 1 mol.% P2O5, 5 mol.% B2O5, 61 mol.% SiO2
Lithium glass-70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5
Lithium glass-70% SiO2, 6/12% Li2O, 5/9% Al2O3, 5/8% K2O, 3/5% B2O5, bellow 2.5% P2O5
Lithium niobate (LiNbO3)-For etching patterns on (0001) and (10T0)
Lithium nitride-Li3N-Chemical thinning
Lithium oxide-potash-zinc oxide-silicate glass-Chemical thinning
Lithium silicate glass (Li2O·2SiO2)-Chemical thinning
Lithium specimens-Chemical etching
Lithium specimens-Chemical polishing and etching
Lithium tantalate (LiTa03)-For domain structure in single crystals
Livingstone's reagent-Chemical etching
Livingstone's solution
Livingstone's etchant
Low carbon and pearlitic steels-Physical etching
Low carbon steel-Physical etching
Low carbon steels-Chemical etching
Low carbon steels-Colour etchant
Low Mn steel-Fe-0.6/1.5C-1.1Mn
Low Mn-V steel-Fe-0.14C-1.3Mn-0.35Si-0.1V (plus Al, N)
Low Mn-V steel-Fe-0.1C-1.4Mn-0.5Si-0.1V
Low Mn-V steel-Fe-0.1C-1.5Mn-0.5Si-0.1V
Low Nb steel-Fe-0.1/0.2C-1.2/1.4Nb-0/0.2Nb
Low V alloy steel-Steel with 0.2% C and 1% V
Low V alloy steel-Steel with 0.2% C and 1% V
Low alloy dual-phase and TRIP steels-Chemical etching-La Pera's solution
Low alloy steel-Chemical thinning
Low alloy steel-Chemical thinning
Low alloy steels-Chemical thinning, electro polishing
Low and high alloy steels-Carbon steels, low and high alloy steels, stainless steels
Low and high alloy steels-Electro polishing
Low and high alloy steels-Electro polishing
Low carbon steel-Chemical etching
Lu-Ag alloys-Chemical etching
Lu-Au alloys-Chemical etching
Lu-Pd alloys-Approx. Lu3Pd4
Lu-Yb alloys-Electro polishing and chemical etching
Lucite sheet and parts-Alcohol, dissolve
Lucite sheet and parts-Chemical cleaning
Lucite sheet and parts-Chemical cleaning
Lutetium-Electro polishing
MA 956E alloy-Fe-19Cr-4.4Al-0.5Ti-0.4Ni-0.5Y2O3
MAR-M 509 alloy-Chemical etching
MCrAlY-coatings (NiCoCrAlY coating)-Chemical Etching
MERL 76 alloy-55Ni-5.1Al-4.2Ti-12Cr-3.3Mo-0.02C-18.4Co-1.3Nb-0.7Hf (+B)
MFeM2 material-Chemical cleaning
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etching
Magnesia (MgO) single crystal-Chemical etrching
Magnesia (MgO) single crystal-Chemical polishing
Magnesia (MgO) single crystal-Chemical polishing and etching
Magnesia (MgO)-alumina (Al2O3) mixtures-Chemical etching
Magnesia (MgO)-alumina (Al2O3) system-MgO-MgAl2O4 section
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical etching
Magnesia (MgO)-Chemical polishing
Magnesia (MgO)-Chemical polishing, chemical etching, jet thinning
Magnesia (MgO)-Chemical thinning
Magnesia (MgO)-Chemical thinning
Magnesia (MgO)-This etch produces pits on single crystal MgO on (100) and (110) faces
Magnesia (MgO)-Well defined square pyramidal pits form on (100) faces in after few minutes
Magnesium alloys-A universal etchant
Magnesium alloys-AZ31 (Mg + 3 wt.% Al + 1 wt.% Zn)
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Chemical etching
Magnesium alloys-Darkens Mg17Al12 phase and leaves Mg32(Al, Zn)40 phase unetched and white
Magnesium alloys-Electropolishing
Magnesium alloys-For estimating the amount of massive phase
Magnesium alloys-Grain structure and coring in Mg-Zn-Zr alloys
Magnesium alloys-Reveals grain boundaries more readily
Magnesium alloys-Sample preparation
Magnesium alloys-Shows general structure
Magnesium and magnesium alloys-AZ21 and AZ31 alloys. Grain size
Magnesium and magnesium alloys-AZ31B alloy. Flow pattern in forgings. Internal defects in cast slabs and ingots
Magnesium and magnesium alloys-AZ31B alloy. General etch for defects in sand and die castings
Magnesium and magnesium alloys-AZ31B alloy. Germination on sand cast surfaces
Magnesium and magnesium alloys-AZ31B, AZ61A , AZ80A alloys. Flow pattern in forgings
Magnesium and magnesium alloys-AZ61A and AZ80A alloys. Grain size and flow pattern
Magnesium and magnesium alloys-AZ61A and AZ80A alloys. Grain size, surface castings defects
Magnesium and magnesium alloys-Segregation of intermetallic compounds and associated cracks
Magnesium and magnesium alloys-ZK60A alloy. Flow lines in forgings
Magnesium and magnesium alloys-ZK60A alloys. Flow pattern and grain size
Magnesium and magnesium alloys-Electropolishing
Magnesium bronze-Chemical etching
Magnesium fluoride MgF2-Chemical polishing
Magnesium fluoride MgF2-For etching grains in hot pressed magnesium fluoride
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium oxide (MgO)-Chemical etching
Magnesium single crystal-Chemical etching
Magnesium specimens-Grain sizes and flow lines in cast and forged parts
Magnesium specimens-Internal defects in cast ingots
Magnesium specimens-Internal defects in cast ingots. Segregations, flow lines in forged parts
Magnesium-All types of Mg alloys in cast or heat treated state. Grain boundaries etch
Magnesium-Cathodic etching
Magnesium-Chemical etching
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical polishing
Magnesium-Chemical thinning
Magnesium-Complex Mg alloys containing Al, Zn, Cd, Bi
Magnesium-Electro polishing
Magnesium-Electro polishing
Magnesium-Electro polishing
Magnesium-Electro thinning
Magnesium-Electro thinning by window technique
Magnesium-Electro thinning by window technique
Magnesium-Electrolytic polishing
Magnesium-Electrolytic polishing
Magnesium-Electrolytic polishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Electropolishing
Magnesium-Flow lines. Grain sizes in cast material
Magnesium-Mg and Mg base alloys
Magnesium-Mg and Mg-Cu alloys. Mg die-casting alloys
Magnesium-Mg-Al alloys. Grain contrast in heat treated castings. Flow lines in forgings
Magnesium-Most types of Mg and its alloys. Also casting and forgings
Magnesium-Pure Mg and most Mg alloys, also in cast and forged state
Magnesium-Pure Mg, Mg-Mn, Mg-Al, Mg-Al-Zr, Mg-Th-Zr, Mg-Zn-Zr alloys. Also extruded types
Magnetite (Fe3O4)-Chemical etching
Magnetite (Fe3O4)-Chemical etching
Manganese (II) oxide-Chemical thinning
Manganese zinc ferrite-Low calcium oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CaO
Manganese-Electro polishing
Manganese-Electropolishing
Manganese-Electropolishing
Manganese-Electropolishing
Manganese-Mn-Fe, Mn-Ni, Mn-Cu, Mn-Co alloys
Manganese-Mn-Ge, Mn-Si, Mn-Sn-Ge, Mn-Sn-Si alloys
Manganese-Mn-Si-Ca alloys. Ferromanganese
Manganese-Pure Mn. Low alloy Mn containing Ni, Co, Fe, Ge, and Cu
Mar M 247-Electro polishing
Maraging steel-Fe-0.02C-12/16Cr-8Ni-0.15Be
Marble's reagent
Marble's reagent
Martensite etching
Martensite etching
Martensitic, stainless steels-Chemical etching
Matte dip etchant
Medium carbon steel-Physical etching
Medium and high carbon steels-Chemical etching
Medium and high carbon steel-Chemical etching
Mercury alloys-Ag-Sn-Hg alloys
Mercury alloys-For most amalgamates
Mercury alloys-Hg-Sn and Hg-Sn-Cu alloys
Mercury selenide (HgSe)-Chemical polishing and etching
Mercury telluride (HgTe)-Chemical polishing and etching
Mercury telluride (HgTe)-Dislocation etch
Mercury-Elelctrolytic polishing
Meruric iodidie (HgI2)-Chemical polishing and etching
Meruric iodidie (HgI2)-Chemical polishing and etching
Meruric iodidie (HgI2)-Etch pits etching
Metallic glass-Electro thinning
Meyer and Eichholz's No. 2 etchant-For etching nitrided layer in steel
Mg (0001) wafers-Electrolytic polishing/etching
Mg alloys-Chemical etching
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-Chemical etching
Mg and Mg alloys-For differentiation of Mg4Al3 and Mg3Al2Zn3
Mg and Mg alloys-Mg alloys with low Al content, sheet metal
Mg and Mg alloys-Mg-Al alloys, castings and forgings
Mg and Mg alloys-Mg-Al alloys, catings, Mg-Zr alloys, castings and forgings
Mg and Mg alloys-Mg-Al alloys, homogenised castings and forgings
Mg and Mg alloys-Mg-Al alloys, in the homogenised state
Mg and Mg alloys-Mg-Mn alloys, forgings, Mg-Zr alloys, castings
Mg and Mg alloys-Mg-Zr alloys, forgings
Mg and Mg alloys-Reveals grain structure and flow lines in forgings
Mg and Mg alloys-Reveals grain structure in heat treated castings and flow lines in forgings
Mg and Mg alloys-Reveals grain structure in heat treated castings and flow lines in forgings
Mg and high Mg alloys-Electrolytic polishing
Mg doped beta-Alumina-90Al2O3 - 8Na2O - 2MgO
Mg pieces-Chemical cleaning
Mg sialon-Mg3 Si2.455 Al0.545 O6.245 N1.455
Mg single crystal specimens-Physical etching
Mg single crystal wafers-Chemical etching
Mg single crystal wafers-Electrolytic polishing
Mg soldered joints AZ31, AZ91, Zm50/ZnMg3Al, Mg48Zn43Al9-Chemical etching
Mg specimens and alloys-Acid cutting
Mg specimens-Chemical etching
Mg specimens-Chemical etching
Mg specimens-Chemical polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg specimens-Electrolytic polishing
Mg-7.5% Al-2.5% Zn alloy-Chemical etching
Mg-Al alloy (Magnox 12)-Alloy with 0.85% Al
Mg-Al alloy-Alloy with 0.9% Mg
Mg-Al alloy-Alloy with 3% Mg
Mg-Al alloy-Mg-gama MgAl eutectic
Mg-Al alloys-Alloys with < 10% Mg
Mg-Al alloys-Chemical thinning
Mg-Al alloys-Electro thinning by window technique
Mg-Al-Zn alloy-Al, 3-5% Mg, 4-5% Zn (+ Cu, Fe, Si, Ni, Cr)
Mg-Al-Zn alloys-Chemical etching
Mg-Al-Zn-Mn alloy-Mg-9Al-1Zn-0.3Mn
Mg-Ca alloys-Mg rich alloys
Mg-Ce alloy-Electrolytic etching
Mg-Cu alloys-Mg-Mg2Cu section
Mg-H system-Electrolytic polishing
Mg-Li alloy-Alloy with 10.5 at.% Li
Mg-Li alloys-Chemical etching
Mg-Li-Al alloys-Mg rich alloys
Mg-Mn ferrite (Fe-Mg-Mn-O)-Chemical etching
Mg-Mn ferrite (Fe-Mg-Mn-O)-Rapid attack on grain boundaries
Mg-Nd system-Alloys with low Nd (0.5 at.%)
Mg-Nd-Y-Zn-Zr alloys-Mg-1.5Y-2/4Nd-2/4Zn-0.6Zr
Mg-Ni alloy-Mg-Mg2Ni
Mg-Ni alloy-Mg-Mg2Ni eutectic
Mg-Pb alloys-Dendritic structure of cast alloys for SEM examination will be revealed by deep ecthing
Mg-Sb alloys-Mg-Mg3Sb2 section
Mg-Si alloys-Chemical etching
Mg-Si alloys-Mg-Mg2Si section
Mg-Sn alloys-Mg-Mg2Sn section
Mg-Th alloys-Electro polishing
Mg-Th-Zr alloy-Alloy with 3.9% Th and 0.4% Zr
Mg-Y alloy-Alloy with 10.8 wt.% Y
Mg-Y alloy-Alloy with 8.7% Y
Mg-Y-Zn-Zr alloys-Mg-1.5Y-2/4Zn-0.6Zr
Mg-Y-Zr alloys-Mg-1.5Y-0.6Zr
Mg-Zn alloy-Electrolytic polishing
Mg-Zn alloys-Electropolishing
Mg-Zn alloys-Cathodic etching
Mg-Zn alloys-Chemical etching
Mg-Zn alloys-Electro polishing and chemical thinning
Mg-Zn alloys-Electro thinning by window technique
Mg-Zn alloys-Initial chemical thinning
Mg-Zn-Zr alloy-Mg-6Zn-0.5Zr
Mg-Zr alloy-Electro polishing and electro thinning
Mg-Zr alloys-Alloys with 0.5 wt.% Zr
Mg-Zr alloys-Alloys with low Zr content
Mg-Zr alloys-Electro thinning
Mg-Zr alloys-Initial chemical thinning
Mg-Zr system-ZrO2-9/14 mol.% MgO
Mg-Zr-Mn alloy-Mg-0.5Zr-0.1Mn
Mg2G3 (111) wafers-Chemical polishing
Mg2Ge (111) cleaved wafers-Chemical etching
Mg2Ge (111) cleaved wafers-Cleave, cleaning
Mg2Ge (111) wafers-Chemical cleaning
Mg2Ge (111) wafers-Chemical cleaning
Mg2Ge (111) wafers-Chemical polishing
Mg2Si (111) cleaved wafers-Chemical etching
Mg2Si single crystals-Chemical etching
Mg2Sn (100) cleaved wafers
Mg2Sn single crystal specimens
Mg3N4 thin films deposited on Mg specimen blanks-Chemical etching
MgAl2O4 (spinel) (100) and (111) wafers-Chemical polishing
MgAl2O4 (spinel) (111) wafers-Chemical cleaning
MgAl2O4 (spinel) natural crystals-Molten flux decomposition
MgAl2O4 (spinel) natural crystals-Molten flux etching
MgF2 (100) specimens-Chemical etching
MgF2 (100) wafers-Chemical polishing/etching
MgO (100) cleaved wafers-Chemical etching
MgO (100) cleaved wafers-Chemical etching
MgO (100) specimens cleaved as rectangles-Chemical etching/thinning
MgO (100) substrates-Acid, float-off
MgO (100) wafers-Chemical cleaning
MgO (100) wafers-Chemical cleaning
MgO (100) wafers-Chemical etching
MgO (100) wafers-Chemical polishing
MgO (100) wafers-Chemical thinning
MgO (100) wafers-Dislocation etching
MgO (100) wafers-Dislocation etching-Stoke's etchant
MgO (100) wafers-Metal decoration
MgO (111) cleaved substrates-Ionized gas, cleaning
MgO preparation
MgO single crystal specimens-Electron damage
MgO specimens-Chemical etching
MgO x Al2O3 (111) blanks-Gas etching
MgO, UO2-Chemical etching
MgS single crystals-Chemical etching
MgSe single crystal-Chemical polishing
MgTe single crystals-Chemical etching
Mica and natural rock salt-Gas cleaning
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microalloyed steels-Electropolishing
Microstructure of Zr alloys-Chemical etching
Microstructures of Cr and CrNi steels-Electrolytic etching
Mild steel (0.2% C)-Electro thinning
Mild steel-Chemical polishing
Mild steel-Electro thinning by window technique
Mild steel-Electro thinning in PTFE holder
Mild steel-Fe-0.15% C
Mixtures of acrylonitrile-butadiene-styrene-Chemical etching
Mn dual phase steel-0.07C-1.26Mn-0.30Si-0.08V-0.08Mo-0.07Cr
Mn dual phase steel-0.11C-1.47Mn-0.34Si-0.05Nb
Mn steel-Fe-0.16C-13Mn-0.24Si-0.22Cu-0.48Cr-0.03/0.13Nb
Mn steel-Fe-0.6/2.1C-0/0.5Mn
Mn steels-14% Mn steel (Hadfield steel)
Mn thin film deposits on ruthenium substrates-Chemical cleaning
Mn thin films-Chemical polishing/etching
Mn(x)Zn(1-x)Y(z)O12 single crystal specimens-Abrasive polishing
Mn, Mn-Cu alloys-Electrolytic polishing
Mn-C alloys-Chemical etching
Mn-Cr dual phase steel-Fe-0.07C-1.4Mn-0.6Si-0.2Ce
Mn-Cr steel-Fe-20Mn-4Cr-0.5C
Mn-Cr-V-W steel-0.9C-1.1Mn-0.5Cr-0.5W-0.2V
Mn-Cu alloys-Manganese and Mn-Cu alloys
Mn-Ge system-Chemical etching
Mn-Sb alloy-Mn2Sb
Mn-Sb system-MnSb-Sb eutectic
Mn-Sb-V alloy-Mn1.8V0.2Sb
Mn-Se system (MnSe)-Chemical etching
Mn-Se-S system-MnSe-MnS solid solution. To remove disurbed layers
Mn-Se-Te system-MnSe-MnTe section
Mn-Si alloys-Alloys with 2-24 at.% Si
Mn-Sn system-Mn rich alloys
Mn-Sn system-Quoted for non-stoichometric Mn-Sn alloys
Mn-Te system (MnTe)-Chemical etching
Mn-Ti alloys (up to 30 Ti)-Chemical polishing
Mn-Ti-Co system-Chemical etching
Mn-Ti-Fe system-Chemical etching
Mn-Ti-Fe system-Fe-19-27% Mn - up to 1.45% Ti
Mn-Ti-Fe system-FeTi-0.25-1% Mn section
Mn-V alloys-Chemical etching
Mn-Zn ferrite (Fe-Mn-O-Zn)-Chemical etching
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nb oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nb2O5
Mn-Zn ferrite (Fe-Mn-O-Zn)-Low Nd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + Nd2O3
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn0.564 x Zn0.374 x Fe2.06 x 04
Mn-Zn ferrite (Fe-Mn-O-Zn)-Mn8.51 x Zn0.43 x Fe2.06 x O4
Mn-Zn ferrite-low alumina body-Mn0.51 Zn0.43 Fe2.00 O4 - Al2O3
Mn-Zn ferrite-low Pb oxide body (Fe-Mn-O-Pb-Zn)-Mn0.5 x Zn0.43 x Fe2.03 x O4 + PbO
Mn-Zn ferrite-low Sb oxide body (Fe-Mn-O-Sb-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Sb2O3
Mn-Zn ferrite-low Si oxide body (Fe-Mn-O-Si-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SiO2
Mn-Zn ferrite-low Sn oxide body (Fe-Mn-O-Sn-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SnO2
Mn-Zn ferrite-low Sr oxide body (Fe-Mn-O-Sr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + SrO
Mn-Zn ferrite-low Ti oxide body (Fe-Mn-O-Ti-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + TiO2
Mn-Zn ferrite-low V oxide body (Fe-Mn-O-V-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + V2O5
Mn-Zn ferrite-low Y oxide body (Fe-Mn-O-Y-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + Y2O3
Mn-Zn ferrite-low Zr oxide body (Fe-Mn-O-Zr-Zn)-Mn0.51 x Zn0.43 x Fe2.03 x O4 + ZrO2
Mn-Zn ferrite-low Cd oxide body-Mn0.51 x Zn0.43 x Fe2.06 x O4 + CdO
Mn-Zn ferrite-low copper oxide body-Mn0.51 Zn0.43 Fe2.06O4 + CuO
Mn-Zn ferrite-low Ge oxide body-Mn0.5 x Zn0.43 xFe2.06 x O4 + GeO2
MnFe2 single crystal sphere-Abrasive, forming
MnO single crystals doped with iron as ferrites-Chemical etching
MnO2 natural crystal specimens-Chemical etching
MnO2 single crystal specimens-Physical etching
MnTe2 single crystal specimens-Chemical polishing
Mo (100) specimens-Chemical polishing
Mo (111) wafers-Chemical cleaning
Mo (111) wafers-Chemical cleaning
Mo (111) wafers-Electrolytic polishing/thinning
Mo and Mo alloys-Electrolytic polishing
Mo and its alloys, Ta and its alloys, W and W-base alloys-Electrolytic etching
Mo crystalline specimens-Chemical etching/thinning
Mo discs-Chemical cleaning-Moly's etchant
Mo foil-Chemical cleaning/polishing
Mo poly sheet-Chemical cleaning
Mo pressed powder discs-Chemical etching
Mo sheet-Electrolytic polishing
Mo single crystal specimens-Electrolytic thinning
Mo specimens subjected to Kr+ ion bombardment-Chemical etching
Mo specimens used for electroplating-Chemical polishing
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical cleaning
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching
Mo specimens-Chemical etching/polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Chemical polishing
Mo specimens-Electrolytic etching
Mo specimens-Electrolytic etching
Mo specimens-Electrolytic polishing
Mo thin films and crystalline specimens-Chemical etching
Mo thin films and crystalline specimens-Chemical etching
Mo thin films and crystalline specimens-Metal alloying
Mo thin films-Chemical etching
Mo, Nb-Chemical-Mechanical polishing
Mo, W-Chemical-Mechanical polishing
Mo, W-Electrolytic etching
Mo-Al and Mo-Co alloys-Chemical etching
Mo-C alloys-Chemical etching
Mo-C alloys-Chemical etching
Mo-Co alloys-Pre etch for alpha Co alloys in 50% nitric acid
Mo-Fe alloys-Chemical etching
Mo-Ga alloy-Chemical etching
Mo-Hf alloy (1 at.% Hf)-Electro thinning
Mo-Hf alloys-Electrolytic etching
Mo-Mn-Co system-Chemical etching, electrolytic etching
Mo-Nb alloy single crystal-Alloy with 5 at.% Nb
Mo-Ni alloy-Alloy with 33 at.% Mo
Mo-Ni alloys-Chemical etching
Mo-Ni alloys-Electro thinning
Mo-Ni-C system-Chemical etching
Mo-Os alloys-Chemical and electrolytic etching
Mo-Pt alloys-Alloys with up to 55 at.% Pt
Mo-Re alloy (34% Re)-Alloy with 34 at.% Re
Mo-Re alloy (35% Re)-Electrolytic polishing
Mo-Re alloy-Alloy with 5 at.% Re
Mo-Re alloys-Electro thinning
Mo-Re alloys-Electrolytic polishing and etching
Mo-Re-C alloy-Mo-3.5Re-0.2C
Mo-Re-Hf-C system-Mo-1.6/2.3Re-0.2/1.0Hf-0.1/1.9C
Mo-Sc alloys-Chemical etching
Mo2C specimens-Chemical etching
Mo-Y alloys-Chemical etching
Mo-Zr alloys-Electro thinning
Mo2B3 specimens-Chemical etching
Mo2B3 specimens-Chemical etching
Mo2B5 specimens-Chemical etching
Mo3Ge specimens and Mo3Ge2-Chemical etching
Mo3Ge specimens-Chemical etching
MoB surface penetration film-Chemical etching
MoB2 specimen-Chemical etching
MoN and Mo2N thin films grown on (100) silicon wafers-Chemical etching
MoO2 as amorphous platelets on steel-Chemical etching
MoO3 thin film-Chemical etching
MoS2 as powdered lubricant-Chemical cleaning
MoS2 natural single crystal specimens-Ester, removal
MoS2 single crystal platelets-Tape, cleaning
MoS2 single crystal specimens-Chemical polishing
MoSe2 single crystal specimens-Chemical polishing
MoSeS2 single crystal platelets-Tape, cleaning
MoSi2 the films deposited on silicon substrates-Ionized gas etching
MoSi2 thin films deposited on silicon substrates-Ionized gas etching
MoSi2 thin films-Gas forming
MoTe2 single crystal specimens-Chemical polishing
Modified 'AB' etchant
Modified Marble's reagent
Molybdenium-Nb, Ta, Mo and their alloys
Molybdenum samples-Mo, W and V
Molybdenum samples-Mo, W, V, Nb, Ta and their alloys
Molybdenum boride (MoB2)-Chemical etching
Molybdenum disilicide (MoSi2)-Chemical etching
Molybdenum selenide (MoSe2)-MoSe2 single crystal
Molybdenum silicide (MoSi2 and Mo5Si3)-Electrolytic etching
Molybdenum single crystal-Electro polishing
Molybdenum sulphide (MoS2)-Produces hexagonal etch pits on (0001) face
Molybdenum, Re alloys, Re-Mo alloys-Electrolytic polishing
Molybdenum, tantalum, niobium-Electrolytic polishing
Molybdenum, color etchant-Chemical etching
Molybdenum, etch figures-Chemical etching
Molybdenum, sintered and cast-Electrolytic polishing
Molybdenum, sintered and cast-Electropolishing
Molybdenum-Cathodic etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical etching
Molybdenum-Chemical polishing
Molybdenum-Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Molybdenum-Electric contact material
Molybdenum-Electro and chemical polishing
Molybdenum-Electro etching
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing
Molybdenum-Electro polishing and thinning
Molybdenum-Electro polishing for sheets
Molybdenum-Electro polishing, thinning and chemical etching
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning
Molybdenum-Electro thinning by window technique
Molybdenum-Electrolytic etching
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing
Molybdenum-Electrolytic polishing and etching
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing
Molybdenum-Electropolishing-Mo thin foil preparation
Molybdenum-Jet thinning
Molybdenum-Mo (grain contrast)
Molybdenum-Mo and Mo alloys
Molybdenum-Mo and Mo alloys
Molybdenum-Mo and Mo base alloys
Molybdenum-Mo and Mo-Ni alloys
Molybdenum-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Mo, W and their alloys
Molybdenum-Particulary good for sintered Mo-32 to 80 F
Molybdenum-Pure Mo
Molybdenum-Pure Nb, Mo
Molybdenum-Silver (Mo-Ag)-Electric contact material
Molybdenum-Ta and Ta base alloys. Nb and Nb base alloys. Nb-Cr alloys. Mo and Mo alloys
Molybdenum-W and W base alloys. Mo and Mo base alloys
Monel 400-For the grain boundaries
Monel-Electro polishing
Monel-Electrolytic polishing
Morris's solution
Mullite (Al2O3 x SiO2), BeO, MgO, Ca(2)Zr(1-1x)O(y)-Chemical etching
Mullite (Al4OSi2 x Al2O12)-Chemical etching
Murakami's reagent
Murakami's etchant
Muscovite mica (0H)2KAl2(AlSi3O10)-Acid, float-off
Muscovite mica (0H)2KAl2(AlSi3O10)-Chemical cleaning
N-155 alloy-Chemical etching
N-155 alloy-Chemical etching
N2, grown as a single crystal-Pressure, defect
NASA 11B7 alloy-56.6Ni-3.4Al-0.7Ti-8.9Cr-2.0Mo-0.1C-9.1Co-7.5W-0.5V-10.2Ta-1.1Hf (+ 0.02 B) by weight
Na beta Al2O3-Chemical etching
Na beta Al2O3-Physical etching
NaBr single crystal specimens-Alcohol, cutting
NaBr specimens-Chemical etching
NaCl (100) blanks-Gas cleaning
NaCl (100) cleaved wafers-Chemical etching
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Chemical polishing
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Dislocation etching
NaCl (100) cleaved wafers-Thermal etching
NaCl (100) cleaved wafers-Thermal, float-off
NaCl (100) crystals
NaCl (100) wafers
NaCl (100) wafers and single crystals-Chemical polishing
NaCl (100) wafers, NaCl single crystal whiskers-Chemical etching-Moran's etchant
NaCl (100) wafers-Acid, float-off
NaCl (100) wafers-Chemical cleaning
NaCl (100) wafers-Chemical cleaning
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching
NaCl (100) wafers-Chemical etching-Barber's etchant
NaCl (100) wafers-Chemical etching-Cook's etchant
NaCl (100) wafers-Chemical polishing
NaCl (100) wafers-Chemical polishing
NaCl (100) wafers-Dislocation etching
NaCl (100) wafers-Gas cleaning
NaCl (100) wafers-Metal decoration
NaCl dendritic sample
NaCl single crystal specimens-Chemical etching
NaKC4H4O6 x 4H2O (0001) wafers-Chemical cleaning
NaKC4H4O6 x 4H2O (0001) wafers-Chemical etching
NaNO3 single crystals-Base, removal
Nb (100) oriented single crystal cylinders-Thermal etching
Nb (100) oriented single crystal rods-Chemical polishing
Nb and Nb alloys, Ta and Ta-O alloys (industrial alloys), etch figures-Chemical etching
Nb oxide, NbO (blue), NbO2 (blue green), Nb2O5 (red brown)-Electrolytic etching
Nb polycrystalline samples-Chemical polishing
Nb specimens used for electroplating-Electrolytic polishing
Nb specimens-Chemical cleaning
Nb specimens-Chemical cleaning
Nb specimens-Chemical etching
Nb specimens-Chemical etching
Nb specimens-Chemical etching
Nb specimens-Chemical polishing
Nb specimens-Chemical polishing
Nb specimens-Electrolytic oxidation
Nb specimens-Electrolytic polishing
Nb specimens-Hydrocarbon cleaning
Nb thin films evaporated on glass-Gas oxidation
Nb, Mo, W-Electrolytic lapping
Nb, NbGa, Nb3Si-Anodizing
Nb, Ta-Chemical polishing
Nb, V, Ta-Chemical polishing
Nb, V, Ta-Chemical polishing
Nb-Al alloy-Nb3Al
Nb-Al alloy-Nb3Al
Nb-Al alloys-Chemical etching
Nb-Al-Ga system-Nb3Al-Nb3Ga section
Nb-Al-Ga-Ge system-Nb3Al.Nb3Ga-Nb3Ge section
Nb-Al-Ge system-Nb3Al-Nb3Ge section
Nb-Al-Si system-Chemical etching
Nb-C alloys-Chemical ecthing
Nb-Co system-Chemical etching
Nb-Co-Si alloys-Chemical etching
Nb-Cr alloys-Chemical etching
Nb-Ga system-Electro etching
Nb-Ga system-Nb3Ga
Nb-Ga-Ge system-Nb3Ga-Nb3Ge section
Nb-Gd alloys-Chemical etching
Nb-Ge alloy (Nb3Ge)-Chemical etching
Nb-Ge alloy (Nb3Ge)-Chemical etching
Nb-Ge alloys-Anodic etching
Nb-H allooys-Chemical polishing and etching
Nb-Hf-C alloys-Nb rich alloys
Nb-Ir alloys-Chemical and electrolytic etching
Nb-Mo alloys-Alloys with 1-8 at.% Mo
Nb-Mo alloys-Single crystal alloys
Nb-Mo-C alloys-Chemical etching
Nb-N system-Chemical etching
Nb-N system-Chemical etching
Nb-N system-Electro polishing
Nb-N system-Electrolytic etching
Nb-Ni alloy (Ni60Nb40)-Electro thinning
Nb-Ni alloy-Ni-Ni3Nb eutectic
Nb-Rh alloys single crystal-Chemical polishing
Nb-Rh alloys-Chemical and electrolytic etching
Nb-Ru alloys-Electrolytic etching
Nb-Sc alloys-Chemical etching
Nb-Si alloys-Anodising
Nb-Sn alloy (Nb3Sn)-Chemical etching
Nb-Sn alloy (Nb3Sn)-Chemical etching
Nb-Sn alloy (Nb3Sn)-Electro thinning and polishing
Nb-Sn alloy-Chemical etching
Nb-Sn alloy-Chemical etching
Nb-Sn alloys (single crystal Nb3Sn)-Chemical etching
Nb-Sn alloys-Anodic etching, chemical etching
Nb-Sn alloys-Chemical ecthing
Nb-Ta alloys-Chemical polishing
Nb-Ti alloy (20 at.% Nb)-Chemical polishing
Nb-Ti alloy (54.3 at.% Ti)-Chemical etching
Nb-Ti alloys (18-40 at.% Nb)-Chemical thinning
Nb-Ti alloys-Anodising
Nb-Ti alloys-Electro thinning
Nb-V alloys-Chemical etching
Nb-W-Mo-Hf alloy-SU16 alloy: 11% W, 3% Mo, 3% Hf, 0.08% C
Nb-W-Zr alloy (NB7-19% W, 2% Zr)-Chemical etching
Nb-Zn alloys-Chemical etching
Nb-Zr alloy (1% Zr)-Chemical etching
Nb-Zr alloy (15% Nb)-Electro thinning
Nb-Zr alloy (16-40% Zr)-Electrolytic polishing
Nb-Zr alloy (2.5% Nb)-Chemical thinning for electron microscopy
Nb-Zr alloy (2.7% Nb)-Chemical etching
Nb-Zr alloy (25 at.% Zr)-Electro polishing
Nb-Zr alloy (25% Zr)-Chemical etching
Nb-Zr alloy (up to 20% Nb)-Chemical etching
Nb-Zr alloys (Omega phase)-Chemical polishing
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical etching
Nb-Zr alloys-Chemical polishing and etching
Nb-Zr alloys-Electrolytic etching
Nb-Zr alloys-Micro jet machinning
Nb-Zr alloys-Sample prepation
Nb-Zr-O system (Nb rich)-Electrolytic etching
Nb-low carbon alloys-Chemical polishing
Nb/Nb2O3, E-Ni-Fe-Chemical-Mechanical polishing
Nb2O5 as the natural mineral iron niobate FeNb2O6-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3B3 specimens-Chemical etching
Nb3Ge single crystal compound-Physical etching
Nb3Ge thin films on (100) Ge substrates-Chemical etching
Nb3Ge thin films-Chemical etching
Nb3Se (100) hexagonal platelets-Chemical cleaning
Nb3Sn amorphous thin films-Heat, removal
Nb3Sn as single crystals-Chemical polishing
Nb3Sn-Anodizing
Nb3Te4 single crystal-Chemical cleaning
NbAl(y) as alloy specimens-Chemnical etching
NbC specimens-Chemical etching
NbC specimens-Chemical etching
NbC thin films-Chemical etching
NbC/NbC2-Electrolytic etching
NbH as powder-Chemical etching
NbH deposited on silicon wafers-Chemical etching
NbN (100) thin films deposited on NaCl-Ionized gas cleaning
NbN (yellow), Nb2N (pink)-Electrolytic etching
Nd specimens-Arc, forming
Nd-Ag alloys-Chemical etching
Nd-Al alloy
Nd-Co alloys-Chemical etching
Nd-Co alloys-Chemical etching
Nd-Co-Cu alloy-(Co,Cu)5Nd
Nd-Fe-B alloys, phase identification-Chemical etching
Nd-H system-Chemical etching
Nd2O3, U3O8-Chemical etching
NdFeB alloy-Rare-earth magnetic alloy
Ne grown as a single crystal-Pressure
Ne-Au alloys-Chemical etching
Ne-Bi system-Chemical etching
Neodymium doped barium titanate-Thermal and chemical etching
Neodymium oxide (Nd2O3)-Chemical etching
Neodymium oxide-Zirconia system-ZrO2-Nd2O3 eutectic
Neodymium specimens-Electrolytic polishing
Neodymium specimens-Electrolytic polishing
Neodymium-palladium alloys (Nd-Pd)-Approx. Nd3Pd4
Neodymium-zinc alloys (Nd-Zn)-Chemical etching
Neptunium-Electrolytic polishing
New etching procedure for Ni alloy 690
Ni (100) wafers-Chemical etching
Ni (100) wafers-Ionized gas cleaning
Ni and its alloys-Alloys containing Cr, Fe and other elements
Ni and its alloys-Alloys containing Cr, Fe and other elements
Ni and its alloys-Alloys containing Cr, Fe and other elements. Etchant for nickel welds
Ni and its alloys-Alloys containing Cr, Fe and other elements. Grain structure
Ni and its alloys-High Ni alloys. Porosity and flowlines
Ni and its alloys-Low Ni alloys. Grain structure
Ni and its alloys-Nickel. For grain structure
Ni base casting alloys-Chemical etching
Ni brazing alloys when brazed to steels. Galvanic Ni coatings-Chemical etching
Ni crystalline electrode rod-Alcohol cleaning
Ni evaporated as an Au:Ni coating on resistors-Chemical etching
Ni evaporated thin films-Chemical etching
Ni polycrystalline specimens-Electrolytic etching
Ni silicide-Chemical etching
Ni single crystal sphere-Thermal forming
Ni single crystals-Electrolytic thinning
Ni specimens-Chemical cleaning
Ni specimens-Chemical cleaning
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching
Ni specimens-Chemical etching-Jewitt-Wise's etchant
Ni specimens-Chemical polishing
Ni specimens-Chemical polishing
Ni specimens-Electrolytic etching
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni specimens-Electrolytic polishing
Ni steel-Fe-0.4/1.3C-8/25Ni
Ni superalloys, Hastelloy-Chemical etching
Ni superalloys-Chemical etching
Ni superalloys-Electrolytic etching
Ni thin film evaporation on glass-Chemical etching
Ni thin films-Chemical etching
Ni-20Cr and Ni-20Cr-45Fe-Chemical etching
Ni-Nb-Al alloys-Electro polishing and chemical ecthing
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-Al3Ni eutectic
Ni-Al alloy-Al-NiAl3 eutectic
Ni-Al alloy-Alloy with 0.1-0.5 at.% Al
Ni-Al alloy-Alloy with 4-8% Al
Ni-Al alloy-Electro thinning
Ni-Al alloy-Electro thinning
Ni-Al alloy-Ni rich NiAl
Ni-Al alloys-70Ni-30Al
Ni-Al alloys-Beta type alloys
Ni-Al alloys-Chemical etching
Ni-Al alloys-Chemical etching
Ni-Al alloys-Electro polishing
Ni-Al alloys-Electro thinning
Ni-Al alloys-Electro thinning
Ni-Al alloys-Electro thinning
Ni-Al alloys-Ni-6/8Al
Ni-Al alloys-Ni3Al
Ni-Al system-Al-Al3Ni eutectic
Ni-Al system-Chemical etching
Ni-Al-Cu steel-Fe-0.3C-4Ni-1Al-1Cu
Ni-Al-Hf alloys-Ni-20/23Al-5/7.5Hf
Ni-Al-Mo alloy-Ternary eutectic of gamma prime-Ni3Al, gama-nickel rich f.c.c and alpha-Mo
Ni-Al-Mo alloys-65Ni-8Al-27Mo
Ni-Al-Mo alloys-Ni-8Al-26.4Mo, Ni-6.3Al-31.2Mo
Ni-Al-Mo alloys-NiAl/Mo eutectic
Ni-Al-Nb alloy-Ni3Al-Ni3Nb eutectic
Ni-Al-Nb alloys-Ni rich alloys
Ni-Al-Ta alloys-Ni-20/29Al-2.5/7.5Ta
Ni-Al-Ti alloy-Ni3(Al,Ti)
Ni-Al-Ti alloy-Ni3AlTi
Ni-Al-Ti alloy-Ni3AlTi, etch pits
Ni-B alloys-Chemical etching
Ni-B-P glass-Ni80-P10-B10 splat cooled alloy
Ni-B-Si-C alloy-Electro polishing
Ni-base superalloys-Electrolytic polishing
Ni-Be-Cr alloys-Electro thinning
Ni-C alloys-Chemical etching
Ni-chrome-Electro polishing
Ni-chrome-Electrolytic polishing
Ni-Co (15%) specimens-Electrolytic thinning
Ni-Co alloy-Alloy with 32 at.% Ni
Ni-Co alloys-Electro thinning
Ni-Co alloys-Electro thinning by window technique
Ni-Co-Al alloys-Electro polishing and etching
Ni-Co-Cr alloys-29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloys-29-34 wt.% Ni, 30-34 wt.% Co, 32-41 wt.% Cr
Ni-Co-Cr alloys-Electro thinning
Ni-Co-Cr-Mo alloys-30-32 wt.% Ni, 30-32 wt.% Co, 34 wt.% Cr, 2-7 wt.% Mo
Ni-Co-Cr-Mo alloys-30/32 wt.% Ni-30/32 wt.% Co-34/30 wt.% Cr-1/7 wt.% Mo
Ni-Co-Cr-W alloys-28-32 wt.% Ni, 28-32 wt.% Co, 32-34 wt.% Cr, 2-11 wt.% W
Ni-Co-Cr-W alloys-28-32 wt.% Ni-28-32 wt.% Co-32-34 wt.% Cr-2-11 wt.% W
Ni-Co-Ti alloy-Ti4Co3Ni
Ni-Cr specimens-Electrolytic polishing
Ni-Cr alloys-Alloys with < 20% Cr
Ni-Cr alloys-Alloys with 10-12% Cr
Ni-Cr alloys-Chemical etching
Ni-Cr alloys-Electro polish and etching
Ni-Cr alloys-Electro thinning by window technique
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Electrolytic etching
Ni-Cr alloys-Etching for carbides
Ni-Cr alloys-Ni2Cr
Ni-Cr alloys-Preferential electro polishing for chromium rich phases
Ni-Cr as an evaporated thin film on (100) oriented Si wafers-Chemical etching
Ni-Cr evaporated thin films on (100) Si wafers-Chemical etching
Ni-Cr matrix-TaC wire composite-Shows up fibre shape and facets (111) planes in FCC matrix
Ni-Cr residual metals-Chemical cleaning
Ni-Cr specimens-Chemical etching
Ni-Cr specimens-Electrolytic cutting
Ni-Cr specimens-Electrolytic thinning
Ni-Cr stainless steel-Fe-20Cr-25Ni-0.4Mn-0.5Nb-0.01C
Ni-Cr steel-Fe-3.5Ni-1.4Cr-0.3C
Ni-Cr steel-Fe-3.5Ni-1.7Cr-0.3C
Ni-Cr thin film deposition as a bimetallic layer of Au/Ni-Cr-Chemical etching
Ni-Cr thin films evaporated on (111) and (100) oriented Si-Chemical etching
Ni-Cr-Al alloys-82Ni-12Cr-6Al
Ni-Cr-Al alloys-Chemical etching
Ni-Cr-Al alloys-Electro thinning by window technique
Ni-Cr-Al alloys-Ni-Al/Cr eutectic
Ni-Cr-Al alloys-NiAl/Cr eutectic
Ni-Cr-Al alloys-NiAl0Cr eytectic: 33 at.% Ni, 33 at.% Al, 34 at.% Cr
Ni-Cr-Al-C alloys-Ni-15Cr-3/10Al-0.05/0.3C
Ni-Cr-Al-Mo alloys-(NiAl-Cr(Mo)) eutectic
Ni-Cr-Al-Mo-Nb-Ti-Zr alloy-Inco 713LC: Ni-12Cr-6Al-0.8Ti-4.6Mo-1.5/2.5Nb-0.1Zr-(+C,B)
Ni-Cr-Al-Ta alloys-Ni-16Cr-5Al-4Ta
Ni-Cr-Al-Ti alloy-In 853 or Inconel MA 753, Ni-19Cr-1.2Al-2.4Ti (+Zr, B, Y2O3)
Ni-Cr-Al-Ti alloys-10-12 Cr, 5-6 Ni, 1 Ti
Ni-Cr-Al-Ti alloys-Ni-15Cr-3(Ti+Al), Ni-20Cr-3(Ti+Al), Ni-20Cr-4(Ti+Al)
Ni-Cr-Al-Ti alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti (at.%)
Ni-Cr-Al-Ti-C alloy-Ni-15Cr-1/4.5Al-2.5/6Ti-0.15/0.25C
Ni-Cr-Al-Ti-C alloys-10-12% Cr, 5-6% Al, 1% Ti, 0.1% C
Ni-Cr-Al-Ti-Ta alloys-10-12 Cr, 5-6 Al, 1 Ti, 0.15 Ta
Ni-Cr-Al-Ti-Ta-C alloy-10/12Cr-5/6Al-1Ti-0/15Ta-0/1C
Ni-Cr-Al-Ti-W alloys-Ni-4/13Al-6.5/20.5Cr-0.25/4.75Ti-<4W (at.%)
Ni-Cr-Al-Ti-Y alloy-Inconel MA753: Ni-22Cr-1.6Al-2.7Ti-1.3Y2O3
Ni-Cr-Al-yttria alloy-48Ni-16Cr-5Al-1Y2O3
Ni-Cr-C alloy-Fe-25Cr-0.25C
Ni-Cr-C alloys-Electrolytic etching
Ni-Cr-Co-C alloys-25Cr-30Co-0.15C-Ni, Co-25Cr-10Ni-0.15/0.25 C
Ni-Cr-Co-Mo-Ti-Al-Fe-C alloy-Waspaloy: Ni-0.06C-19Cr-4Mo-14Co-0.5Fe-1.4Al-3Ti
Ni-Cr-Fe alloys (Inconel)-Chemical etching
Ni-Cr-Fe alloys (Inconel)-Electro thinning
Ni-Cr-Fe alloys-Alloys with up to 40% Fe
Ni-Cr-Fe alloys-Electro thinning by Bollmann technique
Ni-Cr-Fe aloys-Chemical etching
Ni-Cr-Fe aloys-Chemical etching
Ni-Cr-Fe-Al alloys-Up to 40% Fe and 2% Al
Ni-Cr-Fe-Mo alloys-Hastelloy X: Ni-21Cr-18Fe-9Mo (+C)
Ni-Cr-Fe-Mo-Co-Mn-W-C alloy-Ni-21Cr-19Fe-8.6Mo-2Co-0.6Mn-0.5W-0.1C, Hastelloy X
Ni-Cr-Fe-Mo-Nb alloys-Inconel 718, Ni-19Cr-19Fe-3Mo-5Nb+Al,Ti,C
Ni-Cr-Fe-Nb alloys-Up to 40% Fe and 1% Nb
Ni-Cr-Fe-Si alloys-Alloys with up to 40% Fe, 1% Si
Ni-Cr-Mn steel-Fe-0.3C-8/21Ni-9Cr-2Mn
Ni-Cr-Mo-Al-C alloys-Ni-15Cr-3/5Mo-7Al-0.2C
Ni-Cr-Mo-C alloys-Ni-15Cr-5Mo-0.2C
Ni-Cr-Mo-Ti-Al-C alloys-Ni-15Cr-0.1/5Mo-2.5/3.5Al-4.5/5.5Ti
Ni-Cr-Mo-W-Al-Ta-C alloy-Ni-6Cr-3Mo-5W-6Al-8Ta-0.1C
Ni-Cr-Ta alloys-10-12% Cr, 0-15% Ta
Ni-Cr-Ta alloys-25 wt.% Ta, 10 wt.% Cr
Ni-Cr-Ta-C alloys-10-12 Cr, 0-15 Ta, 0-1 C
Ni-Cr-Th alloy-20% Cr, 2% ThO2
Ni-Cr-Th alloys-Electrolytic and chemical etching
Ni-Cr-Th alloys-Etch for TD Ni-Cr
Ni-Cr-Th alloys-Ni-20Cr-1.35/2.50 ThO2
Ni-Cr-Th alloys-Ni-20Cr-2ThO2
Ni-Cr-Ti alloys-Electro thinning by window technique
Ni-Cu alloy (Monel)-Chemical etching
Ni-Cu alloys (Monel)-Electro polishing, chemical etching
Ni-Cu alloys and Ni-base superalloys-Chemical etching
Ni-Cu alloys-Electro thinning by window technique
Ni-Cu alloys-For revealing grain structure
Ni-Fe alloys (Ni3Fe)-Chemical etching
Ni-Fe alloys, reveals grain boundaries-Chemical ecthing
Ni-Fe alloys-33Ni-67Fe
Ni-Fe alloys-50Ni-50Fe, 75Ni-25Fe. Shows secondary twins in drawn and rolled material
Ni-Fe alloys-Chemical etching
Ni-Fe alloys-Differences of orientation of martensite plates within prior austenite grains
Ni-Fe-Cr-Mo alloys-Electro thinning by Bollmann technique
Ni-Fe-Cr-Mo alloys-Hastelloy X.280: Ni-20Fe-22Cr-9Mo-low C
Ni-Fe-Cr-Mo-Ti-Al-C alloy-901 alloy: Ni-0.05C-13Cr-5.6Mo-36.5Fe-0.25Al-2.9Ti
Ni-Fe-Cr-P-B alloy-Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-P-B alloy-Metglas 2826A - Fe37-Ni26-Cr14-P17-B6
Ni-Fe-Cr-Ti alloy-IN 744X, Fe-26.5Cr-6.6Ni, 0.20Ti (+ 0.06 C)
Ni-Fe-Cr-Ti alloys-Chemical etching
Ni-Fe-Cr-Ti alloys-For alloys with Ni-26Fe-35Cr-0.6Ti
Ni-Fe-Mo-Zr alloy-Ni-12.7Fe-6.7Mo-0.4Zr
Ni-Fe-P-B alloy-Ni40-Fe40-B14-B6
Ni-Fe-Ti alloys-Fe-12Ni-0.25Ti
Ni-Fe-Ti alloys-Fe-12Ni-0.25Ti
Ni-Fe-Ti alloys-Fe-6Ti-10-25Ni
Ni-Fe-Ti alloys-Ti4Ni3Fe
Ni-Ga alloy-Ni3Ga
Ni-Ga alloys-Alloy with approx. 50 at.% Ga
Ni-Ge alloys (Ni3Ge single crystal)-Electrolytic polishing
Ni-Ge alloys-Chemical etching
Ni-Mn alloy-Approx. Ni3Mn
Ni-Mn alloys-Electro polishing
Ni-Mn alloys-Electro thinning
Ni-Mn steel-0.3% C-28% Ni-0.5% Mn
Ni-Mo steel-Fe-24Ni-4Mo-0.25C
Ni-Mo alloy-Alloy with 16.7 at.% Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloy-Ni4Mo
Ni-Mo alloys-Chemical etching
Ni-Mo alloys-Ni-12/33Mo
Ni-Mo alloys-Ni4Mo and Ni3Mo
Ni-Mo-Cr-Si alloy-50Ni-31Mo-15Cr-3Si
Ni-Mo-Cr-Ti-C alloy-Ti-Hastelloy-N, Ni-13Mo-4Cr-2Ti-0.06C
Ni-Mo-Fe alloy-Hastelloy B: 65Ni-27Mo-5Fe (+0.3Co, 0.3Si, 0.5Mn, 0.4Cr, 0.3V)
Ni-Nb alloys (Ni-Ni3Nb eutectic)-Electro thinning
Ni-Nb alloys (Ni-Ni3Nb eutectic)-Sample preparation
Ni-Nb alloys-Chemical etching
Ni-Nb alloys-Electro thinning for foils
Ni-Pd-Ga alloys-Chemical etching
Ni-Pt-Ga alloys-Chemical etching
Ni-Si-B glass-Splat cooled alloys
Ni-Si-B system-Chemical etching
Ni-Ta alloy (25 wt.% Ta)-Electrolytic and chemical etching, electro thinning
Ni-Ta alloy (Ni3Ta)-Chemical etching
Ni-Ta alloys (low Ta)-Chemical polishing and etching, electro thinning
Ni-Ta alloys-Chemical etching
Ni-Ta alloys-Electro thinning for films
Ni-Ta-Cr-Al-C eutectic alloy-69Ni-10Cr-5Al-15Ta-1C
Ni-Ta-Cr-Mn alloy-57Ni-21Ta-15Cr-7Mn
Ni-Th system-Alloys with 50-70% Ni
Ni-Ti alloy (10 at.% Ti)-Chemical etching
Ni-Ti alloy (NiTi)-Chemical etching
Ni-Ti alloy (NiTi)-Chemical polishing
Ni-Ti alloy (NiTi)-Electro polish and thinning
Ni-Ti alloy (NiTi)-Electro thinning
Ni-Ti alloys, superalloys-Chemical etching
Ni-Ti-Al alloys-TiNi + 0.05/3.4 at.% Al
Ni-Ti-Al-Si alloys-Chemical etching
Ni-Ti-C alloy-Alloys with 2 wt.% Ti and 0.4 wt.% C
Ni-Ti-Cr-Al alloys-NiTi-2.5 at.% Al-1.5/5 at.% Cr
Ni-V alloy (Ni3V)-Electro thinning and polishing
Ni-V system (Ni3V)-Electro thinning
Ni-W alloy (45% W)-Electrolytic polishing
Ni-W alloys (Ni-26/38% W)-Electrolytic polishing
Ni-W alloys-Electrolytic etching
Ni-Zn alloys (56 wt.% Zn)-Chemical etching
Ni-Zn alloys-Chemical etching
Ni-Zn ferrite (Fe-Ni-O-Zn)-Chemical etching
Ni-Zn ferrite (Fe-Ni-O-Zn)-Ni0.36 x Zn0.64 x Fe2O3
Ni-Zr alloys-Electrolytic etching
Ni-base alloys with more than 9Mo, Hastelloy X, Hastelloy C-Chemical etching
Ni-base foundary alloys-Chemical etching
Ni-base superalloy-Electrolytic polishing
Ni2B thin film-Metal forming
Ni50Al46Nb4 or Ni40Al39Nb21 alloys-Twin jet polishing mehod
NiAl single crystal specimens-Electrolytic polishing
NiAl specimens and alloys-Electrolytic polishing
NiB thin films-Ketone, cleaning
NiChrome 80-20-Grain structure and matrix phases-Lucas's reagent
NiCu (30%) single crystal-Thermal forming
NiCu (5%) to NiCu (80%) single crystal wafers-Chemical etching
NiI single crystal-Alcohol removal
NiMn single crystal specimens-Electrolytic etching
NiO (100) cleaved wafers-Thermal etching
NiO single crystal specimens-Physical thinning
NiO specimens-Chemical etching
NiO thin film platelets-Chemical etching
NiO-Chemical etching
NiO-Electrolytic etching
NiS as the natural mineral Millerite-Chemical etching
NiSi thin films deposited on silicon substrates-Ionized gas etching
NiSi2 thin films deposited on silicon wafers-Chemical cleaning
NiSi2 thin films grown on silicon substrates-Chemical etching
NiTi shape memory alloys-General etchant
NiTi shape memory and superelastic alloy-Chemical etching
NiTi single crystal specimens-Chemical etching
Nichrome (20% Cr)-Chemical etching
Nichrome-lanthanum oxide system-Ni-20Cr-1.2/1.6La2O3
Nickel aluminate spinel-Chemical etching
Nickel phosphorus glass (Ni-P)-Ni80P20
Nickel phosphorus alloys (Ni-P)-Electrolytic and chemical polishing
Nickel alloys-Electro polishing
Nickel alloys-Electropolishing
Nickel alloys-Jet machinning
Nickel and Ni-Co alloys-Electropolishing
Nickel and Ni-Cu alloys-Chemical etching
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel alloys-Electropolishing
Nickel and nickel-copper alloys (Ni-Cu)-For Monel K-500 alloy
Nickel and nickel-copper alloys (Ni-Cu)-For revealing grain boundaries
Nickel and nickel-copper alloys (Ni-Cu)-Microscopic examination of grain boundaries and general structure
Nickel and nickel alloys-For revealing cracks, porosity m dendritic patterns in cast alloys
Nickel and nickel alloys-Ni-Cr and Ni-Cr-Fe alloys
Nickel and nickel alloys-Reveals cracks, porosity, etc.
Nickel base superalloy GMR 235-Chemical etching
Nickel base superalloy GTD111-Chemical etching
Nickel base superalloys-Selective phase contrasting
Nickel ferrite (Ni-Fe-O)-Chemical etching
Nickel oxide (NiO)-Chemical etchinhg
Nickel oxide (NiO)-Chemical thinning
Nickel oxide (NiO)-Etch pits reagent
Nickel plating-Electropolishing
Nickel single crystal-Electro polishing
Nickel specimens T.D. grade-Chemical etching
Nickel specimens TD-Thorium deposited nickel. Etch for grain boundary
Nickel specimens and nickel alloys-Electro polishing
Nickel specimens base alloys-Electro thinning by PTFE holder
Nickel specimens-80Ni-20Cr and 35Ni-20Cr-45Fe alloys
Nickel specimens-Carbides in Ni-Cr alloys
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching
Nickel specimens-Chemical etching, electrolytic polishing
Nickel specimens-Chemical polishing
Nickel specimens-Chemical polishing
Nickel specimens-Contrast etching
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro polishing
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning
Nickel specimens-Electro thinning by Bollmann technique
Nickel specimens-Electro thinning by window technique
Nickel specimens-Electro thinning by window technique
Nickel specimens-Electrolytic etching
Nickel specimens-Electrolytic etching
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing
Nickel specimens-Electrolytic polishing and etching
Nickel specimens-Electrolytic polishing and etching
Nickel specimens-Electrolytic polishing, chemical etching
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Electropolishing
Nickel specimens-Grain boundaries. Pure types of Ni and alloys with high Ni content. Ni-Ti and Ni-Cu alloys
Nickel specimens-Grain contrast in Ni. Ni-Ag, Ni-Al, Ni-Cr, Ni-Cu, Ni-Fe, and Ni-Ti alloys
Nickel specimens-High alloy Ni. Ni-Cu alloy (Monel), Ni-Al, Ni-Fe alloys. Porosity. Flow lines
Nickel specimens-Inconel type alloys on Ni-Cr and Ni-Fe-Cr basis
Nickel specimens-Low alloy Ni. Cracks. Porosity
Nickel specimens-Ni alloys containing Cr and Fe. Welding joints
Nickel specimens-Ni and Ni base alloys, Ni-Cr and Ni-Fe alloys. Cast alloys
Nickel specimens-Ni and Ni base alloys. Bi-Cu alloys. Ni-Cr-Fe alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr and Ni-Cr alloys
Nickel specimens-Ni and Ni base alloys. Ni-Cr, Ni-Fe alloys. Superalloys of the Nimonic type
Nickel specimens-Ni base superalloys
Nickel specimens-Ni base superalloys. Gamma precipitates. Ti and Nb microsegregations
Nickel specimens-Ni silicides
Nickel specimens-Ni-Al alloys
Nickel specimens-Ni-Al, Mo-Ni, Ni-Ti alloys
Nickel specimens-Ni-Au, Ni-Mo, and Ni-Cr alloys. Micro inhomogenities in superalloys
Nickel specimens-Ni-Cu alloys. Ni base superalloys
Nickel specimens-Ni-Fe and Ni-Al alloys
Nickel specimens-Ni-Fe, Ni-Cu, and Ni-Ag alloys. Ni base superalloys
Nickel specimens-Ni-Zn alloys
Nickel specimens-Ni-Zn-Ag, Ni-Ag-Ni-Cu, and Ni-Al-Mo alloys
Nickel specimens-One of the best electrolyte for universal use
Nickel specimens-Pysical etching
Nickel specimens-Superalloys
Nickel specimens-WC-Mo2C-TiC-Ni cemented carbides
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Chemical etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloy 718-Electrolytic etching
Nickel superalloys-Chemical etching
Nickel superalloys-Chemical etching
Nickel superalloys-Etching for gamma prime in superalloys
Nickel superalloys-Grain size and texture are well revealed. Freckles are less easily seen
Nickel superalloys-Macrostructure clearly revealed
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel superalloys-Production of thin foils for electron microscopy
Nickel-Electrolytic polishing
Nickel-Ni base superalloys. Especially suitable for Hastelloy types
Nicrofer alloy-Electro polishing
Nimonic 105-Ni-0.14C-0.3Fe-14.4Cr-1.3Ti-4.7Al-20Co-5Mo
Nimonic 115 alloy-Ni-15Cr-15Co-4Ti-3.5Mo-5Al
Nimonic 80 alloy-Ni-21Cr-2.7Ti-1.6Al-1.5Fe-2Co-0.8Si-0.4Mn-0.2Cu-0.1C
Nimonic 80A-Electro thinning, electro polishing
Nimonic 80A-Ni-20Cr-1.3Al-2.3Ti
Nimonic alloys-Macro defects in the Nimonic alloys
Nimonic alloys-Macro defects in the Nimonic alloys
Nimonic alloys-Nimonic 901
Nimonic alloys-Nimonic 108, 109, 115, 120, EPK 55. Nimonic PK 33 and PK 50
Nimonic alloys-Nimonic 263
Nimonic alloys-Nimonic 75, 80A, 90, 93, 105, 108, 109, 115, 120, EPK 55, and EPK 57. Nimocast alloys
Nimonic alloys-Nimonic PE 7, PE 11, PE 16. Nimonic 901
Nimonic alloys-Nimonic PK 31
Nimonic alloys-Nimonic PK 31, Nimonic EPK 57
Nimonic alloys-Nimonic PK 31, Nimonic EPK 57
Nimonic alloys-Nimonic PK 33, PK 50, Nimonic 901
Nimonic alloys-Nimonic alloys 75, 80A, 90, 93, 105
Nimonic alloys-Nimonic alloys PE7, PE11, and PE16. Nimonic Pk 31
Nimonic PE 16-Fe-43.5Ni-16.5Cr-1.2Ti-3.2Mo-1.2Al
Nimonic PE16 alloy-Fe-0.05C-0.25Si-16.6Cr-3.2Mo-43.6Ni-1.15Al-0.2Co-1.2Ti (+B,Zr)
Niobium (high purity)-Etch pit etching
Niobium carbide (NbC)-Dislocation etching
Niobium carbide (NbC)-Thermal etching
Niobium oxide (NbO, Nb2O3, Nb2O5)-Chemical etching
Niobium single crystal-Chemical polishing
Niobium single crystal-Electrolytic polishing
Niobium single crystal-Electrolytic polishing
Niobium single crystal-Produces triangular etch pits on (111) planes
Niobium specimens-Cathodic etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical etching
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Chemical polishing
Niobium specimens-Cr, Nb, and alloys
Niobium specimens-Dislocation etching
Niobium specimens-Electro polishing
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning
Niobium specimens-Electro thinning (wire)
Niobium specimens-Electro thinning by window technique
Niobium specimens-Electro thinning by window technique
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electrolytic polishing
Niobium specimens-Electropolishing
Niobium specimens-Etch pits etching
Niobium specimens-Final electro polishing
Niobium specimens-For dislocation etch pits
Niobium specimens-Mo, Ta, Nb, Mo-Ti alloys. Ta-Nb alloys. Pure V and V base alloys
Niobium specimens-Mo, W, V, Nb, Ta and their alloys
Niobium specimens-Nb, Ta, Mo and their alloys
Niobium specimens-Ta and Ta base alloys. Nb and Nb base alloys. Nb-Cr alloys. Mo and Mo alloys
Niobium specimens-Ta base alloys, Nb base alloys
Niobium specimens-Ta base and Nb base alloys
Niobium specimens-Ta, Nb, and their alloys. Cr and Cr silicide. Re silicide. W-Th alloys
Niobium specimens-Twin jet electro polishing
Niobium-tin (Nb-Sn)-Chemical thinning
Niobium-tin (Nb-Sn)-Nb3Sn
Nital
Nital
Nitrided DIN 1.8550(34CrAlNi7) steel specimens-Macro for segregation
Nitronic 50 (XM-19) stainless steel wire-Chemical etching
Nivco alloy-Chemical etching
No. 25 alloy-shows twinned structure
No. 176 alloy-Electrolytic etching
No. 36 alloy-Chemical etching
Non-oxide ceramics-Thermal etching
Np specimens-Chemical polishing/etching
NxSiO2 thin films-Chemical etching
O.R.F. formulation
OSD alloy MA956-Fe-20Cr-4.5Al-0.5Ti-0.5Y2O3
OSD alloy MA956-Fe-20Cr-4.5Al-0.5Ti-0.5Y2O3
Oberhoffer's macroetch reagent-For macro etching of steel specimens
Oberhoffer's reagent
Os specimens-Chemical etching
Os-Electrolytic etching
OsS2 single crystal specimens-Chemical polishing
OsTe2 single crystal specimens-Chemical polishing
Osmium and alloys-Grain contrast
Osmium and alloys-Grain contrast
Osmium samples-Ru and Ru alloys, Os and Os alloys, Rh and Rh alloys
Osmium-Electrolytic polishing
Osmium-Os and Os-W alloys
Osmium-Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir
Oxide ceramics (Be, Zr, Mg, Ca)-BeO (toxic), Zr2O3, BaO, MgO, Ca8Zr1-xOy
Oxide ceramics-UO2, UO2-PuP2, UO2-U4O9 and UO2-CeO2 mixtures (toxic)
Oxide ceramics-ZnO-Physical etching
Oxide ceramics (Al, Si, Be)-Al2O3, SiO2, BeO-UO2-Y2O3 mixtures (toxic)
Oxide ceramics (Al, U, Th)-Al2O3, UO2 (toxic),ThO2 (toxic), Al2O3-MgO mixtures
Oxide ceramics (Ca, Mg)-CaO, MgO
Oxide ceramics (Ce, Sr, Al, Zr)-CeO, SrTiO3, Al2O3, ZrO-ZrC mixtures
Oxide ceramics (Mg, U)-MgO, UO2 (toxic)
Oxide ceramics (Th, Y)-ThO2-Y2O3 mixtures (toxic)
Oxide ceramics (U, Th, Pu)-UO2 (toxic), ThxUyO2 (toxic), PuO2, cast (toxic), PuO2 (gamma, sintered)-toxic
Oxide ceramics (Zr, U, Nd)-ZrO2, U3O8 (toxic)
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics combinations-Thermal and chemical etching
Oxide ceramics-Al2O3, Al2O3xMgO, SnO2
Oxide ceramics-Al2O3, Al2SiO5
Oxide ceramics-Al2O3, BeO (toxic), UO2 (toxic)
Oxide ceramics-Al2O3. Relief formation
Oxide ceramics-BaTiO3, BaTi3O7
Oxide ceramics-BeO (toxic)
Oxide ceramics-BeO (toxic)
Oxide ceramics-CaO
Oxide ceramics-Cr2O3, CeO2, Al2O3
Oxide ceramics-Eu2O3
Oxide ceramics-MgO, ThO2 (toxic), Al2NiO4, PuO3 (gamma, sintered)-toxic, Y2O3-ZrO2 and Sm2O3-ZrO2 mixtures
Oxide ceramics-MgO-Al2O3-SiO2-ZrO2 mixtures
Oxide ceramics-Nb oxides, NbO (blue), NbO2 (cyan), Nb3O3 (red-dish-brown)
Oxide ceramics-NiO
Oxide ceramics-U4O9 (toxic)
Oxide ceramics-UO2 (toxic
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic)
Oxide ceramics-UO2 (toxic). Grain size
Oxide ceramics-UO2-PuO2 mixtures (toxic)
Oxide dispersed Ni-Cr-Al-Fe alloy-Ni-16Cr-4.2Al-0.2Fe-0.8/1.0Y2O3-1.6/2.0Al2O3 +C,N
Oxide dispersion hardened MA6000L alloy-Ni-14Cr-4.6Al-4W-2.3Ti-2.1Ta-2Mo-0.75Y-0.6O2-0.2Fe-0.2N-0.07C-0.07Zr (+B)
Oxygen enriched Zircaloy 2-Zr-1.2/1.3Sn-< 0.12O2 - 0.13Cr
Oxygen sensing etchant for steels-This reagents is claimed as good for detection of oxygen penetration into steels
Oxyhychroxyapatite-Ca10(PO4)6 x (OH2)2
P2Cr5 thin film-Chemical etching
P2O5 and other phosphorus compounds-Chemical etching
P2O5 powder-Chemical etching
PZT (PbZrTiO)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical ecthing
PZT materials (O-Pb-Ti-Zr)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical etching
PZT materials (O-Pb-Ti-Zr)-Chemical etching
Palladium welded to nickel-silver (Pd, Ni-Ag)-Electric contact material
Palladium alloys-Chemical etching
Palladium alloys-Grain contrast
Palladium and palladium alloys-Electrolytic etching
Palladium specimen-Au, Pt alloys and Pd alloys
Palladium-Au alloys with less thn 90% content of precious metals
Palladium-Cathodic etching
Palladium-Chemical etching
Palladium-copper (Pd-Cu)-Electric contact material
Palladium-Electrolytic polishing
Palladium-Electropolishing
Palladium-For Au alloys with high content of precious metals
Palladium-Os base alloys, pure Pd and Pd alloys, Pt-Au alloys, Ir
Palladium-Pure Au and Au-rich alloys. Pd and Pd alloys
Palladium-Pure Au and Pd. Au-Pd, Pd alloys with more than 90% concentration of precious metals. Rh alloys
Palladium-platinum-gold-silver-copper-zinc (Pd-Pt-Au-Ag-Cu-Zn)-Electric contact material
Palladium-pure Pt and Pd, Au alloys
Palladium-ruthenium (Pd-Ru)-Electric contact material
Palladium-silver (Pd-Ag)-Electric contact material
Palmerton's etchant 1
Palmerton's etchant 2
Parameters for the ion beam etching of different layer composites on steel
Pb (100) wafers-Chemical cleaning
Pb (100) wafers-Chemical etching
Pb (100) wafers-Chemical polishing
Pb (100) wafers-Electrolytic polishing
Pb alloys-Chemical etching
Pb and Pb alloys-Chemical etching
Pb and Pb alloys-For etching high Pb content alloys a 5% solution is recommended
Pb and Pb alloys-Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys with low tin content
Pb and Pb alloys-Pb, Pb-Sb, Pb-Ca and Pb-Sn alloys
Pb containing less than 2 Sb-Chemical etching
Pb samples-Chemical etching
Pb single crystal ingots-Chemical etching
Pb single crystal specimens-Chemical polishing
Pb specimens and lead alloys-Chemical etching
Pb specimens and single crystal ingots-Chemical etching
Pb specimens-Chemical cleaning
Pb specimens-Chemical etching
Pb specimens-Chemical polishing
Pb specimens-Oxide removal
Pb(NO3)2 grown as single crystals-Chemical polishing
Pb, Pb-Sn, Pb-Sn-Cd, Pb-Sn-Sb-Electrolytic polishing
Pb-Ag alloys (Pb-rich)-Chemical etching
Pb-Ag eutectic alloy specimens-Chemical etching
Pb-Ag specimen alloys-Electrolytic polishing/etching
Pb-Ag-Sb alloys (Pb-rich)-Chemical etching
Pb-As-Sb alloys-For lead rich alloys
Pb-As-Sn-Bi alloys, grain-contrast etchant-Chemical etching
Pb-Au alloys-For Pb rich alloys
Pb-Bi alloys-Chemical and physical etching
Pb-Ca alloys (Pb rich)-Chemical etching
Pb-Ca alloys, inclusions, grain-boundary etchant-Chemical etching
Pb-Ca alloys-Chemical etching
Pb-Cd alloys (Pb rich)-Chemical etching
Pb-Cd and Pb-Sn alloys-Chemical etching
Pb-Cd telleride-Pb(1-x) Cd(x) Te, x <= 0.03
Pb-Cd, Pb-Sn, and Pb-Sb alloys-Chemical etching
Pb-Cd-Sb alloys (Pb rich)-Chemical etching
Pb-Li alloys (Pb rich)-Chemical etching
Pb-Sb alloys, grain boundary etchant-Chemical etching
Pb-Sb alloys, grain-contrast etchant-Chemical etching
Pb-Sb alloys, grain-contrast etchant-Chemical etching
Pb-Sb alloys, hard lead. White metal and type metal with high Pb content-Chemical etching
Pb-Sb alloys-Chemical etching
Pb-Sb alloys-Chemical-etching
Pb-Sb alloys-Electro polishing
Pb-Sb-Cu alloys, grain-contrast etchant-Chemical etching
Pb-Se-Te system (PbSe(1-x)Te(x))-Polishing-etching
Pb-Sn + 2% Ag, solder-Chemical etching
Pb-Sn + Ag as various other alloys with or without silver-Chemical etching
Pb-Sn alloy contacts on silicon diodes-Chemical cleaning
Pb-Sn alloy-Chemical cleaning
Pb-Sn alloys (Pb rich)-Sample preparation
Pb-Sn alloys (low Pb)-Chemical etching
Pb-Sn alloys-Chemical etching
Pb-Sn alloys-Electrolytic polishing
Pb-Sn eutectic alloy specimens-Chemical etching
Pb-Sn eutectic-Chemical etching
Pb-Sn eutectic-Electrolytic polishing
Pb-Sn selenide (Pb(1-x)Sn(x)Se)-Electrolytic polishing and etching
Pb-Sn-Ag (2%), alloy #63-Chemical cleaning
Pb-Sn-Te alloys (Pb(1-x)Sn(x)Te, x <= 0.03)-Chemical polishing and etching
Pb-Sn-Te system (Pb(1-x)Sn(x))(1-y) Te(y)-Electrolytic polishing and etching
Pb-Sn-Te system-Chemical polishing
Pb-Sn-Te system-Electrolytic etching
Pb-Te-Au system-PbTe-Au section of the diagram
Pb-Te-Co system-Lead telluride-Cobalt section
Pb-Te-Fe system-Lead telluride-Iron section
Pb-Ti eutectic alloy specimens-Chemical etching
PbAg specimens of alloys-Electrolytic etching
PbGeTe single crystal ingots-Chemical etching
PbI2 as thin crystal platelets-Chemical etching
PbMoO4 single crystals-Pressure
PbO native oxide-Chemical etching
PbO single crystal plates-Cutting
PbS (100) cleaved wafers-Chemical cleaning
PbS (100) wafers-Chemical polishing
PbS (100) wafers-Chemical polishing/etching
PbS (100) wafers-Dislocation etching
PbS (100) wafers-Electrolytic polishing
PbS specimen-Chemical etching
PbS-Chemical etching
PbSe (100) cleaved wafers-Chemical cleaning
PbSe (100) wafers and other orientations-Chemical etching
PbSe (100) wafers and other orientations-Chemical polishing
PbSe (100) wafers and other orientations-Electrolytic polishing
PbSe (100) wafers-Eelectrolytic polishing/thinning
PbSnSe (100) wafers-Electrolytic polishing
PbSnTe (100) wafers-Chemical etching
PbSnTe (100) wafers-Chemical polishing
PbSnTe (100) wafers-Chemical polishing/etching
PbSnTe (100) wafers-Electrolytic polishing
PbTe (100) and PbSnTe (100) wafers-Electrolytic polishing
PbTe (100) cleaved wafers-Chemical etching
PbTe (100) p-type wafers-Oxide removal
PbTe (100) wafers-Chemical etching
PbTe (100) wafers-Chemical etching
PbTe (100) wafers-Chemical etching-Iodate etchant
PbTe (100) wafers-Chemical polishing
PbTe (100) wafers-Chemical polishing
PbTe (100) wafers-Dislocation etching
PbTe (100) wafers-Electrolytic polishing/etching
PbTe specimen-Thermal etching for etch pits
PbTe thin film-Acid float-off
PbZrO3 single crystal specimens-Chemical polishing
PbZrO3 single crystal specimens-Chemical polishing
PbZrO3 single crystal specimens-Chemical polishing
Pd 99.95% pure single crystal specimens-Electrolytic polishing
Pd dental alloys, Pd alloys with Al, Os, In, Sn, Fe, and Cu-Chemical etching
Pd single crystals and thin films-Chemical etching
Pd thin film-Chemical cleaning
Pd thin films-Chemical cleaning
Pd-Ag-Cu alloy-35 at.% Ag-25 at.% Cu
Pd-Ce alloy-Pd3Ce
Pd-Ce alloys-Alloys with 0-50% Ce
Pd-Ce alloys-Approx. Ce3Pd4
Pd-Ce alloys-Pd rich alloys
Pd-Dy alloys-Electrolytic etching, chemical etching
Pd-Er alloys-Electrolytic and chemical etching
Pd-Er alloys-Er3Pd4
Pd-Eu alloys-Approx. PdEu
Pd-Ga alloy (Pd5Ga2)-Chemical etching
Pd-Ga alloys-Sample preparation with different etching techniques
Pd-Gd alloys (Approx. Gd3Pd4)-Chemical etching
Pd-Gd alloys-Chemical and electrolytic etching
Pd-Ge system-Pd(x)Ge(1-x), 0.75 <= x =<0.85
Pd-H as powdered "Palladium Black" with absorbed hydrogen-Chemical cleaning
Pd-Hf alloys (Approx. 55 at.% Pd)-Chemical etching
Pd-Ho alloys (Approx. Ho3Pd4)-Chemical etching
Pd-Ho alloys-Chemical and electrolytic etching
Pd-Ni alloys-Chemical etching
Pd-Sm alloys-Chemical and electrolytic etching
Pd-U alloys (Up to 25 at.% U)-Chemical etching
Pd-Y alloys-Chemical and electrolytic etching
Pd-Zn system (Pd-45 at.% Zn)-Phsical thinning
Pd-Zn-Ga alloys-PdZn-PdGa pseudo-binary alloys
PdAg alloy-Chemical etching
PdAu deposited as a 1:1 mixture on glass, quartz, and aapphire substrates-Chemical etching
PdNiP, PtNiP, and PtCuP metallic glasses-Chemical etching
PdSi and PdSi2 thin films grown on silicon substrates-Chemical etching
Permanent magnet materials-82Co-6Au-12Fe
Permanent magnet materials-CuNiFe, grain size and structure of the solid-solution alloy
Permanent magnet materials-Rare earth (Co3Cu1.6Fe0.5Ce)
Permanent magnet materials-Vicalloy, general structure
Phlogophite mica H2KMg3Al(SiO4)3-Gas drying
Phoschromic solution
Phosphides, sulfides (Cd)-CdS
Phosphides, sulfides (Pb)-PbS
Phosphides, sulfides (Pu)-PuP (toxic), PuS (toxic)
Phosphides, sulfides (U)-UO (toxic)
Phosphides, sulfides (U)-US (toxic)
Phosphor bronze alloys-Chemical etching
Phosphorus-Chemical etching
Picklesimer's solution
Picklesimer's solution
Picral
Picral
Plain carbon steel-Chemical etching
Plain carbon steel-Electro polishing
Platinium alloys-Grain contrast
Platinum (Pt)-Pure Pt and Pd. Au alloys
Platinum alloys-Electrolytic etching
Platinum and platinum alloys-Electrolytic etching
Platinum and related materials-Electrolytic etching
Platinum specimens-Au, Pt alloys and Pd alloys
Platinum specimens-Pt and Pt alloys
Platinum-Au alloys with less thn 90% content of precious metals
Platinum-Electro thinning
Platinum-Electro thinning by window technique
Platinum-Electrolytic lapping
Platinum-Electropolishing
Platinum-For Au alloys with high content of precious metals. White gold. Pd and Pt alloys
Platinum-iridium (Pt-Ir)-Electric contact material
Platinum-Physical etching
Platinum-Pt alloys, Rh, Ir
Platinum-Pt and Pt alloys, Au and Au alloys
Platinum-Pure Au and Au-rich alloys. Pd and Pd alloys
Platinum-Rh base alloys, Pt-10% Rh alloys, Ir alloys, pure Pt and Pt alloys, Ru base alloys
Platinum-ruthenium (Pt-Ru)-Electric contact material
Plutonium carbide (PuC)-Electrolytical etching
Plutonium oxide (PuO)-Sample preparation
Plutonium oxide (PuO2)-Chemical etching
Plutonium phosphide
Plutonium specimens-Electrolytic etching
Plutonium specimens-Electrolytic polishing
Plutonium specimens-Electrolytic polishing
Plutonium specimens-Electropolishing
Plutonium specimens-Electropolishing
Plutonium specimens-Electropolishing
Plutonium specimens-Pu nad Pu base alloys
Plutonium-Electrolytic polishing
Plutonium-Electrolytic polishing
Plutonium-Electrolytic polishing
Polisar's etchant
Poly-Si deposited as silicon-on-insulator structure-Chemical etching
Poly-Si grown on (100) silicon substrates-Chemical etching
Poly-Si material-Chemical etching
Poly-Si material-Chemical polishing
Poly-Si rectangular blocks of silicon-Chemical polishing
Poly-Si wafers-Defects
Poly-Ta rod, sheet, wire-Chemical cleaning
Polycarbonate of styrene, acrylonitrate copolymer-Chemical ecthing
Polycarbonate-Chemical etching
Polycrystalline silicon-Chemical etching
Polyethylene. Reveals lamellar structure-Chemical etching
Polyoxymethylene, reveals spherolite cores and growth direction, ploypropylene-Chemical etching
Polyoxymethylene-Chemical etching
Polypropylene-Chemical etching
Polypropylene-Chemical etching
Polypropylene. Spherolites in polyethylene-Chemical etching
Polytetramethylene terephthalate PTMI, Polybutylene terephthalate PBT-Chemical etching
Pondos reagent
Potash-silica system-Chemical etching
Potash-strontia-niobium oxide system-K2O-SrO-Nb2O5 single crystal
Potassium bromide (KBr)-Potassium chloride mixed crystals-Dislocation etching
Potassium bromide (KBr)-Dislocation etching
Potassium chloride (KCl)-Chemical polishing
Potassium chloride (KCl)-Dislocation etching
Potassium chloride (KCl)-Dislocation etching
Potassium chloride (KCl)-Etch pit etching
Potassium doped lithium carbonate single crystal-Li2O3-1% K2CO3
Potassium-Chemical polishing
Potassium-Chemical polishing
Potassium-Chemical polishing
Poulton's reagent
Pr (0001) wafers-Chemical polishing
Pr specimens-Arc, forming
Pr-Ag alloys-Chemical etching
Pr-Au alloy-Chemical etching
Pr-Au alloy-Chemical etching
Pr-Ba alloys-Chemical etching
Pr-Bi alloys-Chemical etching
Pr-Cs alloys-Chemical etching
Pr-Hf alloys-Chemical etching
Pr-Hg alloys-Chemical etching
Pr-Ir alloy-Chemical etching
Pr-Pd alloys (Approx. Pr3Pd4)-Chemical etching
Pr-Pt alloys-Chemical etching
Pr-Re alloys-Chemical etching
Pr-Ta alloys-Chemical etching
Pr-Tl alloys-Chemical etching
Pr-W alloys-Chemical etching
Pr-Zn alloys-Chemical etching
PrCo2Si2 single crystals-Chemical etching
Praseodymium-Electrolytic polishing
Praseodymium-Electrolytic polishing
Praseodymium-lead alloys (Pr-Pb)-Chemical etching
Praseodymium-osmium alloys (Pr-Os)-Chemical etching
Presence of Fe3P in steels-Chemical etching
Presence of SiO2 in Si-Chemical etching
Presence of sigma phase in steel-Electrolytic etching
Primary austenite grain boundaries in low and medium-alloy steels, martensitic and bainitic microstructures-Chemical etching
Pt and Au evaporated on silicon (111)-Chemical etching
Pt and Pt alloys with noble metal content bellow 90-Chemical etching
Pt and Pt alloys, Rh and Rh alloys, Pd-Ag alloys, Ir-Electrolytic etching
Pt and Pt alloys-Electrolytic etching
Pt and alloys-Grain contrast
Pt as thermocouple wires - paired - Pt and PtRh-Metal, removal
Pt single crystal ingot-Halogen, pasivation
Pt thin film-Acid, float-off
Pt thin films-Chemical etching
Pt-Co alloys-Electro thinning
Pt-Cr alloys-Electrolytic etching
Pt-Pd thin films-Chemical etching
Pt-Sb alloy (PtSb2)-Chemical etching
Pt-Tb alloys (20-35 at.% Tb)-Etch for TbPt3
Pt-Te alloys-No need to etch
Pt-Yb alloys-Chemical etching
Pt2Si thin films formed on silicon, (111) and (100) n-type wafers-Metal deposition
PtAs2 single crystal specimens-Chemical polishing
PtH powder-Chemical cleaning
PtO crystalline thin films-Chemical etching
PtP2 single crystal specimens-Chemical polishing
PtRh (2-15%) as thermocouple wires-Chemical cleaning
PtSb2 (100) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (110) and (111) wafers-Chemical etching
PtSb2 (100), (111) and (110) wafers-Chemical etching
PtSb2 single crystal specimens-Chemical polishing
PtSi specimens-Chemical etching
PtSi thin films deposited on silicon-Ionized gas etching
PtSi thin films grown on silicon substrates-Chemical etching
Pu specimens-Electrolytic polishing
Pu-Al alloys-Electro polishing
Pu-C alloys-Chemical etching
Pu-Cd alloys-May be examined in the polished unetched state
Pu-Ce alloys-Chemical and electrolytical etching
Pu-Ce-Co system-Electrolytic etching
Pu-Fe-C alloys-Final electrolytic polishing
Pu-Ga alloy (1 wt.% Ga)-Chemical etching
Pu-Ga alloy (1 wt.% Ga)-Electrolytic etching
Pu-Ga alloys-Electrolytic etching
Pu-In alloys-Electrolytic etching
Pu-La system-Chemical etching
Pu-Pd alloys (Approx. Pu3Pd4)-Chemical etching
Pu-Zn alloys (Zn rich)-Chemical etching
Pu-Zn alloys-Electrolytic and chemical etching
PuC-Electrolytic etching
PuC-Electrolytic etching
PuO2-Chemical etching
PuP, PuS-Chemical etching
Pure Ag, Ag-Cu and Ag alloys-Electrolytic etching
Pure Ag, Ag-Ni alloys, Ag-Pd alloys
Pure Ag-Electrolytic etching
Pure Al, Al-Cu, Al-Mg amd Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Cu, Al-Mg, and Al-Mg-Si alloys-Electrolytic etching
Pure Al, Al-Mg and Al-Mg-Si alloys-Chemical etching
Pure Al, Al-Zn, Al-Mn, Al-Mg-Si, Al-Zn-Mg and Al-Mn-Mg alloys-Electrolytic etching
Pure Al, Cu-Al, Mg-Al, Mg-Si-Al, and Zn-Al alloys-Chemical etching
Pure Al2O3, Al2O3 with MgO, Al2O3 with additives: CaO, MgO, SiO2, Na2O-Physical etching
Pure alumina (Al2O3)-Chemical etching
Pure alumina (Al2O3)-Physical etching
Pure Au and Au-rich alloys-Chemical etching
Pure Au, Au-Pt and Au-Ag alloys with more than 80% Au-Chemical etching
Pure Au-Electrolytic etching
Pure Be, etch pits-Chemical etching
Pure Be, fine grained Be, single crystals-Chemical etching
Pure Be, grain boundaries, impurities, single crystals-Chemical etching
Pure Co, color etchant-Chemical etching
Pure cobalt-Electrolytic etching
Pure cobalt-For electron microscopy
Pure copper specimens-Electrolytic polishing
Pure Cu with/without oxide and sulfide inclusions-Chemical etching
Pure Cu, brasses, Al bronzes, Cu-Ni and Cu-Ag alloys, Alpaca-Chemical etching
Pure Cu, brasses, Alpaca, bronzes, grain boundary etchant-Chemical etching
Pure Cu, leaded bronze, bronzes, alpha/beta brasses, Al bronze, Be bronze-Chemical etching
Pure Gd, RE-Co alloys, grain bounday etchant-Chemical ecthing
Pure Gd, for most RE metals and their alloys, Sm-Co alloys-Chemical ecthing
Pure Ge and Ge alloys-Chemical etching
Pure Ge and Ge alloys-Electrolytic etching
Pure Ge, Te, and Se, tellurides, selenides, and Zr silicides-Chemical etching
Pure Mg and Mg-rich alloys-Electrolytic etching
Pure Ni, Ni-Zn-Ag, Ni-Ag, Ni-Cu and Ni-Al-Mo alloys-Chemical etching
Pure Ni, superalloys, Ni-Cr and Ni-Fe alloys-Chemical etching
Pure Pb, Pb-Ca alloys, Pb with less than 2% Sb-Chemical etching
Pure Pb, Pb-Ca and Pb-Cu alloys-Chemical etching
Pure Pb, Pb-Na alloys-Chemical etching
Pure Pb-Chemical etching
Pure Platinum-Electrolytic etching
Pure Pt and Pt alloys, Rh-base alloys, Pt-10Rh alloys, Pt-Ir alloys, Ru-base alloys-Electrolytic etching
Pure Pt and Pt with alloy content Rh, Ru, Ir, and Os-Chemical etching
Pure Pu and Pu alloys-Electrolytic etching
Pure Ru-Electrolytic etching
Pure Si and Ge and their alloys, InSb, etch figures of the (111) plane, etches p-n transitions-Chemical etching
Pure Si in Ge and their alloys-Chemical etching
Pure Si, pure Te, pure Se-Chemical etching
Pure Sn, Sn with 1 Pb-Chemical etching
Pure Sn, Sn-Bi alloys-Chemical etching
Pure Sn-Chemical etching
Pure Sn-Chemical etching
Pure Th and Th alloys-Chemical etching
Pure Ti and Ti alloys, grain-boundary etchant-Chemical etching
Pure Ti and Ti alloys-Chemical etching
Pure Ti and Ti alloys-Physical etching
Pure Ti, Ti-base alloys, Ti-Al-Mo alloys-Chemical etching
Pure Ti, Ti-base alloys-Electrolytic etching
Pure Ti, alpha Ti, Ti-Al-V-Sn alloys, ferro titanium-Chemical etching
Pure Ti-Electrolytic etching
Pure U and U alloys-Chemica